Wonseok Lee

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Showerhead having a detachable high resistivity gas distribution plate
- Patent number 10,790,120
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Jason Della Rosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for de-chucking a workpiece using a swing volt...
- Patent number 10,784,132
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Haitao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead having a detachable high resistivity gas distribution plate
- Patent number 10,607,816
- Issue date Mar 31, 2020
- Applied Materials, Inc.
- Jason Della Rosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using bias RF pulsing to effectively clean electrostatic chuck (ESC)
- Patent number 10,410,845
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ion energy distribution manipulation for p...
- Patent number 10,395,896
- Issue date Aug 27, 2019
- Applied Materials, Inc.
- Wonseok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for de-chucking a workpiece using a swing volt...
- Patent number 10,242,893
- Issue date Mar 26, 2019
- Applied Materials, Inc.
- Haitao Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Showerhead having a detachable high resistivity gas distribution plate
- Patent number 9,911,579
- Issue date Mar 6, 2018
- Applied Materials, Inc.
- Jason Della Rosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart multi-level RF pulsing methods
- Patent number 9,872,373
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- Daisuke Shimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Structure and method of forming metamorphic heteroepi materials and...
- Patent number 9,159,554
- Issue date Oct 13, 2015
- Applied Materials, Inc.
- Errol Antonio C. Sanchez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric plasma etch process with in-situ amorphous carbon mask w...
- Patent number 7,510,976
- Issue date Mar 31, 2009
- Applied Materials, Inc.
- Shing-Li Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of feedback control of ESC voltage using wafer voltage measu...
- Patent number 7,375,947
- Issue date May 20, 2008
- Applied Materials, Inc.
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual bias frequency plasma reactor with feedback control of E.S.C....
- Patent number 7,359,177
- Issue date Apr 15, 2008
- Applied Materials, Inc.
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHOWERHEAD HAVING A DETACHABLE HIGH RESISTIVITY GAS DISTRIBUTION PLATE
- Publication number 20200194229
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- JASON DELLA ROSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ION ENERGY DISTRIBUTION MANIPULATION FOR P...
- Publication number 20190348260
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- WONSEOK LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DE-CHUCKING A WORKPIECE USING A SWING VOLT...
- Publication number 20190189481
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Haitao Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
USING BIAS RF PULSING TO EFFECTIVELY CLEAN ELECTROSTATIC CHUCK (ESC)
- Publication number 20190157052
- Publication date May 23, 2019
- Applied Materials, Inc.
- Kenny Linh DOAN
- B08 - CLEANING
Information Patent Application
SUBSTRATE SUPPORT WITH COOLED AND CONDUCTING PINS
- Publication number 20190088518
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Travis Lee KOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR DE-CHUCKING A WORKPIECE USING A SWING VOLT...
- Publication number 20180366359
- Publication date Dec 20, 2018
- Applied Materials, Inc.
- Haitao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MODULATE THE WAFER EDGE SHEATH IN A PLASMA PROCESSING CHA...
- Publication number 20180323042
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Haitao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ION ENERGY DISTRIBUTION MANIPULATION FOR P...
- Publication number 20180254171
- Publication date Sep 6, 2018
- WONSEOK LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD HAVING A DETACHABLE HIGH RESISTIVITY GAS DISTRIBUTION PLATE
- Publication number 20180190473
- Publication date Jul 5, 2018
- JASON DELLA ROSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD HAVING A DETACHABLE HIGH RESISTIVITY GAS DISTRIBUTION PLATE
- Publication number 20160005571
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- JASON DELLA ROSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD OF FORMING METAMORPHIC HETEROEPI MATERIALS AND...
- Publication number 20140329376
- Publication date Nov 6, 2014
- Applied Materials, Inc.
- Errol Antonio C. SANCHEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE
- Publication number 20100330805
- Publication date Dec 30, 2010
- KENNY LINH DOAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric plasma etch process with in-situ amorphous carbon mask w...
- Publication number 20070249171
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Shing-Li Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FEEDBACK CONTROL OF ESC VOLTAGE USING WAFER VOLTAGE MEASU...
- Publication number 20070127188
- Publication date Jun 7, 2007
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual bias frequency plasma reactor with feedback control of E.S.C....
- Publication number 20060256499
- Publication date Nov 16, 2006
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS

Wonseok Lee

Person

Patents Grantslast 30 patents

Showerhead having a detachable high resistivity gas distribution plate

Method and apparatus for de-chucking a workpiece using a swing volt...

Showerhead having a detachable high resistivity gas distribution plate

Using bias RF pulsing to effectively clean electrostatic chuck (ESC)

Method and apparatus for ion energy distribution manipulation for p...

Method and apparatus for de-chucking a workpiece using a swing volt...

Showerhead having a detachable high resistivity gas distribution plate

Smart multi-level RF pulsing methods

Structure and method of forming metamorphic heteroepi materials and...

Dielectric plasma etch process with in-situ amorphous carbon mask w...

Method of feedback control of ESC voltage using wafer voltage measu...

Dual bias frequency plasma reactor with feedback control of E.S.C....

Patents Applicationslast 30 patents

SHOWERHEAD HAVING A DETACHABLE HIGH RESISTIVITY GAS DISTRIBUTION PLATE

METHOD AND APPARATUS FOR ION ENERGY DISTRIBUTION MANIPULATION FOR P...

METHOD AND APPARATUS FOR DE-CHUCKING A WORKPIECE USING A SWING VOLT...

USING BIAS RF PULSING TO EFFECTIVELY CLEAN ELECTROSTATIC CHUCK (ESC)

SUBSTRATE SUPPORT WITH COOLED AND CONDUCTING PINS

METHOD AND APPARATUS FOR DE-CHUCKING A WORKPIECE USING A SWING VOLT...

METHOD TO MODULATE THE WAFER EDGE SHEATH IN A PLASMA PROCESSING CHA...

METHOD AND APPARATUS FOR ION ENERGY DISTRIBUTION MANIPULATION FOR P...

SHOWERHEAD HAVING A DETACHABLE HIGH RESISTIVITY GAS DISTRIBUTION PLATE

SHOWERHEAD HAVING A DETACHABLE HIGH RESISTIVITY GAS DISTRIBUTION PLATE

STRUCTURE AND METHOD OF FORMING METAMORPHIC HETEROEPI MATERIALS AND...

METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE

Dielectric plasma etch process with in-situ amorphous carbon mask w...

METHOD OF FEEDBACK CONTROL OF ESC VOLTAGE USING WAFER VOLTAGE MEASU...

Dual bias frequency plasma reactor with feedback control of E.S.C....