Wouter Onno Pril

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Encoder, position measurement system and lithographic apparatus inv...
- Patent number 10,768,025
- Issue date Sep 8, 2020
- ASML Netherlands B.V.
- Wouter Onno Pril
- G01 - MEASURING TESTING
Information Patent Grant
Method of calibrating a lithographic apparatus, device manufacturin...
- Patent number 9,177,219
- Issue date Nov 3, 2015
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 7,599,043
- Issue date Oct 6, 2009
- ASML Netherlands B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and interferometer system
- Patent number 7,535,578
- Issue date May 19, 2009
- ASML Netherlands B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 7,348,574
- Issue date Mar 25, 2008
- ASML Netherlands, B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method for determining Z position errors...
- Patent number 7,333,174
- Issue date Feb 19, 2008
- ASML Netherlands, B.V.
- Willem Herman Gertruda Anna Koenen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and position measuring method
- Patent number 7,310,130
- Issue date Dec 18, 2007
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, interferometer and device manufacturing method
- Patent number 7,251,042
- Issue date Jul 31, 2007
- ASML Netherlands B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced lithographic displacement measurement system
- Patent number 6,987,557
- Issue date Jan 17, 2006
- ASML Netherlands B.V.
- Wouter Onno Pril
- G01 - MEASURING TESTING
Information Patent Grant
Enhanced lithographic displacement measurement system
- Patent number 6,958,807
- Issue date Oct 25, 2005
- ASML Netherlands B.V.
- Wouter Onno Pril
Information Patent Grant
Lithographic projection apparatus, device manufacturing method, dev...
- Patent number 6,747,729
- Issue date Jun 8, 2004
- ASML Netherlands B.V.
- Wouter Onno Pril
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR USE IN A METROLOGY PROCESS OR LITHOGRAPHIC PROCESS
- Publication number 20230205101
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Luuc KEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENCODER, POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20170343390
- Publication date Nov 30, 2017
- ASML NETHERLANDS B.V.
- Wouter Onno PRIL
- G01 - MEASURING TESTING
Information Patent Application
Method Of Calibrating A Lithographic Apparatus, Device Manufacturin...
- Publication number 20120008127
- Publication date Jan 12, 2012
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Position measurement system and lithographic apparatus
- Publication number 20070052976
- Publication date Mar 8, 2007
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Position measurement system and lithographic apparatus
- Publication number 20070051160
- Publication date Mar 8, 2007
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and method for determining Z position errors...
- Publication number 20060170892
- Publication date Aug 3, 2006
- ASML NETHERLANDS B.V.
- Willem Herman Gertruda Anna Koenen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus and position measuring method
- Publication number 20060072089
- Publication date Apr 6, 2006
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, interferometer and device manufacturing method
- Publication number 20050179879
- Publication date Aug 18, 2005
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and interferometer system
- Publication number 20050078288
- Publication date Apr 14, 2005
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Enhanced lithographic displacement measurement system
- Publication number 20040169837
- Publication date Sep 2, 2004
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G01 - MEASURING TESTING
Information Patent Application
Lithographic projection apparatus, device manufacturing method, dev...
- Publication number 20020045113
- Publication date Apr 18, 2002
- Wouter Onno Pril
- C01 - INORGANIC CHEMISTRY

Wouter Onno Pril

Person

Patents Grantslast 30 patents

Encoder, position measurement system and lithographic apparatus inv...

Method of calibrating a lithographic apparatus, device manufacturin...

Position measurement system and lithographic apparatus

Lithographic apparatus and interferometer system

Position measurement system and lithographic apparatus

Lithographic apparatus and method for determining Z position errors...

Lithographic apparatus and position measuring method

Lithographic apparatus, interferometer and device manufacturing method

Enhanced lithographic displacement measurement system

Enhanced lithographic displacement measurement system

Lithographic projection apparatus, device manufacturing method, dev...

Patents Applicationslast 30 patents

APPARATUS FOR USE IN A METROLOGY PROCESS OR LITHOGRAPHIC PROCESS

ENCODER, POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS

Method Of Calibrating A Lithographic Apparatus, Device Manufacturin...

Position measurement system and lithographic apparatus

Position measurement system and lithographic apparatus

Lithographic apparatus and method for determining Z position errors...

Lithographic apparatus and position measuring method

Lithographic apparatus, interferometer and device manufacturing method

Lithographic apparatus and interferometer system

Enhanced lithographic displacement measurement system

Lithographic projection apparatus, device manufacturing method, dev...