Xiangxin Rui

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High-K dielectric materials comprising zirconium oxide utilized in...
- Patent number 12,148,766
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hybrid high-K dielectric material film stacks comprising zirconium...
- Patent number 12,080,725
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-K dielectric materials comprising zirconium oxide utilized in...
- Patent number 11,894,396
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ALD process and hardware with improved purge efficiency
- Patent number 11,664,216
- Issue date May 30, 2023
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Layer stack for display applications
- Patent number 11,600,642
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Xiangxin Rui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-k dielectric materials comprising zirconium oxide utilized in...
- Patent number 11,239,258
- Issue date Feb 1, 2022
- Applied Materials, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid high-k dielectric material film stacks comprising zirconium...
- Patent number 11,145,683
- Issue date Oct 12, 2021
- Applied Materials, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layer stack for display applications
- Patent number 11,049,887
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Xiangxin Rui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD process and hardware with improved purge efficiency
- Patent number 10,964,533
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas flow guide design for uniform flow distribution and efficient p...
- Patent number 10,697,062
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film encapsulation processing system and process kit
- Patent number 10,655,222
- Issue date May 19, 2020
- Applied Materials, Inc.
- Shinichi Kurita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Encapsulating film stacks for OLED applications with desired profil...
- Patent number 10,615,368
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Jrjyan Jerry Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Encapsulating film stacks for OLED applications
- Patent number 10,158,098
- Issue date Dec 18, 2018
- Applied Materials, Inc.
- Jrjyan Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Encapsulating film stacks for OLED applications
- Patent number 9,847,511
- Issue date Dec 19, 2017
- Applied Materials, Inc.
- Jrjyan Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve electrical performance of ZrO2 based high-K diel...
- Patent number 9,178,006
- Issue date Nov 3, 2015
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reproducible flash layer deposition
- Patent number 9,105,646
- Issue date Aug 11, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ZrO-based high K dielectric stack for logic decoupling capacitor or...
- Patent number 9,099,430
- Issue date Aug 4, 2015
- Intermolecular, Inc.
- Imran Hashim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inexpensive electrode materials to facilitate rutile phase titanium...
- Patent number 9,082,782
- Issue date Jul 14, 2015
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for reproducible flash layer deposition
- Patent number 9,012,298
- Issue date Apr 21, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inexpensive electrode materials to facilitate rutile phase titanium...
- Patent number 8,980,744
- Issue date Mar 17, 2015
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced work function layer supporting growth of rutile phase tita...
- Patent number 8,975,147
- Issue date Mar 10, 2015
- Intermolecular, Inc.
- Xiangxin Rui
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...
- Patent number 8,853,049
- Issue date Oct 7, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve leakage of high K materials
- Patent number 8,846,468
- Issue date Sep 30, 2014
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve leakage for ZrO2 based high K MIM capacitor
- Patent number 8,815,695
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing MIM capacitors to reduce leakage current
- Patent number 8,815,677
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming high-K crystalline films and related devices
- Patent number 8,809,160
- Issue date Aug 19, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve leakage of high K materials
- Patent number 8,766,346
- Issue date Jul 1, 2014
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming strontium titanate films
- Patent number 8,592,058
- Issue date Nov 26, 2013
- Intermolecular, Inc.
- Laura M. Matz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor stacks including catalytic layers
- Patent number 8,581,319
- Issue date Nov 12, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...
- Publication number 20240347551
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN...
- Publication number 20240120349
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...
- Publication number 20230369354
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN...
- Publication number 20220130873
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...
- Publication number 20220013547
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER STACK FOR DISPLAY APPLICATIONS
- Publication number 20210288084
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Xiangxin RUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY
- Publication number 20210202234
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN...
- Publication number 20200258918
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY
- Publication number 20200203147
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K GATE INSULATOR FOR A THIN-FILM TRANSISTOR
- Publication number 20200083052
- Publication date Mar 12, 2020
- Applied Materials, Inc.
- Yujia ZHAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FLOW GUIDE DESIGN FOR UNIFORM FLOW DISTRIBUTION AND EFFICIENT P...
- Publication number 20200017971
- Publication date Jan 16, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K GATE INSULATOR FOR A THIN-FILM TRANSISTOR
- Publication number 20190206691
- Publication date Jul 4, 2019
- Applied Materials, Inc.
- Yujia ZHAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER STACK FOR DISPLAY APPLICATIONS
- Publication number 20190148416
- Publication date May 16, 2019
- Applied Materials, Inc.
- Xiangxin RUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE IN-SITU CLEANING OF HIGH-K FILMS FROM PROCESSING CHAMBER...
- Publication number 20180350571
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yujia ZHAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE IN-SITU CLEANING OF HIGH-K FILMS FROM PROCESSING CHAMBER...
- Publication number 20180345330
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yujia ZHAI
- B08 - CLEANING
Information Patent Application
SELECTIVE IN-SITU CLEANING OF HIGH-K FILMS FROM PROCESSING CHAMBER...
- Publication number 20180347037
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yujia ZHAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS WITH DESIRED PROFIL...
- Publication number 20180198091
- Publication date Jul 12, 2018
- Applied Materials, Inc.
- Jrjyan Jerry CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM ENCAPSULATION PROCESSING SYSTEM AND PROCESS KIT
- Publication number 20180155835
- Publication date Jun 7, 2018
- Applied Materials, Inc.
- Shinichi KURITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS
- Publication number 20180114945
- Publication date Apr 26, 2018
- Applied Materials, Inc.
- Jrjyan Jerry CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS
- Publication number 20180114946
- Publication date Apr 26, 2018
- Applied Materials, Inc.
- Jrjyan Jerry CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...
- Publication number 20180026055
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...
- Publication number 20180026054
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Xiangxin RUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K DIELECTRIC MATERIALS UTILIZED IN DISPLAY DEVICES
- Publication number 20170229554
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Soo Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS
- Publication number 20160336542
- Publication date Nov 17, 2016
- Applied Materials, Inc.
- Jrjyan Jerry CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to Improve DRAM Performance
- Publication number 20160093625
- Publication date Mar 31, 2016
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Electrical Performance of ZrO2 Based High-K Diel...
- Publication number 20150228710
- Publication date Aug 13, 2015
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ZrO-Based High K Dielectric Stack for Logic Decoupling Capacitor or...
- Publication number 20150179730
- Publication date Jun 25, 2015
- Intermolecular, Inc.
- Imran Hashim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Reproducible Flash Layer Deposition
- Publication number 20140187018
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor
- Publication number 20140187015
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Reproducible Flash Layer Deposition
- Publication number 20140183695
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS

Xiangxin Rui

Person

Patents Grantslast 30 patents

High-K dielectric materials comprising zirconium oxide utilized in...

Selective in-situ cleaning of high-k films from processing chamber...

Hybrid high-K dielectric material film stacks comprising zirconium...

High-K dielectric materials comprising zirconium oxide utilized in...

ALD process and hardware with improved purge efficiency

Layer stack for display applications

High-k dielectric materials comprising zirconium oxide utilized in...

Hybrid high-k dielectric material film stacks comprising zirconium...

Layer stack for display applications

ALD process and hardware with improved purge efficiency

Gas flow guide design for uniform flow distribution and efficient p...

Thin film encapsulation processing system and process kit

Encapsulating film stacks for OLED applications with desired profil...

Encapsulating film stacks for OLED applications

Encapsulating film stacks for OLED applications

Methods to improve electrical performance of ZrO2 based high-K diel...

Methods for reproducible flash layer deposition

ZrO-based high K dielectric stack for logic decoupling capacitor or...

Inexpensive electrode materials to facilitate rutile phase titanium...

Methods for reproducible flash layer deposition

Inexpensive electrode materials to facilitate rutile phase titanium...

Enhanced work function layer supporting growth of rutile phase tita...

Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...

Methods to improve leakage of high K materials

Methods to improve leakage for ZrO2 based high K MIM capacitor

Method of processing MIM capacitors to reduce leakage current

Methods for forming high-K crystalline films and related devices

Methods to improve leakage of high K materials

Methods of forming strontium titanate films

Semiconductor stacks including catalytic layers

Patents Applicationslast 30 patents

HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...

HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN...

HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...

HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN...

HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...

LAYER STACK FOR DISPLAY APPLICATIONS

ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY

HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN...

ALD PROCESS AND HARDWARE WITH IMPROVED PURGE EFFICIENCY

HIGH-K GATE INSULATOR FOR A THIN-FILM TRANSISTOR

GAS FLOW GUIDE DESIGN FOR UNIFORM FLOW DISTRIBUTION AND EFFICIENT P...

HIGH-K GATE INSULATOR FOR A THIN-FILM TRANSISTOR

LAYER STACK FOR DISPLAY APPLICATIONS

SELECTIVE IN-SITU CLEANING OF HIGH-K FILMS FROM PROCESSING CHAMBER...

SELECTIVE IN-SITU CLEANING OF HIGH-K FILMS FROM PROCESSING CHAMBER...

SELECTIVE IN-SITU CLEANING OF HIGH-K FILMS FROM PROCESSING CHAMBER...

ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS WITH DESIRED PROFIL...

THIN FILM ENCAPSULATION PROCESSING SYSTEM AND PROCESS KIT

ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS

ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS

HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...

HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM...

HIGH-K DIELECTRIC MATERIALS UTILIZED IN DISPLAY DEVICES

ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS

Method to Improve DRAM Performance

Methods to Improve Electrical Performance of ZrO2 Based High-K Diel...

ZrO-Based High K Dielectric Stack for Logic Decoupling Capacitor or...

Methods for Reproducible Flash Layer Deposition

Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor

Methods for Reproducible Flash Layer Deposition