Xiangyu Guo

Person

Bear, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Etching methods with alternating non-plasma and plasma etching proc...
- Patent number 12,341,017
- Issue date Jun 24, 2025
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 12,327,732
- Issue date Jun 10, 2025
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of iodine-containing carbon films
- Patent number 12,188,123
- Issue date Jan 7, 2025
- American Air Liquide, Inc.
- Phong Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High conductive passivation layers and method of forming the same d...
- Patent number 12,106,971
- Issue date Oct 1, 2024
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 11,837,474
- Issue date Dec 5, 2023
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 11,469,110
- Issue date Oct 11, 2022
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 10,629,451
- Issue date Apr 21, 2020
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION OF IODINE-CONTAINING CARBON FILMS
- Publication number 20250092518
- Publication date Mar 20, 2025
- American Air Liquide, Inc.
- Phong NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...
- Publication number 20250046618
- Publication date Feb 6, 2025
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITROGEN-CONTAINING AROMATIC OR RING STRUCTURE MOLECULES FOR PLASMA...
- Publication number 20240242971
- Publication date Jul 18, 2024
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHODS WITH ALTERNATING NON-PLASMA AND PLASMA ETCHING PROC...
- Publication number 20240162042
- Publication date May 16, 2024
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20240112920
- Publication date Apr 4, 2024
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF IODINE-CONTAINING CARBON FILMS
- Publication number 20230193460
- Publication date Jun 22, 2023
- American Air Liquide, Inc.
- Phong NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20230026743
- Publication date Jan 26, 2023
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...
- Publication number 20220223431
- Publication date Jul 14, 2022
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20200251346
- Publication date Aug 6, 2020
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS

Xiangyu Guo

Person

Patents Grantslast 30 patents

Etching methods with alternating non-plasma and plasma etching proc...

Method to improve profile control during selective etching of silic...

Deposition of iodine-containing carbon films

High conductive passivation layers and method of forming the same d...

Method to improve profile control during selective etching of silic...

Method to improve profile control during selective etching of silic...

Method to improve profile control during selective etching of silic...

Patents Applicationslast 30 patents

DEPOSITION OF IODINE-CONTAINING CARBON FILMS

HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...

NITROGEN-CONTAINING AROMATIC OR RING STRUCTURE MOLECULES FOR PLASMA...

ETCHING METHODS WITH ALTERNATING NON-PLASMA AND PLASMA ETCHING PROC...

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

DEPOSITION OF IODINE-CONTAINING CARBON FILMS

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...