Xiantao LI

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,610,981
- Issue date Mar 21, 2023
- Shanghai Huali Integrated Circuit Corporation
- Changhung Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preventing over-polishing of poly gate in metal-gate CMP
- Patent number 9,543,212
- Issue date Jan 10, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Pulei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and related semiconductor...
- Patent number 9,406,527
- Issue date Aug 2, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jun Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for Manufacturing Semiconductor Device
- Publication number 20210408268
- Publication date Dec 30, 2021
- Shanghai Huali Integrated Circuit Corporation
- Changhung Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND RELATED SEMICONDUCTOR...
- Publication number 20160042973
- Publication date Feb 11, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Preventing Over-Polishing of Poly Gate in Metal-Gate CMP
- Publication number 20150340286
- Publication date Nov 26, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Pulei Zhu
- H01 - BASIC ELECTRIC ELEMENTS