Xiao Chen

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Use of CL2 and/or HCL during silicon epitaxial film formation
- Patent number 8,586,456
- Issue date Nov 19, 2013
- Applied Materials, Inc.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of CL2 and/or HCL during silicon epitaxial film formation
- Patent number 7,960,256
- Issue date Jun 14, 2011
- Applied Materials, Inc.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of Cl2 and/or HCl during silicon epitaxial film formation
- Patent number 7,732,305
- Issue date Jun 8, 2010
- Applied Materials, Inc.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of Cl2 and/or HCl during silicon epitaxial film formation
- Patent number 7,682,940
- Issue date Mar 23, 2010
- Applied Materials, Inc.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
USE OF CL2 AND/OR HCL DURING SILICON EPITAXIAL FILM FORMATION
- Publication number 20110230036
- Publication date Sep 22, 2011
- Applied Materials, Inc.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF CL2 AND/OR HCL DURING SILICON EPITAXIAL FILM FORMATION
- Publication number 20100221902
- Publication date Sep 2, 2010
- Applied Materials, Inc.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of Cl2 and/or HCl during silicon epitaxial film formation
- Publication number 20060260538
- Publication date Nov 23, 2006
- APPLIED MATERIALS, INC.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of CL2 and/or HCL during silicon epitaxial film formation
- Publication number 20060115933
- Publication date Jun 1, 2006
- APPLIED MATERIALS, INC.
- Zhiyuan Ye
- H01 - BASIC ELECTRIC ELEMENTS