Xiaofeng LIU

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimization based on machine learning
- Patent number 11,029,605
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etch variation tolerant optimization
- Patent number 10,712,653
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Discrete source mask optimization
- Patent number 10,558,124
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Xiaofeng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for lithographic processes
- Patent number 10,459,346
- Issue date Oct 29, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization based on machine learning
- Patent number 10,409,165
- Issue date Sep 10, 2019
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern placement error aware optimization
- Patent number 10,386,727
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Discrete source mask optimization
- Patent number 10,191,384
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Xiaofeng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch variation tolerant optimization
- Patent number 10,191,366
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Flows of optimization for lithographic processes
- Patent number 10,025,201
- Issue date Jul 17, 2018
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rule and lithographic process co-optimization
- Patent number 9,489,479
- Issue date Nov 8, 2016
- ASML Netherlands B.V.
- Xiaofeng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gradient-based pattern and evaluation point selection
- Patent number 8,898,599
- Issue date Nov 25, 2014
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTIMIZATION BASED ON MACHINE LEARNING
- Publication number 20190354023
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DISCRETE SOURCE MASK OPTIMIZATION
- Publication number 20190155165
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH VARIATION TOLERANT OPTIMIZATION
- Publication number 20190155145
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES
- Publication number 20180341186
- Publication date Nov 29, 2018
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION BASED ON MACHINE LEARNING
- Publication number 20180314163
- Publication date Nov 1, 2018
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FEATURE SEARCH BY MACHINE LEARNING
- Publication number 20170357911
- Publication date Dec 14, 2017
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCH VARIATION TOLERANT OPTIMIZATION
- Publication number 20170139320
- Publication date May 18, 2017
- ASML NETHERLANDS B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN PLACEMENT ERROR AWARE OPTIMIZATION
- Publication number 20170082927
- Publication date Mar 23, 2017
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES
- Publication number 20170038692
- Publication date Feb 9, 2017
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATION PIPELINE OF LOCATION-DEPENDENT VARIANT CALLS
- Publication number 20160283655
- Publication date Sep 29, 2016
- Sentieon Inc.
- Jun Ye
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
COMPUTATION PIPELINE OF SINGLE-PASS MULTIPLE VARIANT CALLS
- Publication number 20160283654
- Publication date Sep 29, 2016
- Sentieon Inc.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DISCRETE SOURCE MASK OPTIMIZATION
- Publication number 20150378262
- Publication date Dec 31, 2015
- Xiaofeng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGN RULE AND LITHOGRAPHIC PROCESS CO-OPTIMIZATION
- Publication number 20150089459
- Publication date Mar 26, 2015
- ASML NETHERLANDS B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GRADIENT-BASED PATTERN AND EVALUATION POINT SELECTION
- Publication number 20130326437
- Publication date Dec 5, 2013
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G06 - COMPUTING CALCULATING COUNTING

Xiaofeng LIU

Person

Patents Grantslast 30 patents

Optimization based on machine learning

Etch variation tolerant optimization

Discrete source mask optimization

Flows of optimization for lithographic processes

Optimization based on machine learning

Pattern placement error aware optimization

Discrete source mask optimization

Etch variation tolerant optimization

Flows of optimization for lithographic processes

Rule and lithographic process co-optimization

Gradient-based pattern and evaluation point selection

Patents Applicationslast 30 patents

OPTIMIZATION BASED ON MACHINE LEARNING

DISCRETE SOURCE MASK OPTIMIZATION

ETCH VARIATION TOLERANT OPTIMIZATION

FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES

OPTIMIZATION BASED ON MACHINE LEARNING

FEATURE SEARCH BY MACHINE LEARNING

ETCH VARIATION TOLERANT OPTIMIZATION

PATTERN PLACEMENT ERROR AWARE OPTIMIZATION

FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES

COMPUTATION PIPELINE OF LOCATION-DEPENDENT VARIANT CALLS

COMPUTATION PIPELINE OF SINGLE-PASS MULTIPLE VARIANT CALLS

DISCRETE SOURCE MASK OPTIMIZATION

DESIGN RULE AND LITHOGRAPHIC PROCESS CO-OPTIMIZATION

GRADIENT-BASED PATTERN AND EVALUATION POINT SELECTION