Xiaohan Li

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Ann Arbor, MI, US

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Patents Grantslast 30 patents

Information Patent Grant
Lithography mask repair by simulation of photoresist thickness evol...
- Patent number 11,966,156
- Issue date Apr 23, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...
- Publication number 20240061327
- Publication date Feb 22, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREDICTION AND METROLOGY OF STOCHASTIC PHOTORESIST THICKNESS DEFECTS
- Publication number 20220129775
- Publication date Apr 28, 2022
- KLA Corporation
- Anatoly Burov
- G06 - COMPUTING CALCULATING COUNTING