Xiaoliang Jin

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for forming silicon comprising films using hexachlorodisila...
- Patent number 6,884,464
- Issue date Apr 26, 2005
- Applied Materials, Inc.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Emissivity-change-free pumping plate kit in a single wafer chamber
- Patent number 6,802,906
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature filter for CVD apparatus
- Patent number 6,635,114
- Issue date Oct 21, 2003
- Applied Material, Inc.
- Jun Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD ruthenium seed for CVD ruthenium deposition
- Patent number 6,479,100
- Issue date Nov 12, 2002
- Applied Materials, Inc.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming metal electrodes
- Patent number 6,475,854
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Pravin K. Narwankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition vaporizer
- Patent number 6,210,485
- Issue date Apr 3, 2001
- Applied Materials, Inc.
- Jun Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
RECIPROCATING ROTARY CVD EQUIPMENT AND APPLICATION METHOD
- Publication number 20220025516
- Publication date Jan 27, 2022
- BETONE TECHNOLOGY SHANGHAI, INC.
- XIAOLIANG JIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for forming silicon comprising films using hexachlorodisila...
- Publication number 20040086640
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tandem wafer processing system and process
- Publication number 20030213560
- Publication date Nov 20, 2003
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TERMPERATURE FILTER
- Publication number 20030033978
- Publication date Feb 20, 2003
- JUN ZHAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low thermal budget metal oxide deposition for capacitor structures
- Publication number 20020197793
- Publication date Dec 26, 2002
- Charles N Dornfest
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD RUTHENIUM SEED FOR CVD RUTHENIUM DEPOSITION
- Publication number 20020146513
- Publication date Oct 10, 2002
- APPLIED MATERIALS, INC.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Emissivity-change-free pumping plate kit in a single wafer chamber
- Publication number 20020127508
- Publication date Sep 12, 2002
- APPLIED MATERIALS, INC.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming metal electrodes
- Publication number 20010043453
- Publication date Nov 22, 2001
- Pravin K. Narwankar
- H01 - BASIC ELECTRIC ELEMENTS

Xiaoliang Jin

Person

Patents Grantslast 30 patents

Methods for forming silicon comprising films using hexachlorodisila...

Emissivity-change-free pumping plate kit in a single wafer chamber

High temperature filter for CVD apparatus

CVD ruthenium seed for CVD ruthenium deposition

Method of forming metal electrodes

Chemical vapor deposition vaporizer

Patents Applicationslast 30 patents

RECIPROCATING ROTARY CVD EQUIPMENT AND APPLICATION METHOD

Methods for forming silicon comprising films using hexachlorodisila...

Tandem wafer processing system and process

HIGH TERMPERATURE FILTER

Low thermal budget metal oxide deposition for capacitor structures

CVD RUTHENIUM SEED FOR CVD RUTHENIUM DEPOSITION

Emissivity-change-free pumping plate kit in a single wafer chamber

Method of forming metal electrodes