Xiaoming Lu

Person

Cedar Park, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for shaping a film with a scaled calibration meas...
- Patent number 11,994,797
- Issue date May 28, 2024
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G05 - CONTROLLING REGULATING
Information Patent Grant
Planarization apparatus, planarization process, and method of manuf...
- Patent number 11,869,813
- Issue date Jan 9, 2024
- Canon Kabushiki Kaisha
- Xiaoming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization apparatus, planarization process, and method of manuf...
- Patent number 11,823,963
- Issue date Nov 21, 2023
- Canon Kabushiki Kaisha
- Xiaoming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining the initial contact point for partial fields...
- Patent number 11,614,693
- Issue date Mar 28, 2023
- Canon Kabushiki Kaisha
- Xiaoming Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarization apparatus including superstrate chuck with bendable p...
- Patent number 11,587,795
- Issue date Feb 21, 2023
- Canon Kabushiki Kaisha
- Xiaoming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strain and kinetics control during separation phase of imprint process
- Patent number 11,161,280
- Issue date Nov 2, 2021
- Molecular Imprints, Inc.
- Niyaz Khusnatdinov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and methods for nanoimprint lithography
- Patent number 10,654,216
- Issue date May 19, 2020
- Canon Kabushiki Kaisha
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Active metrology frame and thermal frame temperature control in imp...
- Patent number 10,444,624
- Issue date Oct 15, 2019
- Canon Kabushiki Kaisha
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Alignment control in nanoimprint lithography based on real-time sys...
- Patent number 10,409,178
- Issue date Sep 10, 2019
- Canon Kabushiki Kaisha
- Xiaoming Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and article manufacturing method
- Patent number 10,335,984
- Issue date Jul 2, 2019
- Canon Kabushiki Kaisha
- Byung-jin Choi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 10,248,018
- Issue date Apr 2, 2019
- Canon Kabushiki Kaisha
- Philip D. Schumaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, and method of manufacturing article
- Patent number 10,199,244
- Issue date Feb 5, 2019
- Canon Kabushiki Kaisha
- Nobuto Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput imprint based on contact line motion tracking control
- Patent number 9,090,014
- Issue date Jul 28, 2015
- Canon Nanotechnologies, Inc.
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
High throughput imprint based on contact line motion tracking control
- Patent number 8,945,444
- Issue date Feb 3, 2015
- Canon Nanotechnologies, Inc.
- Xiaoming Lu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Strain and kinetics control during separation phase of imprint process
- Patent number 8,652,393
- Issue date Feb 18, 2014
- Molecular Imprints, Inc.
- Niyaz Khusnatdinov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of separating a mold from a solidified layer disposed on a s...
- Patent number 7,635,445
- Issue date Dec 22, 2009
- Molecular Imprints, Inc.
- Byung-Jin Choi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR REGISTERING A SUPERSTRATE OF AN I...
- Publication number 20240178042
- Publication date May 30, 2024
- Canon Kabushiki Kaisha
- Xiaoming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SHAPING A SURFACE, SHAPING SYSTEM, AND METHOD OF MANUFACU...
- Publication number 20230095200
- Publication date Mar 30, 2023
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Determining the Initial Contact Point for Partial Fields...
- Publication number 20230014261
- Publication date Jan 19, 2023
- Canon Kabushiki Kaisha
- Xiaoming Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLANARIZATION PROCESS, PLANARIZATION SYSTEM, AND METHOD OF MANUFACT...
- Publication number 20220384205
- Publication date Dec 1, 2022
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...
- Publication number 20220189832
- Publication date Jun 16, 2022
- Canon Kabushiki Kaisha
- Xiaoming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Shaping a Film with a Scaled Calibration Meas...
- Publication number 20220128901
- Publication date Apr 28, 2022
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...
- Publication number 20220102156
- Publication date Mar 31, 2022
- Canon Kabushiki Kaisha
- Xiaoming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Strain and Kinetics Control During Separation Phase of Imprint Process
- Publication number 20190232533
- Publication date Aug 1, 2019
- Molecular Imprints, Inc.
- Niyaz Khusnatdinov
- B82 - NANO-TECHNOLOGY
Information Patent Application
ALIGNMENT CONTROL IN NANOIMPRINT LITHOGRAPHY BASED ON REAL-TIME SYS...
- Publication number 20190187575
- Publication date Jun 20, 2019
- Canon Kabushiki Kaisha
- Xiaoming Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHODS FOR NANOIMPRINT LITHOGRAPHY
- Publication number 20170282439
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- XIAOMING LU
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20170047234
- Publication date Feb 16, 2017
- Canon Kabushiki Kaisha
- Nobuto Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20170028598
- Publication date Feb 2, 2017
- Canon Kabushiki Kaisha
- Byung-jin Choi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20160288403
- Publication date Oct 6, 2016
- Canon Kabushiki Kaisha
- Philip D. Schumaker
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
High Throughput Imprint Based on Contact Line Motion Tracking Control
- Publication number 20150140149
- Publication date May 21, 2015
- Canon Nanotechnologies, Inc.
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Strain and Kinetics Control During Separation Phase of Imprint Process
- Publication number 20140117574
- Publication date May 1, 2014
- Molecular Imprints, Inc.
- Niyaz Khusnatdinov
- B82 - NANO-TECHNOLOGY
Information Patent Application
Strain and Kinetics Control During Separation Phase of Imprint Process
- Publication number 20100102469
- Publication date Apr 29, 2010
- Molecular Imprints, Inc.
- Niyaz Khusnatdinov
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Gas Environment for Imprint Lithography
- Publication number 20100096764
- Publication date Apr 22, 2010
- Molecular Imprints, Inc.
- Xiaoming Lu
- B82 - NANO-TECHNOLOGY
Information Patent Application
High Throughput Imprint Based on Contact Line Motion Tracking Control
- Publication number 20090140445
- Publication date Jun 4, 2009
- MOLECULAR IMPRINTS
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method of separating a mold from a solidified layer disposed on a s...
- Publication number 20060172549
- Publication date Aug 3, 2006
- Molecular Imprints, Inc.
- Byung-Jin Choi
- B82 - NANO-TECHNOLOGY

Xiaoming Lu

Person

Patents Grantslast 30 patents

System and method for shaping a film with a scaled calibration meas...

Planarization apparatus, planarization process, and method of manuf...

Planarization apparatus, planarization process, and method of manuf...

Method of determining the initial contact point for partial fields...

Planarization apparatus including superstrate chuck with bendable p...

Strain and kinetics control during separation phase of imprint process

System and methods for nanoimprint lithography

Active metrology frame and thermal frame temperature control in imp...

Alignment control in nanoimprint lithography based on real-time sys...

Imprint apparatus and article manufacturing method

Imprint apparatus and method of manufacturing article

Imprint apparatus, and method of manufacturing article

High throughput imprint based on contact line motion tracking control

High throughput imprint based on contact line motion tracking control

Strain and kinetics control during separation phase of imprint process

Method of separating a mold from a solidified layer disposed on a s...

Patents Applicationslast 30 patents

SYSTEMS, DEVICES, AND METHODS FOR REGISTERING A SUPERSTRATE OF AN I...

METHOD OF SHAPING A SURFACE, SHAPING SYSTEM, AND METHOD OF MANUFACU...

Method of Determining the Initial Contact Point for Partial Fields...

PLANARIZATION PROCESS, PLANARIZATION SYSTEM, AND METHOD OF MANUFACT...

PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...

System and Method for Shaping a Film with a Scaled Calibration Meas...

PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...

Strain and Kinetics Control During Separation Phase of Imprint Process

ALIGNMENT CONTROL IN NANOIMPRINT LITHOGRAPHY BASED ON REAL-TIME SYS...

SYSTEM AND METHODS FOR NANOIMPRINT LITHOGRAPHY

IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

High Throughput Imprint Based on Contact Line Motion Tracking Control

Strain and Kinetics Control During Separation Phase of Imprint Process

Strain and Kinetics Control During Separation Phase of Imprint Process

Gas Environment for Imprint Lithography

High Throughput Imprint Based on Contact Line Motion Tracking Control

Method of separating a mold from a solidified layer disposed on a s...