Xiaopu LI

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Shaped showerhead for edge plasma modulation
- Patent number 12,338,530
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Saketh Pemmasani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive sensor for monitoring gas concentration
- Patent number 12,228,534
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 12,224,156
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive sensor for monitoring gas concentration
- Patent number 11,959,868
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 11,823,871
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive sensor for chamber condition monitoring
- Patent number 11,581,206
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS
- Publication number 20240249924
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION
- Publication number 20240219337
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FARADAY FACEPLATE
- Publication number 20240145252
- Publication date May 2, 2024
- Applied Materials, Inc.
- Rutvij Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GENERATING PLASMA WITH ION BLOCKER PLATE
- Publication number 20230107392
- Publication date Apr 6, 2023
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPED SHOWERHEAD FOR EDGE PLASMA MODULATION
- Publication number 20230011938
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Saketh Pemmasani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, METHODS, AND APPARATUS FOR APPLYING A BIAS VOLTAGE TO AN I...
- Publication number 20220333245
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Xiaopu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION
- Publication number 20220244205
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20220028710
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210327686
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING
- Publication number 20210280443
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210050187
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL
- Publication number 20200161093
- Publication date May 21, 2020
- Applied Materials, Inc.
- Xiaopu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Shaped showerhead for edge plasma modulation

Capacitive sensor for monitoring gas concentration

Microwave plasma source for spatial plasma enhanced atomic layer de...

Capacitive sensor for monitoring gas concentration

Device and method for tuning plasma distribution using phase control

Microwave plasma source for spatial plasma enhanced atomic layer de...

Capacitive sensor for chamber condition monitoring

Patents Applicationslast 30 patents

BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS

CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION

FARADAY FACEPLATE

METHOD AND APPARATUS FOR GENERATING PLASMA WITH ION BLOCKER PLATE

SHAPED SHOWERHEAD FOR EDGE PLASMA MODULATION

SYSTEMS, METHODS, AND APPARATUS FOR APPLYING A BIAS VOLTAGE TO AN I...

CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION

DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL