Xiaosong JI

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Milpitas, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming features in a silicon containing layer
- Patent number 9,627,216
- Issue date Apr 18, 2017
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aspect ratio dependent etch (ARDE) lag reduction process by selecti...
- Patent number 9,064,812
- Issue date Jun 23, 2015
- Applied Materials, Inc.
- Jinsu Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER
- Publication number 20150099345
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- BYUNGKOOK KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASPECT RATIO DEPENDENT ETCH (ARDE) LAG REDUCTION PROCESS BY SELECTI...
- Publication number 20150064919
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Jinsu KIM
- H01 - BASIC ELECTRIC ELEMENTS