Xiaowei WANG

Person

Shizouka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gap filling composition and pattern forming method using compositio...
- Patent number 11,392,035
- Issue date Jul 19, 2022
- Merck Patent GmbH
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gap filling composition and pattern forming method using low molecu...
- Patent number 11,169,443
- Issue date Nov 9, 2021
- Merck Patent GmbH
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reverse pattern formation composition, reverse pattern formation me...
- Patent number 10,670,969
- Issue date Jun 2, 2020
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Xiaowei Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming fine resist pattern and pattern forming met...
- Patent number 10,656,522
- Issue date May 19, 2020
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Xiaowei Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Top-layer membrane formation composition and method for forming res...
- Patent number 10,268,117
- Issue date Apr 23, 2019
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Masato Suzuki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming overlay film, and resist pattern formation...
- Patent number 9,810,988
- Issue date Nov 7, 2017
- AZ Electronic Material (Luxembourg) S.ár.l.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,804,493
- Issue date Oct 31, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,766,544
- Issue date Sep 19, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,482,952
- Issue date Nov 1, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinse solution for lithography and pattern formation method employi...
- Patent number 9,298,095
- Issue date Mar 29, 2016
- Merck Patent GmbH
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern formating method
- Patent number 8,618,002
- Issue date Dec 31, 2013
- AZ Electronic Materials USA Corp.
- Wenbing Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
GAP FILLING COMPOSITION AND PATTERN FORMING METHOD USING COMPOSITIO...
- Publication number 20200319556
- Publication date Oct 8, 2020
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Xiaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVERSE PATTERN FORMATION COMPOSITION, REVERSE PATTERN FORMATION ME...
- Publication number 20190204747
- Publication date Jul 4, 2019
- Merck Patent GmbH
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAP FILLING COMPOSITION AND PATTERN FORMING METHOD USING LOW MOLECU...
- Publication number 20190113848
- Publication date Apr 18, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATMENT COMPOSITION AND SURFACE TREATMENT METHOD OF RESIS...
- Publication number 20190041757
- Publication date Feb 7, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...
- Publication number 20180329301
- Publication date Nov 15, 2018
- AZ Electronic Materrials (Luxembourg) S.a.r.l.
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...
- Publication number 20170090288
- Publication date Mar 30, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20160011510
- Publication date Jan 14, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION...
- Publication number 20150331323
- Publication date Nov 19, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei WANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20150147701
- Publication date May 28, 2015
- Hyun-woo KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OVERLAY FILM FORMING COMPOSITION AND RESIST PATTERN FORMATION METHO...
- Publication number 20150140490
- Publication date May 21, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...
- Publication number 20140234783
- Publication date Aug 21, 2014
- AZ Electronic Materials USA Corp.
- Xiaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...
- Publication number 20130164694
- Publication date Jun 27, 2013
- AZ Electronic Materials USA Corp.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATING METHOD
- Publication number 20110241173
- Publication date Oct 6, 2011
- Wenbing Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREAT...
- Publication number 20110165523
- Publication date Jul 7, 2011
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Xiaowei WANG

Person

Patents Grantslast 30 patents

Gap filling composition and pattern forming method using compositio...

Gap filling composition and pattern forming method using low molecu...

Reverse pattern formation composition, reverse pattern formation me...

Composition for forming fine resist pattern and pattern forming met...

Top-layer membrane formation composition and method for forming res...

Composition for forming overlay film, and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Rinse solution for lithography and pattern formation method employi...

Resist pattern formating method

Patents Applicationslast 30 patents

GAP FILLING COMPOSITION AND PATTERN FORMING METHOD USING COMPOSITIO...

REVERSE PATTERN FORMATION COMPOSITION, REVERSE PATTERN FORMATION ME...

GAP FILLING COMPOSITION AND PATTERN FORMING METHOD USING LOW MOLECU...

SURFACE TREATMENT COMPOSITION AND SURFACE TREATMENT METHOD OF RESIS...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...

TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

OVERLAY FILM FORMING COMPOSITION AND RESIST PATTERN FORMATION METHO...

RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...

RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...

RESIST PATTERN FORMATING METHOD

SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREAT...