Xiaoxu Lu

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
183 nm CW laser and inspection system
- Patent number 10,429,719
- Issue date Oct 1, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Grant
183 nm CW laser and inspection system
- Patent number 10,175,555
- Issue date Jan 8, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Grant
Laser repetition rate multiplier and flat-top beam profile generato...
- Patent number 10,044,164
- Issue date Aug 7, 2018
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CW DUV laser with improved stability
- Patent number 10,044,166
- Issue date Aug 7, 2018
- KLA-Tencor Corporation
- Yung-Ho Chuang
- G02 - OPTICS
Information Patent Grant
High brightness laser-sustained plasma broadband source
- Patent number 10,032,619
- Issue date Jul 24, 2018
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness laser-sustained plasma broadband source
- Patent number 9,865,447
- Issue date Jan 9, 2018
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser repetition rate multiplier and flat-top beam profile generato...
- Patent number 9,525,265
- Issue date Dec 20, 2016
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CW DUV laser with improved stability
- Patent number 9,509,112
- Issue date Nov 29, 2016
- KLA-Tencor Corporation
- Yung-Ho Chuang
- G02 - OPTICS
Information Patent Grant
Multi-spot illumination for improved detection sensitivity
- Patent number 9,494,531
- Issue date Nov 15, 2016
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
183 nm CW Laser and Inspection System
- Publication number 20190107766
- Publication date Apr 11, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Application
183 nm CW Laser And Inspection System
- Publication number 20180188633
- Publication date Jul 5, 2018
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Application
High Brightness Laser-Sustained Plasma Broadband Source
- Publication number 20180114687
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Brightness Laser-Sustained Plasma Broadband Source
- Publication number 20170278694
- Publication date Sep 28, 2017
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CW DUV Laser With Improved Stability
- Publication number 20170070025
- Publication date Mar 9, 2017
- Yung-Ho Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generato...
- Publication number 20160359292
- Publication date Dec 8, 2016
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generato...
- Publication number 20150372446
- Publication date Dec 24, 2015
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Spot Illumination For Improved Detection Sensitivity
- Publication number 20150041666
- Publication date Feb 12, 2015
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G01 - MEASURING TESTING
Information Patent Application
CW DUV Laser With Improved Stability
- Publication number 20140362880
- Publication date Dec 11, 2014
- KLA-Tencor Corporation
- Yung-Ho Chuang
- G02 - OPTICS

Person

Patents Grantslast 30 patents

183 nm CW laser and inspection system

183 nm CW laser and inspection system

Laser repetition rate multiplier and flat-top beam profile generato...

CW DUV laser with improved stability

High brightness laser-sustained plasma broadband source

High brightness laser-sustained plasma broadband source

Laser repetition rate multiplier and flat-top beam profile generato...

CW DUV laser with improved stability

Multi-spot illumination for improved detection sensitivity

Patents Applicationslast 30 patents

183 nm CW Laser and Inspection System

183 nm CW Laser And Inspection System

High Brightness Laser-Sustained Plasma Broadband Source

High Brightness Laser-Sustained Plasma Broadband Source

CW DUV Laser With Improved Stability

Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generato...

Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generato...

Multi-Spot Illumination For Improved Detection Sensitivity

CW DUV Laser With Improved Stability