Xiaoyang Li

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,977,334
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimizing a patterning device pattern
- Patent number 11,681,849
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple patterning lithography using spacer and self-aligned assis...
- Patent number 8,629,064
- Issue date Jan 14, 2014
- ASML Netherlands B.V.
- Xiaoyang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process modeling of asymmetric patterns
- Patent number 7,149,998
- Issue date Dec 12, 2006
- Synopsys Inc.
- Xiaoyang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid optical proximity correction for alternating aperture phase...
- Patent number 6,813,759
- Issue date Nov 2, 2004
- Numerical Technologies, Inc.
- Hua-yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CONFIGURATION OF PATTERNING PROCESS
- Publication number 20240119212
- Publication date Apr 11, 2024
- ASML NETHERLANDS B.V.
- Jung Hoon SER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20230161264
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20210364929
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN
- Publication number 20210232748
- Publication date Jul 29, 2021
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Multiple Patterning Lithography Using Spacer and Self-Aligned Assis...
- Publication number 20110318927
- Publication date Dec 29, 2011
- ASML NETHERLANDS B.V.
- Xiaoyang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography process modeling of asymmetric patterns
- Publication number 20040126672
- Publication date Jul 1, 2004
- NUMERICAL TECHNOLOGIES, INC.
- Xiaoyang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid optical proximity correction for alternating aperture phase...
- Publication number 20040049761
- Publication date Mar 11, 2004
- Numerical Technologies, Inc.
- Hua-yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Xiaoyang Li

Person

Patents Grantslast 30 patents

Wavefront optimization for tuning scanner based on performance matc...

Method for optimizing a patterning device pattern

Wavefront optimization for tuning scanner based on performance matc...

Multiple patterning lithography using spacer and self-aligned assis...

Lithography process modeling of asymmetric patterns

Hybrid optical proximity correction for alternating aperture phase...

Patents Applicationslast 30 patents

CONFIGURATION OF PATTERNING PROCESS

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN

Multiple Patterning Lithography Using Spacer and Self-Aligned Assis...

Lithography process modeling of asymmetric patterns

Hybrid optical proximity correction for alternating aperture phase...