Xiawan Yang

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Boron nitride for mask patterning
- Patent number 11,935,751
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Siyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous carbon multilayer coating with directional protection
- Patent number 11,437,230
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Wei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of matching two or more plasma reactors
- Patent number 9,305,748
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predictive method of matching two plasma reactors
- Patent number 9,184,021
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING IN SEMICONDUCTOR PROCESSING
- Publication number 20250062131
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Hanbyul Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES
- Publication number 20250054770
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Jiajing Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING CARBON-CONTAINING FEATURES AT LOW TEMPERATURES
- Publication number 20250054768
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Jiajing Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON NITRIDE FOR MASK PATTERNING
- Publication number 20220384189
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Siyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION PROCESSES UTILIZING BORON-DOPED SILICON MATERIALS
- Publication number 20220020599
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMORPHOUS CARBON MULTILAYER COATING WITH DIRECTIONAL PROTECTION
- Publication number 20210313166
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Wei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MATCHING TWO OR MORE PLASMA REACTORS
- Publication number 20150096959
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTIVE METHOD OF MATCHING TWO PLASMA REACTORS
- Publication number 20150099314
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS

Xiawan Yang

Person

Patents Grantslast 30 patents

Boron nitride for mask patterning

Amorphous carbon multilayer coating with directional protection

Method of matching two or more plasma reactors

Predictive method of matching two plasma reactors

Patents Applicationslast 30 patents

PLASMA ETCHING IN SEMICONDUCTOR PROCESSING

METHODS OF ETCHING OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES

METHODS OF ETCHING CARBON-CONTAINING FEATURES AT LOW TEMPERATURES

BORON NITRIDE FOR MASK PATTERNING

INTEGRATION PROCESSES UTILIZING BORON-DOPED SILICON MATERIALS

AMORPHOUS CARBON MULTILAYER COATING WITH DIRECTIONAL PROTECTION

METHOD OF MATCHING TWO OR MORE PLASMA REACTORS

PREDICTIVE METHOD OF MATCHING TWO PLASMA REACTORS