Xin SONG

Person

Andover, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor substrate yield prediction based on spectra data from...
- Patent number 12,111,355
- Issue date Oct 8, 2024
- Onto Innovation Inc.
- Xin Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,531,279
- Issue date Dec 20, 2022
- Onto Innovation Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,126,096
- Issue date Sep 21, 2021
- Onto Innovation, Inc.
- Elvino Da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PERFORMANCE MANAGEMENT OF SEMICONDUCTOR SUBSTRATE TOOLS
- Publication number 20240295829
- Publication date Sep 5, 2024
- ONTO INNOVATION INC.
- Xin Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADAPTIVE SPATIAL PATTERN RECOGNITION FOR DEFECT DETECTION
- Publication number 20240281953
- Publication date Aug 22, 2024
- ONTO INNOVATION INC.
- Longjiang Xiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEFECT DETECTION IN MANUFACTURED ARTICLES USING MULTI-CHANNEL IMAGES
- Publication number 20240169514
- Publication date May 23, 2024
- ONTO INNOVATION INC.
- Longjiang Xiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DYNAMIC MODELING FOR SEMICONDUCTOR SUBSTRATE DEFECT DETECTION
- Publication number 20230186461
- Publication date Jun 15, 2023
- ONTO INNOVATION INC.
- Xin Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR SUBSTRATE YIELD PREDICTION BASED ON SPECTRA DATA FRO...
- Publication number 20230160960
- Publication date May 25, 2023
- Onto Innovation
- Xin Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20220075282
- Publication date Mar 10, 2022
- Onto Innovation, Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20200233320
- Publication date Jul 23, 2020
- Onto Innovation, Inc.
- Elvino DA SILVEIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Semiconductor substrate yield prediction based on spectra data from...

System and method for optimizing a lithography exposure process

System and method for optimizing a lithography exposure process

Patents Applicationslast 30 patents

PERFORMANCE MANAGEMENT OF SEMICONDUCTOR SUBSTRATE TOOLS

ADAPTIVE SPATIAL PATTERN RECOGNITION FOR DEFECT DETECTION

DEFECT DETECTION IN MANUFACTURED ARTICLES USING MULTI-CHANNEL IMAGES

DYNAMIC MODELING FOR SEMICONDUCTOR SUBSTRATE DEFECT DETECTION

SEMICONDUCTOR SUBSTRATE YIELD PREDICTION BASED ON SPECTRA DATA FRO...

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS