Xing Lan LIU

Person

Ukkel, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,493,851
- Issue date Nov 8, 2022
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 11,347,150
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,156,923
- Issue date Oct 26, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 10,990,018
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining an optimal operational parameter setting of a metrology...
- Patent number 10,788,761
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and associated...
- Patent number 10,545,410
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20220260925
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20220011681
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210191278
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...
- Publication number 20210018852
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20190361358
- Publication date Nov 28, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...
- Publication number 20190250523
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...
- Publication number 20190079411
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Hakki Ergun CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20180292761
- Publication date Oct 11, 2018
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Xing Lan LIU

Person

Patents Grantslast 30 patents

Lithographic method and lithographic apparatus

Computational metrology

Lithographic method and lithographic apparatus

Computational metrology

Determining an optimal operational parameter setting of a metrology...

Lithographic apparatus, device manufacturing method and associated...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

COMPUTATIONAL METROLOGY

LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS

COMPUTATIONAL METROLOGY

DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...

COMPUTATIONAL METROLOGY

DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...

LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS