XING LIN

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-zone pedestal for plasma processing
- Patent number 10,971,389
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic heater and esc with enhanced wafer edge performance
- Patent number 10,950,477
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of achieving high input impedance without usin...
- Patent number 10,879,041
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual-zone heater for plasma processing
- Patent number 10,811,301
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with symmetrical feed structure
- Patent number 10,770,328
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic heater with enhanced RF power delivery
- Patent number 10,692,703
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual-zone heater for plasma processing
- Patent number 10,497,606
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of processing wafers with compressive or tensi...
- Patent number 10,403,535
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with symmetrical feed structure
- Patent number 10,096,494
- Issue date Oct 9, 2018
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone pedestal for plasma processing
- Patent number 10,090,187
- Issue date Oct 2, 2018
- Applied Materials, Inc.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature electrostatic chuck with real-time heat zone regul...
- Patent number 9,948,214
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Dmitry Lubomirsky
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-zone pedestal for plasma processing
- Patent number 9,725,806
- Issue date Aug 8, 2017
- Applied Materials, Inc.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with symmetrical feed structure
- Patent number 9,123,762
- Issue date Sep 1, 2015
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus toward preventing ESC bonding adhesive erosion
- Patent number 8,982,530
- Issue date Mar 17, 2015
- Applied Materials, Inc.
- Xing Lin
- B32 - LAYERED PRODUCTS
Information Patent Grant
Methods and apparatus for controlling substrate temperature in a pr...
- Patent number 8,633,423
- Issue date Jan 21, 2014
- Applied Materials, Inc.
- Xing Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods for calibrating RF power applied to a plurality of RF coils...
- Patent number 8,492,980
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20210296144
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Xing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...
- Publication number 20210111000
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL-ZONE HEATER FOR PLASMA PROCESSING
- Publication number 20200051848
- Publication date Feb 13, 2020
- Applied Materials, Inc.
- Xing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE
- Publication number 20190051551
- Publication date Feb 14, 2019
- XING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING
- Publication number 20190035665
- Publication date Jan 31, 2019
- Applied Materials, Inc.
- XING LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK HAVING PROPERTIES FOR OPTIMAL THIN FILM DEPOSIT...
- Publication number 20170352569
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20170306494
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Xing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC HEATER WITH ENHANCED RF POWER DELIVERY
- Publication number 20170278682
- Publication date Sep 28, 2017
- Applied Materials, Inc.
- Xing LIN
- C30 - CRYSTAL GROWTH
Information Patent Application
MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING
- Publication number 20170263484
- Publication date Sep 14, 2017
- Applied Materials, Inc.
- XING LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...
- Publication number 20170069464
- Publication date Mar 9, 2017
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC HEATER AND ESC WITH ENHANCED WAFER EDGE PERFORMANCE
- Publication number 20170040198
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Xing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-ZONE HEATER FOR PLASMA PROCESSING
- Publication number 20160230281
- Publication date Aug 11, 2016
- Applied Materials, Inc.
- Xing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSI...
- Publication number 20160049323
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Zheng John YE
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING
- Publication number 20160002779
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- XING LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE
- Publication number 20150371877
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- XING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS TOWARD PREVENTING ESC BONDING ADHESIVE EROSION
- Publication number 20150183187
- Publication date Jul 2, 2015
- Applied Materials, Inc.
- Xing LIN
- B32 - LAYERED PRODUCTS
Information Patent Application
METHODS AND APPARATUS TOWARD PREVENTING ESC BONDING ADHESIVE EROSION
- Publication number 20130286530
- Publication date Oct 31, 2013
- Xing Lin
- B32 - LAYERED PRODUCTS
Information Patent Application
HIGH TEMPERATURE ELECTROSTATIC CHUCK WITH REAL-TIME HEAT ZONE REGUL...
- Publication number 20130284374
- Publication date Oct 31, 2013
- Dmitry LUBOMIRSKY
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
METHODS FOR CALIBRATING RF POWER APPLIED TO A PLURALITY OF RF COILS...
- Publication number 20120104950
- Publication date May 3, 2012
- Applied Materials, Inc.
- SAMER BANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE
- Publication number 20120097332
- Publication date Apr 26, 2012
- Applied Materials, Inc.
- XING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING SUBSTRATE TEMPERATURE IN A PR...
- Publication number 20120091108
- Publication date Apr 19, 2012
- Applied Materials, Inc.
- XING LIN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Person

Patents Grantslast 30 patents

Multi-zone pedestal for plasma processing

Ceramic heater and esc with enhanced wafer edge performance

Method and apparatus of achieving high input impedance without usin...

Dual-zone heater for plasma processing

Substrate support with symmetrical feed structure

Ceramic heater with enhanced RF power delivery

Dual-zone heater for plasma processing

Method and apparatus of processing wafers with compressive or tensi...

Substrate support with symmetrical feed structure

Multi-zone pedestal for plasma processing

High temperature electrostatic chuck with real-time heat zone regul...

Multi-zone pedestal for plasma processing

Substrate support with symmetrical feed structure

Methods and apparatus toward preventing ESC bonding adhesive erosion

Methods and apparatus for controlling substrate temperature in a pr...

Methods for calibrating RF power applied to a plurality of RF coils...

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...

DUAL-ZONE HEATER FOR PLASMA PROCESSING

SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE

MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING

ELECTROSTATIC CHUCK HAVING PROPERTIES FOR OPTIMAL THIN FILM DEPOSIT...

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

CERAMIC HEATER WITH ENHANCED RF POWER DELIVERY

MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING

METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...

CERAMIC HEATER AND ESC WITH ENHANCED WAFER EDGE PERFORMANCE

DUAL-ZONE HEATER FOR PLASMA PROCESSING

METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSI...

MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING

SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE

METHODS AND APPARATUS TOWARD PREVENTING ESC BONDING ADHESIVE EROSION

METHODS AND APPARATUS TOWARD PREVENTING ESC BONDING ADHESIVE EROSION

HIGH TEMPERATURE ELECTROSTATIC CHUCK WITH REAL-TIME HEAT ZONE REGUL...

METHODS FOR CALIBRATING RF POWER APPLIED TO A PLURALITY OF RF COILS...

SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE

METHODS AND APPARATUS FOR CONTROLLING SUBSTRATE TEMPERATURE IN A PR...