Xingyuan Tang

Person

West Linn, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of eliminating small bin defects in high throughput TEOS films
- Patent number 8,034,725
- Issue date Oct 11, 2011
- Novellus Systems, Inc.
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-K SiC copper diffusion barrier films
- Patent number 7,968,436
- Issue date Jun 28, 2011
- Novellus Systems, Inc.
- Yongsik Yu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing low-K CDO films
- Patent number 7,737,525
- Issue date Jun 15, 2010
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of eliminating small bin defects in high throughput TEOS films
- Patent number 7,704,894
- Issue date Apr 27, 2010
- Novellus Systems, Inc.
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k SiC copper diffusion barrier films
- Patent number 7,573,061
- Issue date Aug 11, 2009
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low-k CDO films
- Patent number 7,341,761
- Issue date Mar 11, 2008
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k SiC copper diffusion barrier films
- Patent number 7,282,438
- Issue date Oct 16, 2007
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide having low dielectric constant
- Patent number 6,855,645
- Issue date Feb 15, 2005
- Novellus Systems, Inc.
- Xingyuan Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hermetic silicon carbide
- Patent number 6,777,349
- Issue date Aug 17, 2004
- Novellus Systems, Inc.
- Haiying Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Silicon carbide having low dielectric constant
- Publication number 20040126929
- Publication date Jul 1, 2004
- Novellus Systems, Inc.
- Xingyuan Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hermetic silicon carbide
- Publication number 20030176080
- Publication date Sep 18, 2003
- Haiying Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Xingyuan Tang

Person

Patents Grantslast 30 patents

Method of eliminating small bin defects in high throughput TEOS films

Low-K SiC copper diffusion barrier films

Method for producing low-K CDO films

Method of eliminating small bin defects in high throughput TEOS films

Low-k SiC copper diffusion barrier films

Methods for producing low-k CDO films

Low-k SiC copper diffusion barrier films

Silicon carbide having low dielectric constant

Hermetic silicon carbide

Patents Applicationslast 30 patents

Silicon carbide having low dielectric constant

Hermetic silicon carbide