Xinkang Tian

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 12,165,937
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced resolution in semiconductor fabrication data acquisition i...
- Patent number 11,763,161
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Peak alignment for the wavelength calibration of a spectrometer
- Patent number 11,692,874
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Yan Chen
- G01 - MEASURING TESTING
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 11,538,723
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 11,538,722
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Normal-incident in-situ process monitor sensor
- Patent number 10,978,278
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synthetic wavelengths for endpoint detection in plasma etching
- Patent number 10,910,201
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical sensor for phase determination
- Patent number 10,837,902
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Ivan Maleev
- G01 - MEASURING TESTING
Information Patent Grant
Advanced optical sensor and method for detecting an optical event i...
- Patent number 10,692,705
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Mihail Mihaylov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection algorithm for atomic layer etching (ALE)
- Patent number 10,453,653
- Issue date Oct 22, 2019
- Tokyo Electron Limited
- Yan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dark field wafer nano-defect inspection system with a singular beam
- Patent number 10,345,246
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
System for in-situ film stack measurement during etching and etch c...
- Patent number 9,059,038
- Issue date Jun 16, 2015
- Tokyo Electron Limited
- Shifang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process control using optical metrology and sensor devices
- Patent number 8,193,007
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Manuel Madriaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stage measurement system
- Patent number 8,173,451
- Issue date May 8, 2012
- Tokyo Electron Limited
- Xinkang Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of designing an etch stage measurement system
- Patent number 8,173,450
- Issue date May 8, 2012
- Tokyo Electron Limited
- Xinkang Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling angle of incidence of multiple illuminati...
- Patent number 8,030,631
- Issue date Oct 4, 2011
- Tokyo Electron Limited
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Controlling angle of incidence of multiple-beam optical metrology t...
- Patent number 8,030,632
- Issue date Oct 4, 2011
- Tokyo Electron Limted
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Auto focus of a workpiece using two or more focus parameters
- Patent number 7,948,630
- Issue date May 24, 2011
- Tokyo Electron Limited
- Norton Adam
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using an optical metrology system optimiz...
- Patent number 7,761,178
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system optimized with design goals
- Patent number 7,761,250
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Designing an optical metrology system optimized with signal criteria
- Patent number 7,742,889
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for designing an optical metrology system optimized with...
- Patent number 7,734,437
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for auto focusing a workpiece using two or more focus par...
- Patent number 7,660,696
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system optimized with a plurality of design goals
- Patent number 7,595,869
- Issue date Sep 29, 2009
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Process control using an optical metrology system optimized with si...
- Patent number 7,589,845
- Issue date Sep 15, 2009
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Pattern recognition matching for bright field imaging of low contra...
- Patent number 7,538,868
- Issue date May 26, 2009
- KLA-Tencor Technologies Corporation
- Wei-Ning Shen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
HYBRID MODELING FOR FILM METROLOGY
- Publication number 20240419885
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Yan CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT
- Publication number 20240418501
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G01 - MEASURING TESTING
Information Patent Application
ROENTGEN INTEGRATED METROLOGY FOR HYBRID BONDING PROCESS CONTROL IN...
- Publication number 20240387448
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Francisco MACHUCA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DIAGNOSTICS OF SEMICONDUCTOR PROCESS USING HYPERSPECTRAL IM...
- Publication number 20230097892
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...
- Publication number 20230057763
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...
- Publication number 20230055839
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEAK ALIGNMENT FOR THE WAVELENGTH CALIBRATION OF A SPECTROMETER
- Publication number 20220381612
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yan Chen
- G01 - MEASURING TESTING
Information Patent Application
Optical Sensor for Inspecting Pattern Collapse Defects
- Publication number 20220139743
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20210193444
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNTHETIC WAVELENGTHS FOR ENDPOINT DETECTION IN PLASMA ETCHING
- Publication number 20210057195
- Publication date Feb 25, 2021
- TOKYO ELECTRON LIMITED
- Yan CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Diagnostics of Semiconductor Process Using Hyperspectral Im...
- Publication number 20200372629
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Diagnostics of Semiconductor Process Using Hyperspectral Im...
- Publication number 20200373210
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Yan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED RESOLUTION IN SEMICONDUCTOR FABRICATION DATA ACQUISITION I...
- Publication number 20200292388
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Yan CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR
- Publication number 20200043710
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSOR FOR PHASE DETERMINATION
- Publication number 20190056320
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...
- Publication number 20180286643
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Holger TUITJE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ENDPOINT DETECTION ALGORITHM FOR ATOMIC LAYER ETCHING (ALE)
- Publication number 20180068831
- Publication date Mar 8, 2018
- TOKYO ELECTRON LIMITED
- Yan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DARK FIELD WAFER NANO-DEFECT INSPECTION SYSTEM WITH A SINGULAR BEAM
- Publication number 20170350826
- Publication date Dec 7, 2017
- TOKYO ELECTRON LIMITED
- Xinkang TIAN
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER
- Publication number 20170140905
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Mihail Mihaylov
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...
- Publication number 20140024143
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Shifang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE ILLUMINATI...
- Publication number 20100243859
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- ADAM NORTON
- G01 - MEASURING TESTING
Information Patent Application
CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE- BEAM OPTICAL METROLOGY...
- Publication number 20100243860
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- ADAM NORTON
- G01 - MEASURING TESTING
Information Patent Application
AUTO FOCUS OF A WORKPIECE USING TWO OR MORE FOCUS PARAMETERS
- Publication number 20100085576
- Publication date Apr 8, 2010
- TOKYO ELECTRON LIMITED
- ADAM NORTON
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZ...
- Publication number 20090319075
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS
- Publication number 20090319214
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA
- Publication number 20090248339
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH...
- Publication number 20090248340
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SI...
- Publication number 20090248341
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR O...
- Publication number 20090240537
- Publication date Sep 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERA...
- Publication number 20090234687
- Publication date Sep 17, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G06 - COMPUTING CALCULATING COUNTING

Xinkang Tian

Person

Patents Grantslast 30 patents

Optical diagnostics of semiconductor process using hyperspectral im...

Normal-incidence in-situ process monitor sensor

Enhanced resolution in semiconductor fabrication data acquisition i...

Peak alignment for the wavelength calibration of a spectrometer

Optical diagnostics of semiconductor process using hyperspectral im...

Optical diagnostics of semiconductor process using hyperspectral im...

Normal-incident in-situ process monitor sensor

Synthetic wavelengths for endpoint detection in plasma etching

Optical sensor for phase determination

Advanced optical sensor and method for detecting an optical event i...

Endpoint detection algorithm for atomic layer etching (ALE)

Dark field wafer nano-defect inspection system with a singular beam

System for in-situ film stack measurement during etching and etch c...

Etch process control using optical metrology and sensor devices

Etch stage measurement system

Method of designing an etch stage measurement system

Apparatus for controlling angle of incidence of multiple illuminati...

Controlling angle of incidence of multiple-beam optical metrology t...

Auto focus of a workpiece using two or more focus parameters

Automated process control using an optical metrology system optimiz...

Optical metrology system optimized with design goals

Designing an optical metrology system optimized with signal criteria

Apparatus for designing an optical metrology system optimized with...

Apparatus for auto focusing a workpiece using two or more focus par...

Optical metrology system optimized with a plurality of design goals

Process control using an optical metrology system optimized with si...

Pattern recognition matching for bright field imaging of low contra...

Patents Applicationslast 30 patents

HYBRID MODELING FOR FILM METROLOGY

OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT

ROENTGEN INTEGRATED METROLOGY FOR HYBRID BONDING PROCESS CONTROL IN...

OPTICAL DIAGNOSTICS OF SEMICONDUCTOR PROCESS USING HYPERSPECTRAL IM...

OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...

OPTICAL SENSORS FOR MEASURING PROPERTIES OF CONSUMABLE PARTS IN A S...

PEAK ALIGNMENT FOR THE WAVELENGTH CALIBRATION OF A SPECTROMETER

Optical Sensor for Inspecting Pattern Collapse Defects

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

SYNTHETIC WAVELENGTHS FOR ENDPOINT DETECTION IN PLASMA ETCHING

Optical Diagnostics of Semiconductor Process Using Hyperspectral Im...

Optical Diagnostics of Semiconductor Process Using Hyperspectral Im...

ENHANCED RESOLUTION IN SEMICONDUCTOR FABRICATION DATA ACQUISITION I...

NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR

OPTICAL SENSOR FOR PHASE DETERMINATION

ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...

ENDPOINT DETECTION ALGORITHM FOR ATOMIC LAYER ETCHING (ALE)

DARK FIELD WAFER NANO-DEFECT INSPECTION SYSTEM WITH A SINGULAR BEAM

ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER

SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...

APPARATUS FOR CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE ILLUMINATI...

CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE- BEAM OPTICAL METROLOGY...

AUTO FOCUS OF A WORKPIECE USING TWO OR MORE FOCUS PARAMETERS

AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZ...

OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS

DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA

APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH...

PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SI...

APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR O...

METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERA...