Xinliang Lu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamber seasoning to improve etch uniformity by reducing chemistry
- Patent number 11,626,269
- Issue date Apr 11, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface pretreatment process to improve quality of oxide films prod...
- Patent number 11,495,437
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone for selective hydrophilic surface treatment
- Patent number 11,495,456
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing of workpieces with reactive species generated using alky...
- Patent number 11,387,111
- Issue date Jul 12, 2022
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nucleation-free gap fill ALD process
- Patent number 11,289,374
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing a workpiece using fluorine radicals
- Patent number 11,257,680
- Issue date Feb 22, 2022
- Mattson Technology, Inc.
- Qi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon oxide selective dry etch process
- Patent number 11,251,050
- Issue date Feb 15, 2022
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of workpieces using hydrogen radicals and ozone gas
- Patent number 11,164,727
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition using methylation treatment
- Patent number 11,164,742
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generation of hydrogen reactive species for processing of workpieces
- Patent number 11,164,725
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface smoothing of workpieces
- Patent number 11,107,695
- Issue date Aug 31, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treatment of silicon or silicon germanium surfaces using or...
- Patent number 11,062,910
- Issue date Jul 13, 2021
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone treatment for selective silicon nitride etch over silicon
- Patent number 11,043,393
- Issue date Jun 22, 2021
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air leak detection in plasma processing apparatus with separation grid
- Patent number 11,039,527
- Issue date Jun 15, 2021
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Grant
Integration of materials removal and surface treatment in semicondu...
- Patent number 10,964,528
- Issue date Mar 30, 2021
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber seasoning to improve etch uniformity by reducing chemistry
- Patent number 10,950,416
- Issue date Mar 16, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a workpiece
- Patent number 10,950,428
- Issue date Mar 16, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment of carbon containing films using organic radicals
- Patent number 10,910,228
- Issue date Feb 2, 2021
- Mattson Technolgoy, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of lowering wordline resistance
- Patent number 10,854,511
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Yihong Chen
- G11 - INFORMATION STORAGE
Information Patent Grant
Surface treatment of silicon and carbon containing films by remote...
- Patent number 10,804,109
- Issue date Oct 13, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Silicon oxide selective dry etch process
- Patent number 10,692,730
- Issue date Jun 23, 2020
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of materials removal and surface treatment in semicondu...
- Patent number 10,403,492
- Issue date Sep 3, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment of silicon or silicon germanium surfaces using or...
- Patent number 10,354,883
- Issue date Jul 16, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treatment of carbon containing films using organic radicals
- Patent number 10,269,574
- Issue date Apr 23, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition methods for uniform and conformal hybrid titanium oxide...
- Patent number 9,881,787
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of films comprising aluminum alloys with high aluminum c...
- Patent number 9,683,287
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning titanium alloy deposition
- Patent number 9,530,627
- Issue date Dec 27, 2016
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N-metal film deposition with initiation layer
- Patent number 9,269,584
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact clean by remote plasma and repair of silicide surface
- Patent number 9,147,578
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of N-metal films comprising aluminum alloys
- Patent number 9,145,612
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Nucleation-Free Gap Fill ALD Process
- Publication number 20220172989
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Generation of Hydrogen Reactive Species For Processing of Workpieces
- Publication number 20220059321
- Publication date Feb 24, 2022
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Smoothing of Workpieces
- Publication number 20210391185
- Publication date Dec 16, 2021
- Beijing E-Town Semiconductor Technology, Co., LTD
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
- Publication number 20210307151
- Publication date Sep 30, 2021
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Application
Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry
- Publication number 20210202214
- Publication date Jul 1, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THE TREATMENT OF WORKPIECES
- Publication number 20210082724
- Publication date Mar 18, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Processing a Workpiece Using Fluorine Radicals
- Publication number 20210066085
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Qi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon Oxide Selective Dry Etch Process
- Publication number 20210066088
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Processing a Workpiece
- Publication number 20210066074
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING OF WORKPIECES USING HYDROGEN RADICALS AND OZONE GAS
- Publication number 20210020413
- Publication date Jan 21, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Pretreatment Process To Improve Quality Of Oxide Films Prod...
- Publication number 20200373129
- Publication date Nov 26, 2020
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition Using Methylation Treatment
- Publication number 20200350161
- Publication date Nov 5, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
- Publication number 20200245444
- Publication date Jul 30, 2020
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Application
Ozone Treatment for Selective Silicon Nitride Etch Over Silicon
- Publication number 20200234969
- Publication date Jul 23, 2020
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Smoothing of Workpieces
- Publication number 20200203173
- Publication date Jun 25, 2020
- Mattson Technology, Inc.
- Qi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integration Of Materials Removal And Surface Treatment In Semicondu...
- Publication number 20200185216
- Publication date Jun 11, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry
- Publication number 20200161094
- Publication date May 21, 2020
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone for Selective Hydrophilic Surface Treatment
- Publication number 20200118813
- Publication date Apr 16, 2020
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Generation of Hydrogen Reactive Species For Processing of Workpieces
- Publication number 20190378692
- Publication date Dec 12, 2019
- Mattson Technology, Inc.
- Qi Zhang
- B08 - CLEANING
Information Patent Application
Nucleation-Free Gap Fill ALD Process
- Publication number 20190371662
- Publication date Dec 5, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Of Workpieces With Reactive Species Generated Using Alky...
- Publication number 20190318937
- Publication date Oct 17, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT OF SILICON OR SILICON GERMANIUM SURFACES USING OR...
- Publication number 20190304793
- Publication date Oct 3, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT OF CARBON CONTAINING FILMS USING ORGANIC RADICALS
- Publication number 20190214262
- Publication date Jul 11, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT OF SILICON AND CARBON CONTAINING FILMS BY REMOTE...
- Publication number 20190103270
- Publication date Apr 4, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT OF SILICON OR SILICON GERMANIUM SURFACES USING OR...
- Publication number 20190103279
- Publication date Apr 4, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT OF CARBON CONTAINING FILMS USING ORGANIC RADICALS
- Publication number 20190103280
- Publication date Apr 4, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Lowering Wordline Resistance
- Publication number 20180350606
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature Thermal ALD Silicon Nitride Films
- Publication number 20170053792
- Publication date Feb 23, 2017
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide...
- Publication number 20160372324
- Publication date Dec 22, 2016
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING TITANIUM ALLOY DEPOSITION
- Publication number 20150086722
- Publication date Mar 26, 2015
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- B08 - CLEANING

Xinliang Lu

Person

Patents Grantslast 30 patents

Chamber seasoning to improve etch uniformity by reducing chemistry

Surface pretreatment process to improve quality of oxide films prod...

Ozone for selective hydrophilic surface treatment

Processing of workpieces with reactive species generated using alky...

Nucleation-free gap fill ALD process

Methods for processing a workpiece using fluorine radicals

Silicon oxide selective dry etch process

Processing of workpieces using hydrogen radicals and ozone gas

Selective deposition using methylation treatment

Generation of hydrogen reactive species for processing of workpieces

Surface smoothing of workpieces

Surface treatment of silicon or silicon germanium surfaces using or...

Ozone treatment for selective silicon nitride etch over silicon

Air leak detection in plasma processing apparatus with separation grid

Integration of materials removal and surface treatment in semicondu...

Chamber seasoning to improve etch uniformity by reducing chemistry

Method for processing a workpiece

Surface treatment of carbon containing films using organic radicals

Methods of lowering wordline resistance

Surface treatment of silicon and carbon containing films by remote...

Silicon oxide selective dry etch process

Integration of materials removal and surface treatment in semicondu...

Surface treatment of silicon or silicon germanium surfaces using or...

Surface treatment of carbon containing films using organic radicals

Deposition methods for uniform and conformal hybrid titanium oxide...

Deposition of films comprising aluminum alloys with high aluminum c...

Method for cleaning titanium alloy deposition

N-metal film deposition with initiation layer

Contact clean by remote plasma and repair of silicide surface

Deposition of N-metal films comprising aluminum alloys

Patents Applicationslast 30 patents

Nucleation-Free Gap Fill ALD Process

Generation of Hydrogen Reactive Species For Processing of Workpieces

Surface Smoothing of Workpieces

Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry

METHODS FOR THE TREATMENT OF WORKPIECES

Methods For Processing a Workpiece Using Fluorine Radicals

Silicon Oxide Selective Dry Etch Process

Method for Processing a Workpiece

PROCESSING OF WORKPIECES USING HYDROGEN RADICALS AND OZONE GAS

Surface Pretreatment Process To Improve Quality Of Oxide Films Prod...

Selective Deposition Using Methylation Treatment

Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Ozone Treatment for Selective Silicon Nitride Etch Over Silicon

Surface Smoothing of Workpieces

Integration Of Materials Removal And Surface Treatment In Semicondu...

Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry

Ozone for Selective Hydrophilic Surface Treatment

Generation of Hydrogen Reactive Species For Processing of Workpieces

Nucleation-Free Gap Fill ALD Process

Processing Of Workpieces With Reactive Species Generated Using Alky...

SURFACE TREATMENT OF SILICON OR SILICON GERMANIUM SURFACES USING OR...

SURFACE TREATMENT OF CARBON CONTAINING FILMS USING ORGANIC RADICALS

SURFACE TREATMENT OF SILICON AND CARBON CONTAINING FILMS BY REMOTE...

SURFACE TREATMENT OF SILICON OR SILICON GERMANIUM SURFACES USING OR...

SURFACE TREATMENT OF CARBON CONTAINING FILMS USING ORGANIC RADICALS

Methods Of Lowering Wordline Resistance

High Temperature Thermal ALD Silicon Nitride Films

Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide...

METHOD FOR CLEANING TITANIUM ALLOY DEPOSITION