Xinrong JIANG

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tilt-column multi-beam electron microscopy system and method
- Patent number 12,068,129
- Issue date Aug 20, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput multi-electron beam system
- Patent number 11,869,743
- Issue date Jan 9, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of creating multiple electron beams
- Patent number 11,651,934
- Issue date May 16, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution electron beam apparatus with dual-aperture schemes
- Patent number 11,508,591
- Issue date Nov 22, 2022
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam system for inspection and review of 3D devices
- Patent number 11,335,608
- Issue date May 17, 2022
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro stigmator array for multi electron beam system
- Patent number 11,056,312
- Issue date Jul 6, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution electron energy analyzer
- Patent number 10,964,522
- Issue date Mar 30, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for edge-of-wafer inspection and review
- Patent number 10,770,258
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection array apparatus for multi-electron beam system
- Patent number 10,748,739
- Issue date Aug 18, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for aberration correction in an electron beam system
- Patent number 10,224,177
- Issue date Mar 5, 2019
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus with high resolutions
- Patent number 10,096,447
- Issue date Oct 9, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for aberration correction in an electron beam system
- Patent number 10,090,131
- Issue date Oct 2, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for edge-of-wafer inspection and review
- Patent number 10,056,224
- Issue date Aug 21, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extractor electrode for electron source
- Patent number 9,934,933
- Issue date Apr 3, 2018
- KLA-Tencor Corporation
- Laurence S. Hordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for imaging a sample with an electron beam with a...
- Patent number 9,905,391
- Issue date Feb 27, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat-spreading blanking system for high throughput electron beam ap...
- Patent number 9,881,764
- Issue date Jan 30, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam imaging with dual Wien-filter monochromator
- Patent number 9,443,696
- Issue date Sep 13, 2016
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for high-resolution electron beam imaging
- Patent number 9,053,900
- Issue date Jun 9, 2015
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tilt-imaging scanning electron microscope
- Patent number 8,921,782
- Issue date Dec 30, 2014
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-lens-gun electron beam apparatus and methods for high-resoluti...
- Patent number 8,859,982
- Issue date Oct 14, 2014
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-optical system for high-speed and high-sensitivity inspect...
- Patent number 8,664,594
- Issue date Mar 4, 2014
- KLA-Tencor Corporation
- Xinrong Jiang
- G01 - MEASURING TESTING
Information Patent Grant
Multiple-pole electrostatic deflector for improving throughput of f...
- Patent number 8,536,538
- Issue date Sep 17, 2013
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam column and methods of using same
- Patent number 8,461,526
- Issue date Jun 11, 2013
- KLA-Tencor Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-beam system for high-speed electron-beam inspection
- Patent number 8,362,425
- Issue date Jan 29, 2013
- KLA-Tencor Corporation
- Liqun Han
- G01 - MEASURING TESTING
Information Patent Grant
High-sensitivity and high-throughput electron beam inspection colum...
- Patent number 8,294,125
- Issue date Oct 23, 2012
- KLA-Tencor Corporation
- Liqun Han
- G01 - MEASURING TESTING
Information Patent Grant
Immersion gun equipped electron beam column
- Patent number 7,821,187
- Issue date Oct 26, 2010
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-function module for an electron beam column
- Patent number 7,800,075
- Issue date Sep 21, 2010
- Benyamin Buller
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam column for writing shaped electron beams
- Patent number 7,427,765
- Issue date Sep 23, 2008
- Jeol, Ltd.
- Benyamin Buller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for multiple charged particle beams
- Patent number 7,262,418
- Issue date Aug 28, 2007
- Applied Materials, Inc.
- Chiwoei Wayne Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for multiple charged particle beams
- Patent number 7,067,809
- Issue date Jun 27, 2006
- Applied Materials, Inc.
- Chiwoei Wayne Lo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR MULTI-BEAM ELECTRON MICROSCOPY USING A DETECT...
- Publication number 20240194440
- Publication date Jun 13, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TILT-COLUMN MULTI-BEAM ELECTRON MICROSCOPY SYSTEM AND METHOD
- Publication number 20240153737
- Publication date May 9, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Multiple Electron Beams with a Photocathode Film
- Publication number 20230395349
- Publication date Dec 7, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods of Creating Multiple Electron Beams
- Publication number 20230109032
- Publication date Apr 6, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RESOLUTION, MULTI-ELECTRON BEAM APPARATUS
- Publication number 20230066086
- Publication date Mar 2, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT MULTI-ELECTRON BEAM SYSTEM
- Publication number 20220367140
- Publication date Nov 17, 2022
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RESOLUTION ELECTRON BEAM APPARATUS WITH DUAL-APERTURE SCHEMES
- Publication number 20220254667
- Publication date Aug 11, 2022
- KLA Corporation
- Xinrong Jiang
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE
- Publication number 20220108862
- Publication date Apr 7, 2022
- KLA Corporation
- Nikolai Chubun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM SYSTEM FOR INSPECTION AND REVIEW OF 3D DEVICES
- Publication number 20210327770
- Publication date Oct 21, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Joint Electron-Optical Columns for Flood-Charging and Image-Forming...
- Publication number 20200194223
- Publication date Jun 18, 2020
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deflection Array Apparatus for Multi-Electron Beam System
- Publication number 20200118784
- Publication date Apr 16, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Resolution Electron Energy Analyzer
- Publication number 20190378705
- Publication date Dec 12, 2019
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Edge-of-Wafer Inspection and Review
- Publication number 20190006143
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Aberration Correction in an Electron Beam System
- Publication number 20180158644
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSFER OF PARTICULATE MATERIAL
- Publication number 20180141126
- Publication date May 24, 2018
- Velo3D, Inc.
- Benyamin BULLER
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
HEAT-SPREADING BLANKING SYSTEM FOR HIGH THROUGHPUT ELECTRON BEAM AP...
- Publication number 20170200581
- Publication date Jul 13, 2017
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Edge-of-Wafer Inspection and Review
- Publication number 20170047193
- Publication date Feb 16, 2017
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Aberration Correction in an Electron Beam System
- Publication number 20160329189
- Publication date Nov 10, 2016
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Imaging a Sample with an Electron Beam with a...
- Publication number 20160322190
- Publication date Nov 3, 2016
- KLA-Technology Drive
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IMAGING WITH DUAL WIEN-FILTER MONOCHROMATOR
- Publication number 20150340200
- Publication date Nov 26, 2015
- KLA-Tencor Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TILT-IMAGING SCANNING ELECTRON MICROSCOPE
- Publication number 20140151552
- Publication date Jun 5, 2014
- KLA-Tencor Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTI...
- Publication number 20140077077
- Publication date Mar 20, 2014
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR HIGH-RESOLUTION ELECTRON BEAM IMAGING
- Publication number 20130256530
- Publication date Oct 3, 2013
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION
- Publication number 20120241606
- Publication date Sep 27, 2012
- Liqun Han
- G01 - MEASURING TESTING
Information Patent Application
MULTIPLE-POLE ELECTROSTATIC DEFLECTOR FOR IMPROVING THROUGHPUT OF F...
- Publication number 20120205537
- Publication date Aug 16, 2012
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM COLUMN AND METHODS OF USING SAME
- Publication number 20120138791
- Publication date Jun 7, 2012
- Marian MANKOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Sensitivity and High-Throughput Electron Beam Inspection Colum...
- Publication number 20110114838
- Publication date May 19, 2011
- Liqun HAN
- G01 - MEASURING TESTING
Information Patent Application
MULTI-FUNCTION MODULE FOR AN ELECTRON BEAM COLUMN
- Publication number 20080308751
- Publication date Dec 18, 2008
- JEOL, Inc.
- Benyamin Buller
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam column for writing shaped electron beams
- Publication number 20070085033
- Publication date Apr 19, 2007
- APPLIED MATERIALS, INC.
- Benyamin Buller
- B82 - NANO-TECHNOLOGY

Xinrong JIANG

Person

Patents Grantslast 30 patents

Tilt-column multi-beam electron microscopy system and method

High throughput multi-electron beam system

Systems and methods of creating multiple electron beams

High resolution electron beam apparatus with dual-aperture schemes

Electron beam system for inspection and review of 3D devices

Micro stigmator array for multi electron beam system

High resolution electron energy analyzer

Method and system for edge-of-wafer inspection and review

Deflection array apparatus for multi-electron beam system

Method and system for aberration correction in an electron beam system

Electron beam apparatus with high resolutions

Method and system for aberration correction in an electron beam system

Method and system for edge-of-wafer inspection and review

Extractor electrode for electron source

System and method for imaging a sample with an electron beam with a...

Heat-spreading blanking system for high throughput electron beam ap...

Electron beam imaging with dual Wien-filter monochromator

Apparatus and methods for high-resolution electron beam imaging

Tilt-imaging scanning electron microscope

Dual-lens-gun electron beam apparatus and methods for high-resoluti...

Electron-optical system for high-speed and high-sensitivity inspect...

Multiple-pole electrostatic deflector for improving throughput of f...

Electron beam column and methods of using same

Multiple-beam system for high-speed electron-beam inspection

High-sensitivity and high-throughput electron beam inspection colum...

Immersion gun equipped electron beam column

Multi-function module for an electron beam column

Electron beam column for writing shaped electron beams

Method and apparatus for multiple charged particle beams

Method and apparatus for multiple charged particle beams

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR MULTI-BEAM ELECTRON MICROSCOPY USING A DETECT...

TILT-COLUMN MULTI-BEAM ELECTRON MICROSCOPY SYSTEM AND METHOD

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS

Creating Multiple Electron Beams with a Photocathode Film

Systems and Methods of Creating Multiple Electron Beams

HIGH RESOLUTION, MULTI-ELECTRON BEAM APPARATUS

HIGH THROUGHPUT MULTI-ELECTRON BEAM SYSTEM

HIGH RESOLUTION ELECTRON BEAM APPARATUS WITH DUAL-APERTURE SCHEMES

ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE

ELECTRON BEAM SYSTEM FOR INSPECTION AND REVIEW OF 3D DEVICES

Joint Electron-Optical Columns for Flood-Charging and Image-Forming...

Deflection Array Apparatus for Multi-Electron Beam System

High Resolution Electron Energy Analyzer

Method and System for Edge-of-Wafer Inspection and Review

Method and System for Aberration Correction in an Electron Beam System

TRANSFER OF PARTICULATE MATERIAL

HEAT-SPREADING BLANKING SYSTEM FOR HIGH THROUGHPUT ELECTRON BEAM AP...

Method and System for Edge-of-Wafer Inspection and Review

Method and System for Aberration Correction in an Electron Beam System

System and Method for Imaging a Sample with an Electron Beam with a...

ELECTRON BEAM IMAGING WITH DUAL WIEN-FILTER MONOCHROMATOR

TILT-IMAGING SCANNING ELECTRON MICROSCOPE

DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTI...

APPARATUS AND METHODS FOR HIGH-RESOLUTION ELECTRON BEAM IMAGING

MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION

MULTIPLE-POLE ELECTROSTATIC DEFLECTOR FOR IMPROVING THROUGHPUT OF F...

ELECTRON BEAM COLUMN AND METHODS OF USING SAME

High-Sensitivity and High-Throughput Electron Beam Inspection Colum...

MULTI-FUNCTION MODULE FOR AN ELECTRON BEAM COLUMN

Electron beam column for writing shaped electron beams