Xintuo Dai

Person

Malta, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,231,654
- Issue date Jan 25, 2022
- GLOBALFOUNDRIES U.S. Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method to improve overlay performance in semiconducto...
- Patent number 10,833,022
- Issue date Nov 10, 2020
- GLOBALFOUNDRIES Inc.
- Cung D. Tran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay control with corrections for lens aberrations
- Patent number 10,809,633
- Issue date Oct 20, 2020
- GLOBALFOUNDRIES Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 10,705,435
- Issue date Jul 7, 2020
- GLOBALFOUNDRIES Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for aligning integrated circuit layers using m...
- Patent number 10,635,007
- Issue date Apr 28, 2020
- GLOBALFOUNDRIES Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method to improve overlay performance in semiconducto...
- Patent number 10,504,851
- Issue date Dec 10, 2019
- GLOBALFOUNDRIES Inc.
- Cung D. Tran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay structures
- Patent number 10,483,214
- Issue date Nov 19, 2019
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preventing bridge formation between replacement gate and source/dra...
- Patent number 10,062,772
- Issue date Aug 28, 2018
- GLOBALFOUNDRIES Inc.
- Haigou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Siloxane and organic-based MOL contact patterning
- Patent number 10,056,458
- Issue date Aug 21, 2018
- GLOBALFOUNDRIES Inc.
- Chang Ho Maeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for performing a gate cut last scheme for FinFET semiconduc...
- Patent number 9,991,361
- Issue date Jun 5, 2018
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gate formation in circuit structures
- Patent number 9,947,545
- Issue date Apr 17, 2018
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to control fin tip placement
- Patent number 9,812,324
- Issue date Nov 7, 2017
- GLOBALFOUNDRIES Inc.
- Lei Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Threshold voltage and well implantation method for semiconductor de...
- Patent number 9,780,002
- Issue date Oct 3, 2017
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Introducing self-aligned dopants in semiconductor fins
- Patent number 9,698,018
- Issue date Jul 4, 2017
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gate formation in circuit structures
- Patent number 9,640,402
- Issue date May 2, 2017
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming self-aligned contacts on FinFET devices
- Patent number 9,627,274
- Issue date Apr 18, 2017
- GLOBALFOUNDRIES Inc.
- Haifeng Sheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits using self-aligned quad...
- Patent number 9,620,380
- Issue date Apr 11, 2017
- GLOBALFOUNDRIES, INC.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating space decomposition in circuit structure fabrication
- Patent number 9,606,432
- Issue date Mar 28, 2017
- GLOBALFOUNDRIES, INC.
- Guoxiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay metrology system and method
- Patent number 9,329,495
- Issue date May 3, 2016
- GLOBALFOUNDRIES Inc.
- Xintuo Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Achieving a critical dimension target based on resist characteristics
- Patent number 9,329,471
- Issue date May 3, 2016
- GLOBALFOUNDRIES Inc.
- Guoxiang Ning
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
FULLY SELF ALIGNED VIA INTEGRATION PROCESSES
- Publication number 20230066543
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Xintuo DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20220334502
- Publication date Oct 20, 2022
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20200241429
- Publication date Jul 30, 2020
- GLOBALFOUNDRIES INC.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR ALIGNING INTEGRATED CIRCUIT LAYERS USING M...
- Publication number 20200152498
- Publication date May 14, 2020
- GLOBALFOUNDRIES INC.
- Dongyue Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD TO IMPROVE OVERLAY PERFORMANCE IN SEMICONDUCTO...
- Publication number 20200051923
- Publication date Feb 13, 2020
- GLOBALFOUNDRIES INC.
- Cung D. Tran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD TO IMPROVE OVERLAY PERFORMANCE IN SEMICONDUCTO...
- Publication number 20190267329
- Publication date Aug 29, 2019
- GLOBALFOUNDRIES INC.
- Cung D. Tran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20190219930
- Publication date Jul 18, 2019
- GLOBALFOUNDRIES INC.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY STRUCTURES
- Publication number 20190206802
- Publication date Jul 4, 2019
- GLOBALFOUNDRIES INC.
- Xintuo DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTING BRIDGE FORMATION BETWEEN REPLACEMENT GATE AND SOURCE/DRA...
- Publication number 20180033870
- Publication date Feb 1, 2018
- GLOBALFOUNDRIES INC.
- Haigou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PERFORMING A GATE CUT LAST SCHEME FOR FINFET SEMICONDUC...
- Publication number 20170345913
- Publication date Nov 30, 2017
- GLOBALFOUNDRIES INC.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR GATE FORMATION IN CIRCUIT STRUCTURES
- Publication number 20170243748
- Publication date Aug 24, 2017
- GLOBALFOUNDRIES INC.
- Xintuo DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILOXANE AND ORGANIC-BASED MOL CONTACT PATTERNING
- Publication number 20170200792
- Publication date Jul 13, 2017
- GLOBALFOUNDRIES INC.
- Chang Ho MAENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PRODUCING INTEGRATED CIRCUITS WITH AIR GAPS AND INTEGRA...
- Publication number 20170162430
- Publication date Jun 8, 2017
- GLOBALFOUNDRIES, Inc.
- Xintuo Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACHIEVING A CRITICAL DIMENSION TARGET BASED ON RESIST CHARACTERISTICS
- Publication number 20160125121
- Publication date May 5, 2016
- Guoxiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALTERNATING SPACE DECOMPOSITION IN CIRCUIT STRUCTURE FABRICATION
- Publication number 20160124308
- Publication date May 5, 2016
- GLOBALFOUNDRIES, Inc.
- Guoxiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY SYSTEM AND METHOD
- Publication number 20150138555
- Publication date May 21, 2015
- GLOBALFOUNDRIES INC.
- Xintuo DAI
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Self-referencing and self-calibrating interference pattern overlay...

Self-referencing and self-calibrating interference pattern overlay...

Structure and method to improve overlay performance in semiconducto...

Overlay control with corrections for lens aberrations

Self-referencing and self-calibrating interference pattern overlay...

Apparatus and method for aligning integrated circuit layers using m...

Structure and method to improve overlay performance in semiconducto...

Overlay structures

Preventing bridge formation between replacement gate and source/dra...

Siloxane and organic-based MOL contact patterning

Methods for performing a gate cut last scheme for FinFET semiconduc...

Methods for gate formation in circuit structures

Methods to control fin tip placement

Threshold voltage and well implantation method for semiconductor de...

Introducing self-aligned dopants in semiconductor fins

Methods for gate formation in circuit structures

Methods of forming self-aligned contacts on FinFET devices

Methods for fabricating integrated circuits using self-aligned quad...

Alternating space decomposition in circuit structure fabrication

Overlay metrology system and method

Achieving a critical dimension target based on resist characteristics

Patents Applicationslast 30 patents

FULLY SELF ALIGNED VIA INTEGRATION PROCESSES

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

APPARATUS AND METHOD FOR ALIGNING INTEGRATED CIRCUIT LAYERS USING M...

STRUCTURE AND METHOD TO IMPROVE OVERLAY PERFORMANCE IN SEMICONDUCTO...

STRUCTURE AND METHOD TO IMPROVE OVERLAY PERFORMANCE IN SEMICONDUCTO...

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

OVERLAY STRUCTURES

PREVENTING BRIDGE FORMATION BETWEEN REPLACEMENT GATE AND SOURCE/DRA...

METHODS FOR PERFORMING A GATE CUT LAST SCHEME FOR FINFET SEMICONDUC...

METHODS FOR GATE FORMATION IN CIRCUIT STRUCTURES

SILOXANE AND ORGANIC-BASED MOL CONTACT PATTERNING

METHODS FOR PRODUCING INTEGRATED CIRCUITS WITH AIR GAPS AND INTEGRA...

ACHIEVING A CRITICAL DIMENSION TARGET BASED ON RESIST CHARACTERISTICS

ALTERNATING SPACE DECOMPOSITION IN CIRCUIT STRUCTURE FABRICATION

OVERLAY METROLOGY SYSTEM AND METHOD