Xinyu Fu

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 11,887,855
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 10,985,023
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 10,718,049
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 10,699,946
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Bhushan N. Zope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing metal films using metal oxyhalide precursors
- Patent number 10,483,116
- Issue date Nov 19, 2019
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 10,269,633
- Issue date Apr 23, 2019
- Applied Materials, Inc.
- Bhushan N. Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective deposition of metal silicides via atomic laye...
- Patent number 10,199,230
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of depositing metal films using metal oxyhalide precursors
- Patent number 10,121,671
- Issue date Nov 6, 2018
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming low-resistance contacts through integrated proc...
- Patent number 9,947,578
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Yu Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten films by organometallic or silane pre-treatment of substrate
- Patent number 9,922,872
- Issue date Mar 20, 2018
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 9,842,769
- Issue date Dec 12, 2017
- Applied Materials, Inc.
- Bhushan N. Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 9,834,840
- Issue date Dec 5, 2017
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 9,685,371
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- Bhushan N. Zope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 9,601,339
- Issue date Mar 21, 2017
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for etching via atomic layer deposition (ALD) cycles
- Patent number 9,595,466
- Issue date Mar 14, 2017
- Applied Materials, Inc.
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 9,330,939
- Issue date May 3, 2016
- Applied Materials, Inc.
- Bhushan N. Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 9,230,815
- Issue date Jan 5, 2016
- Appled Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated platform for fabricating n-type metal oxide semiconducto...
- Patent number 9,230,835
- Issue date Jan 5, 2016
- Applied Materials, Inc.
- Avgerinos V. Gelatos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of N-metal films comprising aluminum alloys
- Patent number 9,145,612
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition methods for metal gate electrodes
- Patent number 9,082,702
- Issue date Jul 14, 2015
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming layers on a substrate
- Patent number 8,993,434
- Issue date Mar 31, 2015
- Applied Materials, Inc.
- Jick M. Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing metal gates
- Patent number 8,987,080
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing native oxide and associated residue from a subs...
- Patent number 8,951,913
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for annealing a contact metal layer to form a metal silicid...
- Patent number 8,927,423
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnet array in a sputter reactor
- Patent number 8,871,064
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for segregating the alloying elements and reducing the resid...
- Patent number 8,852,674
- Issue date Oct 7, 2014
- Applied Materials, Inc.
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing native oxide and associated residue from a subs...
- Patent number 8,772,162
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post deposition treatments for CVD cobalt films
- Patent number 8,765,601
- Issue date Jul 1, 2014
- Applied Materials, Inc.
- Yu Lei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for metal deposition using hydrogen plasma
- Patent number 8,637,410
- Issue date Jan 28, 2014
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a contact metal layer in semiconductor devices
- Patent number 8,586,479
- Issue date Nov 19, 2013
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
- Publication number 20210225655
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
- Publication number 20190088489
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20180068890
- Publication date Mar 8, 2018
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
- Publication number 20170194156
- Publication date Jul 6, 2017
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING LOW-RESISTANCE CONTACTS THROUGH INTEGRATED PROC...
- Publication number 20170148670
- Publication date May 25, 2017
- Applied Materials, Inc.
- YU LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20170084486
- Publication date Mar 23, 2017
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
- Publication number 20170062224
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Films by Organometallic or Silane Pre-Treatment of Substrate
- Publication number 20160336222
- Publication date Nov 17, 2016
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE DEPOSITION OF METAL SILICIDES VIA ATOMIC LAYE...
- Publication number 20160322229
- Publication date Nov 3, 2016
- Applied Materials, Inc.
- Seshadri GANGULI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING VIA ATOMIC LAYER DEPOSITION (ALD) CYCLES
- Publication number 20160276214
- Publication date Sep 22, 2016
- Applied Materials, Inc.
- Xinyu FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20160247718
- Publication date Aug 25, 2016
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THERMALLY FORMING A SELECTIVE COBALT LAYER
- Publication number 20160133563
- Publication date May 12, 2016
- Applied Materials, Inc.
- HUA AI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
- Publication number 20160104624
- Publication date Apr 14, 2016
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20150093891
- Publication date Apr 2, 2015
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...
- Publication number 20140295665
- Publication date Oct 2, 2014
- Bo ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED PLATFORM FOR FABRICATING N-TYPE METAL OXIDE SEMICONDUCTO...
- Publication number 20140273515
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- AVGERINOS V. GELATOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING FLUORINE/CARBON-FREE CONFORMAL TUNGSTEN
- Publication number 20140120723
- Publication date May 1, 2014
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Of N-Metal Films Comprising Aluminum Alloys
- Publication number 20140017408
- Publication date Jan 16, 2014
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST DEPOSITION TREATMENTS FOR CVD COBALT FILMS
- Publication number 20140011354
- Publication date Jan 9, 2014
- Applied Materials, Inc.
- Yu LEI
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...
- Publication number 20130316533
- Publication date Nov 28, 2013
- Bo ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Manufacturing Metal Gates
- Publication number 20130295759
- Publication date Nov 7, 2013
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20130260555
- Publication date Oct 3, 2013
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Deposition Methods For Metal Gate Electrodes
- Publication number 20130221445
- Publication date Aug 29, 2013
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A CONTACT METAL LAYER IN SEMICONDUCTOR DEVICES
- Publication number 20130189840
- Publication date Jul 25, 2013
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR ANNEALING A METAL CONTACT LAYER TO FORM A METAL SILICID...
- Publication number 20130157460
- Publication date Jun 20, 2013
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL GATE STRUCTURE ON A SUBSTRATE
- Publication number 20130102144
- Publication date Apr 25, 2013
- Applied Materials, Inc.
- JIANXIN LEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Metal Deposition Using Hydrogen Plasma
- Publication number 20120258602
- Publication date Oct 11, 2012
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST DEPOSITION TREATMENTS FOR CVD COBALT FILMS
- Publication number 20120252207
- Publication date Oct 4, 2012
- Applied Materials, Inc.
- Yu Lei
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method For Segregating The Alloying Elements And Reducing The Resid...
- Publication number 20120121799
- Publication date May 17, 2012
- Applied Materials, Inc.
- XINYU FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING LAYERS ON A SUBSTRATE
- Publication number 20120070982
- Publication date Mar 22, 2012
- Applied Materials, Inc.
- JICK M. YU
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Methods for depositing fluorine/carbon-free conformal tungsten

Methods for depositing fluorine/carbon-free conformal tungsten

Process kit shield for improved particle reduction

Method of enabling seamless cobalt gap-fill

Methods of depositing metal films using metal oxyhalide precursors

Method of enabling seamless cobalt gap-fill

Methods for selective deposition of metal silicides via atomic laye...

Methods of depositing metal films using metal oxyhalide precursors

Methods for forming low-resistance contacts through integrated proc...

Tungsten films by organometallic or silane pre-treatment of substrate

Method of enabling seamless cobalt gap-fill

Process kit shield for improved particle reduction

Method of enabling seamless cobalt gap-fill

Methods for depositing fluorine/carbon-free conformal tungsten

Methods for etching via atomic layer deposition (ALD) cycles

Method of enabling seamless cobalt gap-fill

Methods for depositing fluorine/carbon-free conformal tungsten

Integrated platform for fabricating n-type metal oxide semiconducto...

Deposition of N-metal films comprising aluminum alloys

Atomic layer deposition methods for metal gate electrodes

Methods for forming layers on a substrate

Methods for manufacturing metal gates

Method for removing native oxide and associated residue from a subs...

Methods for annealing a contact metal layer to form a metal silicid...

Electromagnet array in a sputter reactor

Method for segregating the alloying elements and reducing the resid...

Method for removing native oxide and associated residue from a subs...

Post deposition treatments for CVD cobalt films

Method for metal deposition using hydrogen plasma

Methods for forming a contact metal layer in semiconductor devices

Patents Applicationslast 30 patents

Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten

Methods of Depositing Metal Films Using Metal Oxyhalide Precursors

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten

METHODS FOR FORMING LOW-RESISTANCE CONTACTS THROUGH INTEGRATED PROC...

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

Methods of Depositing Metal Films Using Metal Oxyhalide Precursors

Tungsten Films by Organometallic or Silane Pre-Treatment of Substrate

METHODS FOR SELECTIVE DEPOSITION OF METAL SILICIDES VIA ATOMIC LAYE...

METHODS FOR ETCHING VIA ATOMIC LAYER DEPOSITION (ALD) CYCLES

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

METHODS FOR THERMALLY FORMING A SELECTIVE COBALT LAYER

Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...

INTEGRATED PLATFORM FOR FABRICATING N-TYPE METAL OXIDE SEMICONDUCTO...

METHODS FOR DEPOSITING FLUORINE/CARBON-FREE CONFORMAL TUNGSTEN

Deposition Of N-Metal Films Comprising Aluminum Alloys

POST DEPOSITION TREATMENTS FOR CVD COBALT FILMS

METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...

Methods For Manufacturing Metal Gates

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

Atomic Layer Deposition Methods For Metal Gate Electrodes

METHODS FOR FORMING A CONTACT METAL LAYER IN SEMICONDUCTOR DEVICES

METHODS FOR ANNEALING A METAL CONTACT LAYER TO FORM A METAL SILICID...

METHODS FOR FORMING A METAL GATE STRUCTURE ON A SUBSTRATE

Method for Metal Deposition Using Hydrogen Plasma

POST DEPOSITION TREATMENTS FOR CVD COBALT FILMS

Method For Segregating The Alloying Elements And Reducing The Resid...

METHODS FOR FORMING LAYERS ON A SUBSTRATE