Xuan-Yang ZHENG

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Tainan City, TW

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Patents Grantslast 30 patents

Information Patent Grant
Valve for throttling gas flow from a semiconductor processing tool
- Patent number 12,055,228
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Sheng-Chun Yang
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Gas flow accelerator to prevent buildup of processing byproduct in...
- Patent number 11,972,957
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-chun Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS FLOW ACCELERATOR TO PREVENT BUILDUP OF PROCESSING BYPRODUCT IN...
- Publication number 20240258123
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-chun YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR PROCESSING WAFER
- Publication number 20230069237
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- SHENG-CHUN YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VALVE FOR THROTTLING GAS FLOW FROM A SEMICONDUCTOR PROCESSING TOOL
- Publication number 20220403945
- Publication date Dec 22, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Sheng-Chun Yang
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
GAS FLOW ACCELERATOR TO PREVENT BUILDUP OF PROCESSING BYPRODUCT IN...
- Publication number 20220037169
- Publication date Feb 3, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Sheng-chun YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...