Xue Li

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing simulation methods and simulation dev...
- Patent number 10,496,785
- Issue date Dec 3, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zheng Fang Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to optimize standard cells manufacturability
- Patent number 10,262,097
- Issue date Apr 16, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lin Hong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Layout design method and system
- Patent number 9,489,481
- Issue date Nov 8, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device with polymer layers and two-step self-aligned source etch wi...
- Patent number 7,919,810
- Issue date Apr 5, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zhongshan Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-step self-aligned source etch with large process window
- Patent number 7,645,667
- Issue date Jan 12, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zhongshan Hong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO OPTIMIZE STANDARD CELLS MANUFACTURABILITY
- Publication number 20170300609
- Publication date Oct 19, 2017
- SEMICONDUCTOR MANUFACTUING INTERNATIONAL (SHANGHAI) CORPORATION
- LIN HONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHEMICAL MECHANICAL POLISHING SIMULATION METHODS AND SIMULATION DEV...
- Publication number 20170293711
- Publication date Oct 12, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zheng Fang LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LAYOUT DESIGN METHOD AND SYSTEM
- Publication number 20150370957
- Publication date Dec 24, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang FAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Two-Step Self-Aligned Source Etch With Large Process Window
- Publication number 20100123179
- Publication date May 20, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zhongshan Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO-STEP SELF-ALIGNED SOURCE ETCH WTIH LARGE PROCESS WINDOW
- Publication number 20080128777
- Publication date Jun 5, 2008
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zhongshan Hong
- H01 - BASIC ELECTRIC ELEMENTS