Xuefeng Liu

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Deep ultraviolet laser using strontium tetraborate for frequency co...
- Patent number 11,899,338
- Issue date Feb 13, 2024
- KLA Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous degenerate elliptical retarder for sensitive particle de...
- Patent number 11,879,853
- Issue date Jan 23, 2024
- KLA Corporation
- Xuefeng Liu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
United states frequency conversion using interdigitated nonlinear c...
- Patent number 11,815,784
- Issue date Nov 14, 2023
- KLA Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Grant
Frequency conversion using interdigitated nonlinear crystal gratings
- Patent number 11,567,391
- Issue date Jan 31, 2023
- KLA Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Grant
Sensitive particle detection with spatially-varying polarization ro...
- Patent number 11,243,175
- Issue date Feb 8, 2022
- KLA Corporation
- Xuefeng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-environment polarized infrared reflectometer for semiconducto...
- Patent number 11,231,362
- Issue date Jan 25, 2022
- KLA Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology system and method
- Patent number 11,067,389
- Issue date Jul 20, 2021
- KLA Corporation
- Yung-Ho Alex Chuang
- G01 - MEASURING TESTING
Information Patent Grant
Sensitive particle detection with spatially-varying polarization ro...
- Patent number 10,948,423
- Issue date Mar 16, 2021
- KLA Corporation
- Xuefeng Liu
- G01 - MEASURING TESTING
Information Patent Grant
Photocathode including field emitter array on a silicon substrate w...
- Patent number 10,748,730
- Issue date Aug 18, 2020
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron source
- Patent number 10,558,123
- Issue date Feb 11, 2020
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing an optical parametric model for structural ana...
- Patent number 10,325,004
- Issue date Jun 18, 2019
- KLA-Tencor Corporation
- Thaddeus G. Dziura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron-bombarded charge-coupled device and inspection systems usi...
- Patent number 10,197,501
- Issue date Feb 5, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G01 - MEASURING TESTING
Information Patent Grant
Electron source
- Patent number 10,133,181
- Issue date Nov 20, 2018
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology with reduced focus error sensitivity
- Patent number 9,970,863
- Issue date May 15, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Multi-column electron beam lithography including field emitters on...
- Patent number 9,966,230
- Issue date May 8, 2018
- KLA-Tencor Corporation
- Yung-Ho Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining one or more optical characteristi...
- Patent number 9,448,184
- Issue date Sep 20, 2016
- KLA-Tencor Corporation
- Xuefeng Liu
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing an optical parametric model for structural analysis usin...
- Patent number 9,310,296
- Issue date Apr 12, 2016
- KLA-Tencor Corporation
- Thaddeus G. Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Method of electromagnetic modeling of finite structures and finite...
- Patent number 9,291,554
- Issue date Mar 22, 2016
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Grant
Illumination subsystems of a metrology system, metrology systems, a...
- Patent number 9,080,990
- Issue date Jul 14, 2015
- KLA-Tencor Corp.
- Yung-Ho (Alex) Chuang
- G01 - MEASURING TESTING
Information Patent Grant
Illuminating a specimen for metrology or inspection
- Patent number 9,080,991
- Issue date Jul 14, 2015
- KLA-Tencor Corp.
- Yung-Ho (Alex) Chuang
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods for high aspect ratio and large later...
- Patent number 8,860,937
- Issue date Oct 14, 2014
- KLA-Tencor Corp.
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Process aware metrology
- Patent number 8,832,611
- Issue date Sep 9, 2014
- KLA-Tencor Corp.
- Xuefeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining one or more optical characteristi...
- Patent number 8,675,188
- Issue date Mar 18, 2014
- KLA-Tencor Corporation
- Xuefeng Liu
- G01 - MEASURING TESTING
Information Patent Grant
Process aware metrology
- Patent number 8,468,471
- Issue date Jun 18, 2013
- KLA-Tencor Corp.
- Xuefeng Liu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
DEEP ULTRAVIOLET LASER USING STRONTIUM TETRABORATE FOR FREQUENCY CO...
- Publication number 20230185158
- Publication date Jun 15, 2023
- KLA Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Frequency Conversion Using Interdigitated Nonlinear Crystal Gratings
- Publication number 20230161221
- Publication date May 25, 2023
- KLA Corporation
- Yung-Ho Alex Chuang
- G02 - OPTICS
Information Patent Application
CONTINUOUS DEGENERATE ELLIPTICAL RETARDER FOR SENSITIVE PARTICLE DE...
- Publication number 20220268710
- Publication date Aug 25, 2022
- Xuefeng Liu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
SENSITIVE PARTICLE DETECTION WITH SPATIALLY-VARYING POLARIZATION RO...
- Publication number 20210164918
- Publication date Jun 3, 2021
- KLA Corporation
- Xuefeng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sensitive Particle Detection with Spatially-Varying Polarization Ro...
- Publication number 20200264109
- Publication date Aug 20, 2020
- KLA Corporation
- Xuefeng Liu
- G01 - MEASURING TESTING
Information Patent Application
Overlay Metrology System and Method
- Publication number 20190285407
- Publication date Sep 19, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G01 - MEASURING TESTING
Information Patent Application
Electron Source
- Publication number 20190049851
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-Column Electron Beam Lithography Including Field Emitters on...
- Publication number 20180108514
- Publication date Apr 19, 2018
- KLA-Tencor Corporation
- Yung-Ho Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Source
- Publication number 20170047207
- Publication date Feb 16, 2017
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCATHODE INCLUDING FIELD EMITTER ARRAY ON A SILICON SUBSTRATE W...
- Publication number 20160343532
- Publication date Nov 24, 2016
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Metrology With Reduced Focus Error Sensitivity
- Publication number 20160245741
- Publication date Aug 25, 2016
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ELECTROMAGNETIC MODELING OF FINITE STRUCTURES AND FINITE...
- Publication number 20140222380
- Publication date Aug 7, 2014
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Application
Process Aware Metrology
- Publication number 20130282340
- Publication date Oct 24, 2013
- Xuefeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and System for Determining One or More Optical Characteristi...
- Publication number 20130215420
- Publication date Aug 22, 2013
- KLA-Tencor Corporation
- Xuefeng Liu
- G01 - MEASURING TESTING
Information Patent Application
Electron-Bombarded Charge-Coupled Device And Inspection Systems Usi...
- Publication number 20130148112
- Publication date Jun 13, 2013
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- G01 - MEASURING TESTING
Information Patent Application
PROCESS AWARE METROLOGY
- Publication number 20130080984
- Publication date Mar 28, 2013
- KLA-Tencor Corporation
- Xuefeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANA...
- Publication number 20120323356
- Publication date Dec 20, 2012
- Thaddeus G. Dziura
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SUBSYSTEMS OF A METROLOGY SYSTEM, METROLOGY SYSTEMS, A...
- Publication number 20110279819
- Publication date Nov 17, 2011
- KLA-Tencor Corporation
- Yung-Ho (Alex) Chuang
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION
- Publication number 20110228263
- Publication date Sep 22, 2011
- KLA-Tencor Corporation
- Yung-Ho (Alex) Chuang
- G01 - MEASURING TESTING
Information Patent Application
INTENSITY MODULATED ELECTRON BEAM AND APPLICATION TO ELECTRON BEAM...
- Publication number 20090026912
- Publication date Jan 29, 2009
- KLA-Tencor Technologies Corporation
- Vincenzo Lordi
- B82 - NANO-TECHNOLOGY

Xuefeng Liu

Person

Patents Grantslast 30 patents

Deep ultraviolet laser using strontium tetraborate for frequency co...

Continuous degenerate elliptical retarder for sensitive particle de...

United states frequency conversion using interdigitated nonlinear c...

Frequency conversion using interdigitated nonlinear crystal gratings

Sensitive particle detection with spatially-varying polarization ro...

Multi-environment polarized infrared reflectometer for semiconducto...

Overlay metrology system and method

Sensitive particle detection with spatially-varying polarization ro...

Photocathode including field emitter array on a silicon substrate w...

Electron source

Method of optimizing an optical parametric model for structural ana...

Electron-bombarded charge-coupled device and inspection systems usi...

Electron source

Optical metrology with reduced focus error sensitivity

Multi-column electron beam lithography including field emitters on...

Method and system for determining one or more optical characteristi...

Optimizing an optical parametric model for structural analysis usin...

Method of electromagnetic modeling of finite structures and finite...

Illumination subsystems of a metrology system, metrology systems, a...

Illuminating a specimen for metrology or inspection

Metrology systems and methods for high aspect ratio and large later...

Process aware metrology

Method and system for determining one or more optical characteristi...

Process aware metrology

Patents Applicationslast 30 patents

DEEP ULTRAVIOLET LASER USING STRONTIUM TETRABORATE FOR FREQUENCY CO...

Frequency Conversion Using Interdigitated Nonlinear Crystal Gratings

CONTINUOUS DEGENERATE ELLIPTICAL RETARDER FOR SENSITIVE PARTICLE DE...

SENSITIVE PARTICLE DETECTION WITH SPATIALLY-VARYING POLARIZATION RO...

Sensitive Particle Detection with Spatially-Varying Polarization Ro...

Overlay Metrology System and Method

Electron Source

Multi-Column Electron Beam Lithography Including Field Emitters on...

Electron Source

PHOTOCATHODE INCLUDING FIELD EMITTER ARRAY ON A SILICON SUBSTRATE W...

Optical Metrology With Reduced Focus Error Sensitivity

METHOD OF ELECTROMAGNETIC MODELING OF FINITE STRUCTURES AND FINITE...

Process Aware Metrology

Method and System for Determining One or More Optical Characteristi...

Electron-Bombarded Charge-Coupled Device And Inspection Systems Usi...

PROCESS AWARE METROLOGY

METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANA...

ILLUMINATION SUBSYSTEMS OF A METROLOGY SYSTEM, METROLOGY SYSTEMS, A...

ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION

INTENSITY MODULATED ELECTRON BEAM AND APPLICATION TO ELECTRON BEAM...