Xuelong Cao

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,613,598
- Issue date Nov 3, 2009
- KLA-Tencor Corp.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Method of compensating photomask data for the effects of etch and l...
- Patent number 7,600,212
- Issue date Oct 6, 2009
- Cadence Design Systems, Inc.
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,145,664
- Issue date Dec 5, 2006
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Method of compensating photomask data for the effects of etch and l...
- Publication number 20070143733
- Publication date Jun 21, 2007
- Invarium, Inc.
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20070040852
- Publication date Feb 22, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20040210402
- Publication date Oct 21, 2004
- Jon Opsal
- G01 - MEASURING TESTING