Xuelong Shi

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method, program product and apparatus for translating geometrical d...
- Patent number 8,040,573
- Issue date Oct 18, 2011
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of two dimensional feature model calibration and optimization
- Patent number 7,820,341
- Issue date Oct 26, 2010
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of identifying an extreme interaction pitch region, methods...
- Patent number 7,735,052
- Issue date Jun 8, 2010
- ASML Masktools Netherlands B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optical proximity correction design for contact hole mask
- Patent number 7,594,199
- Issue date Sep 22, 2009
- ASML Masktools B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model based placement of phase-...
- Patent number 7,550,235
- Issue date Jun 23, 2009
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing transmission tuning of a mask pattern to impr...
- Patent number 7,514,183
- Issue date Apr 7, 2009
- ASML Masktools B.V.
- Stephen D. Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feature optimization using interference mapping lithography
- Patent number 7,506,299
- Issue date Mar 17, 2009
- ASML Holding N.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of predicting and minimizing model OPC deviation due to mix/...
- Patent number 7,440,082
- Issue date Oct 21, 2008
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing full-chip manufacturing reliability checking...
- Patent number 7,434,195
- Issue date Oct 7, 2008
- ASML Masktools B.V.
- Michael Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Eigen decomposition based OPC model
- Patent number 7,398,508
- Issue date Jul 8, 2008
- ASML Masktooks B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for generating assist feature...
- Patent number 7,376,930
- Issue date May 20, 2008
- ASML Masktools B.V.
- Kurt E. Wampler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing reliability checking and verification for l...
- Patent number 7,342,646
- Issue date Mar 11, 2008
- ASML Masktools B.V.
- Xuelong Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of predicting and minimizing model OPC deviation due to mix/...
- Patent number 7,242,459
- Issue date Jul 10, 2007
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of two dimensional feature model calibration and optimization
- Patent number 7,175,940
- Issue date Feb 13, 2007
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic optical proximity correction (OPC) rule generation
- Patent number 7,124,395
- Issue date Oct 17, 2006
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of identifying an extreme interaction pitch region, methods...
- Patent number 7,100,145
- Issue date Aug 29, 2006
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of identifying an extreme interaction pitch region, methods...
- Patent number 6,792,591
- Issue date Sep 14, 2004
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for minimizing optical proximity effects
- Patent number 6,519,760
- Issue date Feb 11, 2003
- ASML Masktools, B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-assisted post exposure bake for chemically amplified photores...
- Patent number 6,245,491
- Issue date Jun 12, 2001
- National Semiconductor Corp.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Infra-red radiation post-exposure bake process for chemically ampli...
- Patent number 6,100,012
- Issue date Aug 8, 2000
- National Semiconductor Corporation
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method, program product and apparatus for translating geometrical d...
- Publication number 20080068668
- Publication date Mar 20, 2008
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of predicting and minimizing model OPC deviation due to mix/...
- Publication number 20070247610
- Publication date Oct 25, 2007
- ASML MASKTOOLS B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of two dimensional feature model calibration and optimization
- Publication number 20070117030
- Publication date May 24, 2007
- ASML MASKTOOLS B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of identifying an extreme interaction pitch region, methods...
- Publication number 20060277522
- Publication date Dec 7, 2006
- ASML MASKTOOLS B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for performing full-chip manufacturing reliability checking...
- Publication number 20060080633
- Publication date Apr 13, 2006
- Michael Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing reliability checking and verification for l...
- Publication number 20050210437
- Publication date Sep 22, 2005
- Xuelong Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for performing transmission tuning of a mask pattern to impr...
- Publication number 20050196682
- Publication date Sep 8, 2005
- Stephen D. Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of predicting and minimizing model OPC deviation due to mix/...
- Publication number 20050179886
- Publication date Aug 18, 2005
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Eigen decomposition based OPC model
- Publication number 20050149902
- Publication date Jul 7, 2005
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feature optimization using interference mapping lithography
- Publication number 20050142470
- Publication date Jun 30, 2005
- ASML MASKTOOLS B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing model based placement of phase-...
- Publication number 20050142449
- Publication date Jun 30, 2005
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for generating assist feature...
- Publication number 20050053848
- Publication date Mar 10, 2005
- Kurt E. Wampler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of identifying an extreme interaction pitch region, methods...
- Publication number 20050034096
- Publication date Feb 10, 2005
- ASML Masktools Netherlands B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of optical proximity correction design for contact hole mask
- Publication number 20040229133
- Publication date Nov 18, 2004
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Automatic optical proximity correction (OPC) rule generation
- Publication number 20040139418
- Publication date Jul 15, 2004
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of two dimensional feature model calibration and optimization
- Publication number 20030082463
- Publication date May 1, 2003
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of identifying an extreme interaction pitch region, methods...
- Publication number 20020157081
- Publication date Oct 24, 2002
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for minimizing optical proximity effects
- Publication number 20020152451
- Publication date Oct 17, 2002
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Xuelong Shi

Person

Patents Grantslast 30 patents

Method, program product and apparatus for translating geometrical d...

Method of two dimensional feature model calibration and optimization

Method of identifying an extreme interaction pitch region, methods...

Method of optical proximity correction design for contact hole mask

Method and apparatus for performing model based placement of phase-...

Method for performing transmission tuning of a mask pattern to impr...

Feature optimization using interference mapping lithography

Method of predicting and minimizing model OPC deviation due to mix/...

Method for performing full-chip manufacturing reliability checking...

Eigen decomposition based OPC model

Method, program product and apparatus for generating assist feature...

Method of manufacturing reliability checking and verification for l...

Method of predicting and minimizing model OPC deviation due to mix/...

Method of two dimensional feature model calibration and optimization

Automatic optical proximity correction (OPC) rule generation

Method of identifying an extreme interaction pitch region, methods...

Method of identifying an extreme interaction pitch region, methods...

Method and apparatus for minimizing optical proximity effects

Photo-assisted post exposure bake for chemically amplified photores...

Infra-red radiation post-exposure bake process for chemically ampli...

Patents Applicationslast 30 patents

Method, program product and apparatus for translating geometrical d...

Method of predicting and minimizing model OPC deviation due to mix/...

Method of two dimensional feature model calibration and optimization

Method of identifying an extreme interaction pitch region, methods...

Method for performing full-chip manufacturing reliability checking...

Method of manufacturing reliability checking and verification for l...

Method for performing transmission tuning of a mask pattern to impr...

Method of predicting and minimizing model OPC deviation due to mix/...

Eigen decomposition based OPC model

Feature optimization using interference mapping lithography

Method and apparatus for performing model based placement of phase-...

Method, program product and apparatus for generating assist feature...

Method of identifying an extreme interaction pitch region, methods...

Method of optical proximity correction design for contact hole mask

Automatic optical proximity correction (OPC) rule generation

Method of two dimensional feature model calibration and optimization

Method of identifying an extreme interaction pitch region, methods...

Method and apparatus for minimizing optical proximity effects