Xueyu Qian

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Methodologies to reduce process sensitivity to the chamber condition
- Patent number 6,808,647
- Issue date Oct 26, 2004
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of operating a dual chamber reactor with neutral density dec...
- Patent number 6,635,578
- Issue date Oct 21, 2003
- Applied Materials, Inc.
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for enhancing etching of TiSix
- Patent number 6,544,896
- Issue date Apr 8, 2003
- Applied Materials Inc.
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber having a voltage distribution electrode
- Patent number 6,447,637
- Issue date Sep 10, 2002
- Applied Materials Inc.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed-loop dome thermal control apparatus for a semiconductor wafe...
- Patent number 6,367,410
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Patrick Leahey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled high density plasma reactor for plasma assisted...
- Patent number 5,540,800
- Issue date Jul 30, 1996
- Applied Materials, Inc.
- Xueyu Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Bonded multi-layer RF window
- Publication number 20070079936
- Publication date Apr 12, 2007
- Applied Materials, Inc.
- Maocheng Li
- B32 - LAYERED PRODUCTS
Information Patent Application
Process chamber having a voltage distribution electrode
- Publication number 20030006009
- Publication date Jan 9, 2003
- APPLIED MATERIALS, INC.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS