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last 30 patents
Information
Patent Grant
Multi-station decoupled reactive ion etch chamber
Patent number
9,208,998
Issue date
Dec 8, 2015
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Multi-station decoupled reactive ion etch chamber
Patent number
8,366,829
Issue date
Feb 5, 2013
Advanced Micro-Fabrication Equipment, Inc. Asia
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Multiple frequency plasma chamber, switchable RF system, and proces...
Patent number
7,503,996
Issue date
Mar 17, 2009
Advanced Micro-Fabrication Equipment, Inc. Asia
Jinyuan Chen
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
Publication number
20130008605
Publication date
Jan 10, 2013
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...
Publication number
20100271745
Publication date
Oct 28, 2010
Advanced Micro-Fabrication Equipment, Inc. Asia
Jinyuan CHEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...
Publication number
20080251207
Publication date
Oct 16, 2008
ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA,
Jinyuan Chen
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
Publication number
20080011424
Publication date
Jan 17, 2008
Advanced Micro-Fabrication Equipment, Inc. Asia
Gerald YIN
H01 - BASIC ELECTRIC ELEMENTS