Xumou Xu

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Campbell, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Line edge roughness reduction and double patterning
- Patent number 8,501,395
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double exposure patterning with carbonaceous hardmask
- Patent number 8,293,460
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hui W. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK
- Publication number 20090311635
- Publication date Dec 17, 2009
- HUI W. CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Line edge roughness reduction and double patterning
- Publication number 20090142926
- Publication date Jun 4, 2009
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY