Ya-Chih Wang

Person

Taipei County, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming a pattern
- Patent number 9,530,663
- Issue date Dec 27, 2016
- Nanya Technology Corp.
- Chiang-Lin Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for semiconductor self-aligned patterning
- Patent number 9,318,412
- Issue date Apr 19, 2016
- Nanya Technology Corporation
- An Hsiung Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask spacer structure and fabrication method thereof
- Patent number 8,697,316
- Issue date Apr 15, 2014
- Nanya Technology Corp.
- Ya-Chih Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography resolution improving method
- Patent number 8,658,051
- Issue date Feb 25, 2014
- Nanya Technology Corp.
- Kuo-Yao Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus with an optical fiber module
- Patent number 8,368,869
- Issue date Feb 5, 2013
- Nanya Technology Corp.
- Wei-Cheng Shiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning method
- Patent number 8,216,946
- Issue date Jul 10, 2012
- Nanya Technology Corporation
- Wei-Cheng Shiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase-shift mask and method for forming a pattern
- Patent number 7,811,723
- Issue date Oct 12, 2010
- Nanya Technology Corp.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning method in semiconductor manufacturing process including...
- Patent number 7,799,697
- Issue date Sep 21, 2010
- Nanya Technology Corporation
- Wei-Cheng Shiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming patterned photoresist layer
- Patent number 6,998,226
- Issue date Feb 14, 2006
- Nanya Technology Corporation
- Yuan-Hsun Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING A PATTERN
- Publication number 20160379836
- Publication date Dec 29, 2016
- Nanya Technology Corp.
- Chiang-Lin Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SEMICONDUCTOR SELF-ALIGNED PATTERNING
- Publication number 20150028459
- Publication date Jan 29, 2015
- NANYA TECHNOLOGY CORPORATION
- AN HSIUNG LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK SPACER STRUCTURE AND FABRICATION METHOD THEREOF
- Publication number 20130330660
- Publication date Dec 12, 2013
- Ya-Chih Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD
- Publication number 20100323521
- Publication date Dec 23, 2010
- NANYA TECHNOLOGY CORPORATION
- Wei-Cheng Shiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS WITH AN OPTICAL FIBER MODULE
- Publication number 20100020298
- Publication date Jan 28, 2010
- Wei-Cheng Shiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY RESOLUTION IMPROVING METHOD
- Publication number 20090233448
- Publication date Sep 17, 2009
- NANYA TECHNOLOGY CORP.
- Kuo-Yao CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning method in semiconductor manufacturing process
- Publication number 20090227108
- Publication date Sep 10, 2009
- Wei-Cheng Shiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE-SHIFT MASK AND METHOD FOR FORMING A PATTERN
- Publication number 20090155699
- Publication date Jun 18, 2009
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming patterned photoresist layer
- Publication number 20030180666
- Publication date Sep 25, 2003
- NANYA TECHNOLOGY CORPORATION
- Yuan-Hsun Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ya-Chih Wang

Person

Patents Grantslast 30 patents

Method for forming a pattern

Method for semiconductor self-aligned patterning

Hard mask spacer structure and fabrication method thereof

Lithography resolution improving method

Lithography apparatus with an optical fiber module

Patterning method

Phase-shift mask and method for forming a pattern

Patterning method in semiconductor manufacturing process including...

Method of forming patterned photoresist layer

Patents Applicationslast 30 patents

METHOD FOR FORMING A PATTERN

METHOD FOR SEMICONDUCTOR SELF-ALIGNED PATTERNING

HARD MASK SPACER STRUCTURE AND FABRICATION METHOD THEREOF

PATTERNING METHOD

LITHOGRAPHY APPARATUS WITH AN OPTICAL FIBER MODULE

LITHOGRAPHY RESOLUTION IMPROVING METHOD

Patterning method in semiconductor manufacturing process

PHASE-SHIFT MASK AND METHOD FOR FORMING A PATTERN

Method of forming patterned photoresist layer