Ya-Wen Chiu

Person

Tainan City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for high pressure anneal
- Patent number 12,183,573
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride-containing STI liner for SiGe channel
- Patent number 12,046,479
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS FinFET structures including work-function materials having dif...
- Patent number 11,961,768
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,901,442
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for high pressure anneal
- Patent number 11,854,800
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS finFET structures including work-function materials having dif...
- Patent number 11,682,589
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,677,015
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 11,635,695
- Issue date Apr 25, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,631,612
- Issue date Apr 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Hua Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for high pressure anneal
- Patent number 11,037,781
- Issue date Jun 15, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS FinFET structures including work-function materials having dif...
- Patent number 10,804,161
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEVICE AND METHOD FOR HIGH PRESSURE ANNEAL
- Publication number 20250079162
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GAP FILLING WITH SELECTIVELY FORMED SEED LAYER AND HETER...
- Publication number 20250056870
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20240385526
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240145581
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE-CONTAINING STI LINER FOR SIGE CHANNEL
- Publication number 20230386859
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR HIGH PRESSURE ANNEAL
- Publication number 20230386832
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS FinFET Structures Including Work-Function Materials Having Dif...
- Publication number 20230274983
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20230259036
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20230253246
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Hua CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20220376091
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nitride-Containing STI Liner for SiGe Channel
- Publication number 20220051906
- Publication date Feb 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20210389679
- Publication date Dec 16, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20210375665
- Publication date Dec 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Hua CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20210359111
- Publication date Nov 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for High Pressure Anneal
- Publication number 20210280414
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS FinFET Structures Including Work-Function Materials Having Dif...
- Publication number 20210043521
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for High Pressure Anneal
- Publication number 20200006063
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Ying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Structures and Methods of Forming the Same
- Publication number 20180174922
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS

Ya-Wen Chiu

Person

Patents Grantslast 30 patents

Method for reducing line-end space in integrated circuit patterning

Device and method for high pressure anneal

Nitride-containing STI liner for SiGe channel

CMOS FinFET structures including work-function materials having dif...

Method of manufacturing a semiconductor device and a semiconductor...

Device and method for high pressure anneal

CMOS finFET structures including work-function materials having dif...

Method of manufacturing a semiconductor device and a semiconductor...

Method for reducing line-end space in integrated circuit patterning

Semiconductor device and manufacturing method thereof

Device and method for high pressure anneal

CMOS FinFET structures including work-function materials having dif...

Patents Applicationslast 30 patents

DEVICE AND METHOD FOR HIGH PRESSURE ANNEAL

METHOD FOR GAP FILLING WITH SELECTIVELY FORMED SEED LAYER AND HETER...

Method for Reducing Line-End Space in Integrated Circuit Patterning

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

NITRIDE-CONTAINING STI LINER FOR SIGE CHANNEL

DEVICE AND METHOD FOR HIGH PRESSURE ANNEAL

CMOS FinFET Structures Including Work-Function Materials Having Dif...

Method for Reducing Line-End Space in Integrated Circuit Patterning

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Nitride-Containing STI Liner for SiGe Channel

Method for Reducing Line-End Space in Integrated Circuit Patterning

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Device and Method for High Pressure Anneal

CMOS FinFET Structures Including Work-Function Materials Having Dif...

Device and Method for High Pressure Anneal

FinFET Structures and Methods of Forming the Same