Yaichiro Watakabe

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,830,607
- Issue date Nov 3, 1998
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,691,090
- Issue date Nov 25, 1997
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,674,647
- Issue date Oct 7, 1997
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,629,114
- Issue date May 13, 1997
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,474,864
- Issue date Dec 12, 1995
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and a method of manufacturing thereof comprising trapezoi...
- Patent number 5,322,748
- Issue date Jun 21, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and method of manufacturing photomask usi...
- Patent number 5,266,424
- Issue date Nov 30, 1993
- Mitsubishi Denki Kabushiki Kaisha
- Takeshi Fujino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for manufacturing a photomask
- Patent number 4,985,319
- Issue date Jan 15, 1991
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing photomask
- Patent number 4,957,834
- Issue date Sep 18, 1990
- Mitsubishi Denki Kabushiki Kaisha
- Shuichi Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for manufacturing a photomask
- Patent number 4,876,164
- Issue date Oct 24, 1989
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask material
- Patent number 4,873,163
- Issue date Oct 10, 1989
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a photomask material
- Patent number 4,792,461
- Issue date Dec 20, 1988
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask material
- Patent number 4,783,371
- Issue date Nov 8, 1988
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask material
- Patent number 4,722,878
- Issue date Feb 2, 1988
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask material
- Patent number 4,717,625
- Issue date Jan 5, 1988
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask material
- Patent number 4,678,714
- Issue date Jul 7, 1987
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a gate turn-off thyristor
- Patent number 4,170,502
- Issue date Oct 9, 1979
- Mitsubishi Denki Kabushiki Kaisha
- Yaichiro Watakabe
- H01 - BASIC ELECTRIC ELEMENTS

Yaichiro Watakabe

Person

Patents Grantslast 30 patents

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and manufacturing method thereof and exposure meth...

Photomask and a method of manufacturing thereof comprising trapezoi...

Method of forming pattern and method of manufacturing photomask usi...

Process for manufacturing a photomask

Method for manufacturing photomask

Process for manufacturing a photomask

Photomask material

Method of forming a photomask material

Photomask material

Photomask material

Photomask material

Photomask material

Method of manufacturing a gate turn-off thyristor