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Yako Yuko

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  • Osaka, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Photosensitive resin composition, thin film panel made with photose...
    • Patent number 7,338,737
    • Issue date Mar 4, 2008
    • Samsung Electronics Co., Ltd.
    • Hi-Kuk Lee
    • C03 - GLASS MINERAL OR SLAG WOOL
  • Information Patent Grant

    Photosensitive resin composition, thin film panel made with photose...
    • Patent number 7,297,452
    • Issue date Nov 20, 2007
    • Samsung Electronics Co., Ltd.
    • Hi-Kuk Lee
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Positive working photoresist compositions comprising a nitrogen-con...
    • Patent number 6,280,902
    • Issue date Aug 28, 2001
    • Sumitomo Chemical Company, Limited
    • Yuko Yako
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 6,165,677
    • Issue date Dec 26, 2000
    • Sumitomo Chemical Company, Limited
    • Yuko Yako
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 6,040,112
    • Issue date Mar 21, 2000
    • Sumitomo Chemical Company, Limited
    • Yuko Yako
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 5,985,511
    • Issue date Nov 16, 1999
    • Sumitomo Chemical Company, Limited
    • Yuko Yako
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition
    • Patent number 5,916,728
    • Issue date Jun 29, 1999
    • Sumitomo Chemical Company, Limited
    • Nobuhito Fukui
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition
    • Patent number 5,891,601
    • Issue date Apr 6, 1999
    • Sumitomo Chemical Company, Ltd.
    • Nobuhito Fukui
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 5,846,688
    • Issue date Dec 8, 1998
    • Sumitomo Chemical Company, Limited
    • Nobuhito Fukui
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents