Yamato Tonegawa

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method and system
- Patent number 12,060,640
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Yamato Tonegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,177
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Keiji Tabuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method
- Patent number 11,781,219
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Kazuo Yabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,694,890
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Kiwamu Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming silicon-containing film
- Patent number 10,573,514
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Tsubasa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus, film forming method and non-transitory stor...
- Patent number 10,535,501
- Issue date Jan 14, 2020
- Tokyo Electron Limited
- Yamato Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming silicon nitride film, film forming apparatus and...
- Patent number 10,388,511
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Yamato Tonegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon-containing film
- Patent number 10,217,630
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Tsubasa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for performing semiconductor processing on target...
- Patent number 8,153,451
- Issue date Apr 10, 2012
- Tokyo Electron Limited
- Koichi Sakamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Film formation apparatus and method for using the same
- Patent number 8,080,109
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for forming silicon-containing...
- Patent number 8,034,673
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Kentaro Kadonaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation apparatus for semiconductor process and method for u...
- Patent number 7,964,516
- Issue date Jun 21, 2011
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and method for using the same
- Patent number 7,959,737
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for using film formation apparatus
- Patent number 7,938,080
- Issue date May 10, 2011
- Tokyo Electron Limited
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for using film formation apparatus
- Patent number 7,494,943
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for performing semiconductor processing on substr...
- Patent number 7,179,334
- Issue date Feb 20, 2007
- Tokyo Electron Limited
- Koichi Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240175117
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Ken OKOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240175122
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Satoshi ONODERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230395368
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Kazumasa IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD
- Publication number 20230335394
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Kiwamu ITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND PROCESSING APPARATUS
- Publication number 20230326742
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Kiwamu ITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230146375
- Publication date May 11, 2023
- Tokyo Electron Limited
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD
- Publication number 20220254629
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Ken OKOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING FILM AND PROCESSING APPARATUS
- Publication number 20220238335
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Takeshi OYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220013333
- Publication date Jan 13, 2022
- TOKYO ELECTRON LIMITED
- Keiji TABUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND SYSTEM
- Publication number 20210198787
- Publication date Jul 1, 2021
- TOKYO ELECTRON LIMITED
- Yamato TONEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20200312654
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Kiwamu ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Apparatus and Processing Method
- Publication number 20200299839
- Publication date Sep 24, 2020
- TOKYO ELECTRON LIMITED
- Kazuo YABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON-CONTAINING FILM
- Publication number 20190096664
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Tsubasa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM, FILM FORMING APPARATUS AND...
- Publication number 20180342385
- Publication date Nov 29, 2018
- TOKYO ELECTRON LIMITED
- Yamato Tonegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON-CONTAINING FILM
- Publication number 20180144931
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Tsubasa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...
- Publication number 20150376789
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus Using Gas Nozzles
- Publication number 20150275368
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD AND NON-TRANSITORY STOR...
- Publication number 20140356550
- Publication date Dec 4, 2014
- TOKYO ELECTRON LIMITED
- Yamato TONEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS OF FORMING SILICON NITRIDE FILM
- Publication number 20140106577
- Publication date Apr 17, 2014
- TOKYO ELECTRON LIMITED
- Yamato TONEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROTECTING COMPONENT OF FILM FORMING APPARATUS AND FILM F...
- Publication number 20130251896
- Publication date Sep 26, 2013
- TOKYO ELECTRON LIMITED
- Yamato TONEGAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILM FORMATION METHOD AND APPARATUS FOR FORMING SILICON-CONTAINING...
- Publication number 20090263975
- Publication date Oct 22, 2009
- TOKYO ELECTRON LIMITED
- Kentaro KADONAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR U...
- Publication number 20090233454
- Publication date Sep 17, 2009
- TOKYO ELECTRON LIMITED
- Mitsuhiro OKADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR USING FILM FORMATION APPARATUS
- Publication number 20090090300
- Publication date Apr 9, 2009
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation apparatus and method for using the same
- Publication number 20080282976
- Publication date Nov 20, 2008
- Mitsuhiro Okada
- B08 - CLEANING
Information Patent Application
Film formation apparatus and method for using the same
- Publication number 20080132079
- Publication date Jun 5, 2008
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING SEMICONDUCTOR PROCESSING ON TARGET...
- Publication number 20070131537
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- KOICHI SAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for using film formation apparatus
- Publication number 20070093075
- Publication date Apr 26, 2007
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for performing semiconductor processing on substr...
- Publication number 20040159284
- Publication date Aug 19, 2004
- Koichi Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS

Yamato Tonegawa

Person

Patents Grantslast 30 patents

Film forming method and system

Plasma processing apparatus and plasma processing method

Processing apparatus and processing method

Substrate processing method and substrate processing apparatus

Method of forming silicon-containing film

Film forming apparatus, film forming method and non-transitory stor...

Method of forming silicon nitride film, film forming apparatus and...

Method of forming silicon-containing film

System and method for performing semiconductor processing on target...

Film formation apparatus and method for using the same

Film formation method and apparatus for forming silicon-containing...

Film formation apparatus for semiconductor process and method for u...

Film formation apparatus and method for using the same

Method for using film formation apparatus

Method for using film formation apparatus

System and method for performing semiconductor processing on substr...

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD

DEPOSITION METHOD AND PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

DEPOSITION METHOD

METHOD FOR FORMING FILM AND PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FILM FORMING METHOD AND SYSTEM

Substrate Processing Method and Substrate Processing Apparatus

Processing Apparatus and Processing Method

METHOD OF FORMING SILICON-CONTAINING FILM

METHOD OF FORMING SILICON NITRIDE FILM, FILM FORMING APPARATUS AND...

METHOD OF FORMING SILICON-CONTAINING FILM

VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...

Film Forming Apparatus Using Gas Nozzles

FILM FORMING APPARATUS, FILM FORMING METHOD AND NON-TRANSITORY STOR...

METHOD AND APPARATUS OF FORMING SILICON NITRIDE FILM

METHOD OF PROTECTING COMPONENT OF FILM FORMING APPARATUS AND FILM F...

FILM FORMATION METHOD AND APPARATUS FOR FORMING SILICON-CONTAINING...

FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR U...

METHOD FOR USING FILM FORMATION APPARATUS

Film formation apparatus and method for using the same

Film formation apparatus and method for using the same

SYSTEM AND METHOD FOR PERFORMING SEMICONDUCTOR PROCESSING ON TARGET...

Method for using film formation apparatus

System and method for performing semiconductor processing on substr...