Yan Borodovsky

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam universal cutter
- Patent number 10,578,970
- Issue date Mar 3, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam staggered beam aperture array
- Patent number 10,386,722
- Issue date Aug 20, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlying absorbing or conducting layer for Ebeam direct write (EB...
- Patent number 10,338,474
- Issue date Jul 2, 2019
- Intel Corporation
- Shakul Tandon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ebeam align on the fly
- Patent number 10,290,528
- Issue date May 14, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine alignment system for electron beam exposure system
- Patent number 10,236,161
- Issue date Mar 19, 2019
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam universal cutter
- Patent number 10,216,087
- Issue date Feb 26, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,191,376
- Issue date Jan 29, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ebeam three beam aperture array
- Patent number 10,067,416
- Issue date Sep 4, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unidirectional metal on layer with ebeam
- Patent number 10,014,256
- Issue date Jul 3, 2018
- Intel Corporation
- Donald W. Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam non-universal cutter
- Patent number 9,952,511
- Issue date Apr 24, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Corner rounding correction for electron beam (Ebeam) direct write s...
- Patent number 9,899,182
- Issue date Feb 20, 2018
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam three beam aperture array
- Patent number 9,897,908
- Issue date Feb 20, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of creating a maskless air gap in back end interconnections...
- Patent number 9,324,652
- Issue date Apr 26, 2016
- Intel Corporation
- Manish Chandhok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of creating a maskless air gap in back end interconnects wit...
- Patent number 8,975,138
- Issue date Mar 10, 2015
- Intel Corporation
- Manish Chandhok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase-shifting masks with sub-wavelength diffractive optical elements
- Patent number 8,122,388
- Issue date Feb 21, 2012
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting masks with sub-wavelength diffractive optical elements
- Patent number 8,112,726
- Issue date Feb 7, 2012
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-wavelength diffractive elements to reduce corner rounding
- Patent number 7,892,706
- Issue date Feb 22, 2011
- Intel Corporation
- Bikram Baidya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for etching devices used in lithography
- Patent number 7,732,106
- Issue date Jun 8, 2010
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-wavelength diffractive elements to reduce corner rounding
- Patent number 7,611,806
- Issue date Nov 3, 2009
- Intel Corporation
- Bikram Baidya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting masks with sub-wavelength diffractive optical elements
- Patent number 7,512,926
- Issue date Mar 31, 2009
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging and devices in lithography
- Patent number 7,438,997
- Issue date Oct 21, 2008
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test structures for feature fidelity improvement
- Patent number 7,254,803
- Issue date Aug 7, 2007
- Intel Corporation
- Seongtae Jeong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment using latent images
- Patent number 7,245,352
- Issue date Jul 17, 2007
- Intel Corporation
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device including contacts
- Patent number 7,142,282
- Issue date Nov 28, 2006
- Intel Corporation
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and lens arrangement to improve imaging performance of micro...
- Patent number 6,069,739
- Issue date May 30, 2000
- Intel Corporation
- Yan Borodovsky
- G02 - OPTICS
Information Patent Grant
Method and apparatus to improve across field dimensional control in...
- Patent number 6,021,009
- Issue date Feb 1, 2000
- Intel Corporation
- Yan Borodovsky
- G02 - OPTICS
Information Patent Grant
Photolithography method using coherence distance control
- Patent number 5,946,079
- Issue date Aug 31, 1999
- Intel Corporation
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting mask having a phase shift that minimizes critical di...
- Patent number 5,840,448
- Issue date Nov 24, 1998
- Intel Corporation
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method using coherence distance control
- Patent number 5,801,821
- Issue date Sep 1, 1998
- Intel Corporation
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EBEAM UNIVERSAL CUTTER
- Publication number 20190155160
- Publication date May 23, 2019
- Intel Corporation
- Yan A. BORODOVSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20180143526
- Publication date May 24, 2018
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINE ALIGNMENT SYSTEM FOR ELECTRON BEAM EXPOSURE SYSTEM
- Publication number 20180033593
- Publication date Feb 1, 2018
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EB...
- Publication number 20170338105
- Publication date Nov 23, 2017
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20170269481
- Publication date Sep 21, 2017
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE S...
- Publication number 20170271117
- Publication date Sep 21, 2017
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM UNIVERSAL CUTTER
- Publication number 20170102615
- Publication date Apr 13, 2017
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIDIRECTIONAL METAL ON LAYER WITH EBEAM
- Publication number 20170077029
- Publication date Mar 16, 2017
- Intel Corporation
- Donald W. NELSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20170076905
- Publication date Mar 16, 2017
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM STAGGERED BEAM APERTURE ARRAY
- Publication number 20170076906
- Publication date Mar 16, 2017
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM ALIGN ON THE FLY
- Publication number 20170076967
- Publication date Mar 16, 2017
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM NON-UNIVERSAL CUTTER
- Publication number 20170069461
- Publication date Mar 9, 2017
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA COMPRESSION FOR EBEAM THROUGHPUT
- Publication number 20170069509
- Publication date Mar 9, 2017
- Intel Corporation
- Donald W. NELSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CREATING A MASKLESS AIR GAP IN BACK END INTERCONNECTIONS...
- Publication number 20150171012
- Publication date Jun 18, 2015
- Intel Corporation
- Manish CHANDHOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CREATING A MASKLESS AIR GAP IN BACK END INTERCONNECTS WIT...
- Publication number 20150001724
- Publication date Jan 1, 2015
- Manish CHANDHOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Phase-shifting masks with sub-wavelength diffractive opical elements
- Publication number 20090170012
- Publication date Jul 2, 2009
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sub-wavelength diffractive elements to reduce corner rounding
- Publication number 20090148779
- Publication date Jun 11, 2009
- Bikram Baidya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shifting masks with sub-wavelength diffractive optical elements
- Publication number 20090100400
- Publication date Apr 16, 2009
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING AND DEVICES IN LITHOGRAPHY
- Publication number 20090042111
- Publication date Feb 12, 2009
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shifting masks with sub-wavelength diffractive optical elements
- Publication number 20070094959
- Publication date May 3, 2007
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reclaim method for extreme ultraviolet lithography mask blank and a...
- Publication number 20070090084
- Publication date Apr 26, 2007
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Sub-wavelength diffractive elements to reduce corner rounding
- Publication number 20070077500
- Publication date Apr 5, 2007
- Bikram Baidya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Image inspection method
- Publication number 20070002322
- Publication date Jan 4, 2007
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining an optimizaton for generating a pixelated photolithogra...
- Publication number 20070006113
- Publication date Jan 4, 2007
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test structures for feature fidelity improvement
- Publication number 20060075366
- Publication date Apr 6, 2006
- Seongtae Jeong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Alignment using latent images
- Publication number 20060017901
- Publication date Jan 26, 2006
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composite printing
- Publication number 20060017910
- Publication date Jan 26, 2006
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging and devices in lithography
- Publication number 20050255388
- Publication date Nov 17, 2005
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composite optical lithography method for patterning lines of unequa...
- Publication number 20050088633
- Publication date Apr 28, 2005
- Intel Corporation
- Yan Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yan Borodovsky

Person

Patents Grantslast 30 patents

Cross scan proximity correction with ebeam universal cutter

Ebeam universal cutter

Ebeam staggered beam aperture array

Underlying absorbing or conducting layer for Ebeam direct write (EB...

Ebeam align on the fly

Fine alignment system for electron beam exposure system

Ebeam universal cutter

Cross scan proximity correction with ebeam universal cutter

Ebeam three beam aperture array

Unidirectional metal on layer with ebeam

Ebeam non-universal cutter

Corner rounding correction for electron beam (Ebeam) direct write s...

Ebeam three beam aperture array

Method of creating a maskless air gap in back end interconnections...

Method of creating a maskless air gap in back end interconnects wit...

Phase-shifting masks with sub-wavelength diffractive optical elements

Phase-shifting masks with sub-wavelength diffractive optical elements

Sub-wavelength diffractive elements to reduce corner rounding

Methods for etching devices used in lithography

Sub-wavelength diffractive elements to reduce corner rounding

Phase-shifting masks with sub-wavelength diffractive optical elements

Imaging and devices in lithography

Test structures for feature fidelity improvement

Alignment using latent images

Device including contacts

Method and lens arrangement to improve imaging performance of micro...

Method and apparatus to improve across field dimensional control in...

Photolithography method using coherence distance control

Phase shifting mask having a phase shift that minimizes critical di...

Photolithography method using coherence distance control

Patents Applicationslast 30 patents

EBEAM UNIVERSAL CUTTER

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

EBEAM THREE BEAM APERTURE ARRAY

FINE ALIGNMENT SYSTEM FOR ELECTRON BEAM EXPOSURE SYSTEM

Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EB...

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE S...

EBEAM UNIVERSAL CUTTER

UNIDIRECTIONAL METAL ON LAYER WITH EBEAM

EBEAM THREE BEAM APERTURE ARRAY

EBEAM STAGGERED BEAM APERTURE ARRAY

EBEAM ALIGN ON THE FLY

EBEAM NON-UNIVERSAL CUTTER

DATA COMPRESSION FOR EBEAM THROUGHPUT

METHOD OF CREATING A MASKLESS AIR GAP IN BACK END INTERCONNECTIONS...

METHOD OF CREATING A MASKLESS AIR GAP IN BACK END INTERCONNECTS WIT...

Phase-shifting masks with sub-wavelength diffractive opical elements

Sub-wavelength diffractive elements to reduce corner rounding

Phase-shifting masks with sub-wavelength diffractive optical elements

IMAGING AND DEVICES IN LITHOGRAPHY

Phase-shifting masks with sub-wavelength diffractive optical elements

Reclaim method for extreme ultraviolet lithography mask blank and a...

Sub-wavelength diffractive elements to reduce corner rounding

Image inspection method

Determining an optimizaton for generating a pixelated photolithogra...

Test structures for feature fidelity improvement

Alignment using latent images

Composite printing

Imaging and devices in lithography

Composite optical lithography method for patterning lines of unequa...