Yang Pan

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical etch nonvolatile materials for MRAM patterning
- Patent number 12,256,645
- Issue date Mar 18, 2025
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide mandrels in patterning
- Patent number 12,183,589
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resistive random access memory with preformed filaments
- Patent number 12,127,486
- Issue date Oct 22, 2024
- Lam Research Corporation
- Hyungsuk Yoon
Information Patent Grant
Plasma etching chemistries of high aspect ratio features in dielect...
- Patent number 12,119,243
- Issue date Oct 15, 2024
- Lam Research Corporation
- Keren J. Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial protection layer for environmentally sensitive surfaces...
- Patent number 12,119,218
- Issue date Oct 15, 2024
- Lam Research Corporation
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and selective deposition process for extreme ultr...
- Patent number 12,062,538
- Issue date Aug 13, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching for subtractive metal etch
- Patent number 11,935,758
- Issue date Mar 19, 2024
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned vertical integration of three-terminal memory devices
- Patent number 11,792,987
- Issue date Oct 17, 2023
- Lam Research Corporation
- Thorsten Lill
Information Patent Grant
Metal-containing passivation for high aspect ratio etch
- Patent number 11,670,516
- Issue date Jun 6, 2023
- Lam Research Corporation
- Karthik S. Colinjivadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching chemistries of high aspect ratio features in dielect...
- Patent number 11,594,429
- Issue date Feb 28, 2023
- Lam Research Corporation
- Keren J. Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of self assembled monolayer for enabling selective depos...
- Patent number 11,450,532
- Issue date Sep 20, 2022
- Lam Research Corporation
- Younghee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching and smoothing of refractory metals and other h...
- Patent number 11,450,513
- Issue date Sep 20, 2022
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide mandrels in patterning
- Patent number 11,355,353
- Issue date Jun 7, 2022
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 11,322,351
- Issue date May 3, 2022
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional deposition on patterned structures
- Patent number 10,825,680
- Issue date Nov 3, 2020
- Lam Research Corporation
- Alexander Kabansky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High energy atomic layer etching
- Patent number 10,763,083
- Issue date Sep 1, 2020
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective self-aligned patterning of silicon germanium, germanium a...
- Patent number 10,741,405
- Issue date Aug 11, 2020
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching 3D structures: Si and SiGe and Ge smoothness o...
- Patent number 10,727,073
- Issue date Jul 28, 2020
- Lam Research Corporation
- Samantha Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching substrates using ALE and selective deposition
- Patent number 10,685,836
- Issue date Jun 16, 2020
- Lam Research Corporation
- Samantha Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 10,546,748
- Issue date Jan 28, 2020
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ale smoothness: in and outside semiconductor industry
- Patent number 10,304,659
- Issue date May 28, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching substrates using ale and selective deposition
- Patent number 10,269,566
- Issue date Apr 23, 2019
- Lam Research Corporation
- Samantha Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective self-aligned patterning of silicon germanium, germanium a...
- Patent number 10,043,672
- Issue date Aug 7, 2018
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ALE smoothness: in and outside semiconductor industry
- Patent number 9,984,858
- Issue date May 29, 2018
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite group III-V and group IV transistor having a switched sub...
- Patent number 9,461,034
- Issue date Oct 4, 2016
- Infineon Technologies Americas Corp.
- Yang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III-V HEMT having a selectably floating substrate
- Patent number 9,397,089
- Issue date Jul 19, 2016
- Infineon Technologies Americas Corp.
- Yang Pan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20250087498
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...
- Publication number 20240429040
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20240429045
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES
- Publication number 20240304428
- Publication date Sep 12, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCHING
- Publication number 20240274408
- Publication date Aug 15, 2024
- LAM RESEARCH CORPORATION
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240258127
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240258128
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240203759
- Publication date Jun 20, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240203760
- Publication date Jun 20, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH
- Publication number 20240186150
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240178014
- Publication date May 30, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20240145272
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...
- Publication number 20240030023
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS
- Publication number 20230314946
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CEILING TEMPERATURE HOMOPOLYMERS AS SACRIFICIAL PROTECTION LAYE...
- Publication number 20230295412
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Stephen M. SIRARD
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBTRACTIVE COPPER ETCH
- Publication number 20230298869
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230290657
- Publication date Sep 14, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING A CHAMBER
- Publication number 20230230819
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Ran LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20230187234
- Publication date Jun 15, 2023
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING...
- Publication number 20230118701
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230045336
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING AND SMOOTHING OF REFRACTORY METALS AND OTHER H...
- Publication number 20220392747
- Publication date Dec 8, 2022
- LAM RESEARCH CORPORATION
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL ETCH NONVOLATILE MATERIALS FOR MRAM PATTERNING
- Publication number 20220376174
- Publication date Nov 24, 2022
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220270877
- Publication date Aug 25, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH AND ION BEAM ETCH PATTERNING
- Publication number 20220254649
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20220244645
- Publication date Aug 4, 2022
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20220216050
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Chemical etch nonvolatile materials for MRAM patterning

Integrated dry processes for patterning radiation photoresist patte...

Tin oxide mandrels in patterning

Resistive random access memory with preformed filaments

Plasma etching chemistries of high aspect ratio features in dielect...

Sacrificial protection layer for environmentally sensitive surfaces...

Photoresist development with halide chemistries

Tin oxide films in semiconductor device manufacturing

Atomic layer etch and ion beam etch patterning

Atomic layer etch and selective deposition process for extreme ultr...

Atomic layer etching for subtractive metal etch

Self-aligned vertical integration of three-terminal memory devices

Metal-containing passivation for high aspect ratio etch

Plasma etching chemistries of high aspect ratio features in dielect...

Deposition of self assembled monolayer for enabling selective depos...

Atomic layer etching and smoothing of refractory metals and other h...

Tin oxide mandrels in patterning

Tin oxide films in semiconductor device manufacturing

Directional deposition on patterned structures

High energy atomic layer etching

Selective self-aligned patterning of silicon germanium, germanium a...

Atomic layer etching 3D structures: Si and SiGe and Ge smoothness o...

Etching substrates using ALE and selective deposition

Tin oxide films in semiconductor device manufacturing

Ale smoothness: in and outside semiconductor industry

Etching substrates using ale and selective deposition

Selective self-aligned patterning of silicon germanium, germanium a...

ALE smoothness: in and outside semiconductor industry

Composite group III-V and group IV transistor having a switched sub...

Group III-V HEMT having a selectably floating substrate

Patents Applicationslast 30 patents

TIN OXIDE MANDRELS IN PATTERNING

SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

HIGH ENERGY ATOMIC LAYER ETCHING

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...

METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS

LOW CEILING TEMPERATURE HOMOPOLYMERS AS SACRIFICIAL PROTECTION LAYE...

SUBTRACTIVE COPPER ETCH

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

METHOD FOR CLEANING A CHAMBER

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

ATOMIC LAYER ETCHING AND SMOOTHING OF REFRACTORY METALS AND OTHER H...

CHEMICAL ETCH NONVOLATILE MATERIALS FOR MRAM PATTERNING

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

ATOMIC LAYER ETCH AND ION BEAM ETCH PATTERNING

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...