Yanwei Liu

Person

Danville, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Critical dimension uniformity enhancement techniques and apparatus
- Patent number 10,074,036
- Issue date Sep 11, 2018
- KLA-Tencor Corporation
- Yanwei Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Techniques and systems for model-based critical dimension measurements
- Patent number 9,875,534
- Issue date Jan 23, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Delta die and delta database inspection
- Patent number 9,778,205
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Carl E. Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoemission monitoring of EUV mirror and mask surface contaminati...
- Patent number 9,453,801
- Issue date Sep 27, 2016
- KLA-Tencor Corporation
- Li Wang
- G01 - MEASURING TESTING
Information Patent Grant
Wave front aberration metrology of optics of EUV mask inspection sy...
- Patent number 9,335,206
- Issue date May 10, 2016
- KLA-Tencor Corporation
- Qiang Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Phase grating for mask inspection system
- Patent number 9,151,881
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Optical characterization systems employing compact synchrotron radi...
- Patent number 8,941,336
- Issue date Jan 27, 2015
- KLA-Tencor Corporation
- Yanwei Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical characterization systems employing compact synchrotron radi...
- Patent number 8,749,179
- Issue date Jun 10, 2014
- KLA-Tencor Corporation
- Yanwei Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Mask for X-Ray Lithography and Metrology
- Publication number 20240112913
- Publication date Apr 4, 2024
- Anne Sakdinawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND SYSTEMS FOR MODEL-BASED CRITICAL DIMENSION MEASUREMENTS
- Publication number 20170069080
- Publication date Mar 9, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY ENHANCEMENT TECHNIQUES AND APPARATUS
- Publication number 20160110858
- Publication date Apr 21, 2016
- KLA-Tencor Corporation
- Yanwei Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DELTA DIE AND DELTA DATABASE INSPECTION
- Publication number 20150276617
- Publication date Oct 1, 2015
- KLA-Tencor Corporation
- Carl E. Hess
- G01 - MEASURING TESTING
Information Patent Application
Phase Grating For Mask Inspection System
- Publication number 20140131586
- Publication date May 15, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G02 - OPTICS
Information Patent Application
WAVE FRONT ABERRATION METROLOGY OF OPTICS OF EUV MASK INSPECTION SY...
- Publication number 20140063490
- Publication date Mar 6, 2014
- Qiang Zhang
- G02 - OPTICS
Information Patent Application
Optical Characterization Systems Employing Compact Synchrotron Radi...
- Publication number 20140048707
- Publication date Feb 20, 2014
- KLA-Tencor Corporation
- Yanwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOEMISSION MONITORING OF EUV MIRROR AND MASK SURFACE CONTAMINATI...
- Publication number 20130313442
- Publication date Nov 28, 2013
- KLA-Tencor Corporation, a Delaware Corporation
- Li Wang
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Critical dimension uniformity enhancement techniques and apparatus

Techniques and systems for model-based critical dimension measurements

Delta die and delta database inspection

Photoemission monitoring of EUV mirror and mask surface contaminati...

Wave front aberration metrology of optics of EUV mask inspection sy...

Phase grating for mask inspection system

Optical characterization systems employing compact synchrotron radi...

Optical characterization systems employing compact synchrotron radi...

Patents Applicationslast 30 patents

Mask for X-Ray Lithography and Metrology

TECHNIQUES AND SYSTEMS FOR MODEL-BASED CRITICAL DIMENSION MEASUREMENTS

CRITICAL DIMENSION UNIFORMITY ENHANCEMENT TECHNIQUES AND APPARATUS

DELTA DIE AND DELTA DATABASE INSPECTION

Phase Grating For Mask Inspection System

WAVE FRONT ABERRATION METROLOGY OF OPTICS OF EUV MASK INSPECTION SY...

Optical Characterization Systems Employing Compact Synchrotron Radi...

PHOTOEMISSION MONITORING OF EUV MIRROR AND MASK SURFACE CONTAMINATI...