Yao-Ching KU

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Pellicle fabrication methods and structures thereof
- Patent number 10,747,103
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle fabrication methods and structures thereof
- Patent number 10,162,258
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method for overlay marks
- Patent number 10,163,738
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsien-Cheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method for overlay marks
- Patent number 9,543,406
- Issue date Jan 10, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Cheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of defining an intensity selective exposure photomask
- Patent number 9,026,957
- Issue date May 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrated circuit layout and method with double patterning
- Patent number 8,987,008
- Issue date Mar 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Feng Shieh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Intensity selective exposure photomask
- Patent number 8,673,520
- Issue date Mar 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to improve mask critical dimension uniformity (CDU)
- Patent number 8,609,545
- Issue date Dec 17, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsiung Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intensity selective exposure photomask
- Patent number 8,431,291
- Issue date Apr 30, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Driven metal critical dimension (CD) biasing
- Patent number 8,375,347
- Issue date Feb 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Louis Chao-Chiuan Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model import for electronic design automation
- Patent number 8,352,888
- Issue date Jan 8, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model import for electronic design automation
- Patent number 8,214,772
- Issue date Jul 3, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Table-based DFM for accurate post-layout analysis
- Patent number 8,201,111
- Issue date Jun 12, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Chin Hou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for shape and timing equivalent dimension extraction
- Patent number 8,037,575
- Issue date Oct 18, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ying-Chou Cheng
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Table-based DFM for accurate post-layout analysis
- Patent number 8,001,494
- Issue date Aug 16, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Chin Hou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model import for electronic design automation
- Patent number 7,954,072
- Issue date May 31, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electrical parameter extraction for integrated circuit design
- Patent number 7,783,999
- Issue date Aug 24, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsong-Hua Ou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Regression system and methods for optical proximity correction mode...
- Patent number 7,778,805
- Issue date Aug 17, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen Chun Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for providing phase shift mask passivation layer
- Patent number 7,727,682
- Issue date Jun 1, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Ting Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detection and scoring of hot spots in a design layout
- Patent number 7,685,558
- Issue date Mar 23, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ming Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Top patterned hardmask and method for patterning
- Patent number 7,387,969
- Issue date Jun 17, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for processing masks with oblique features
- Patent number 7,314,689
- Issue date Jan 1, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ overlay alignment
- Patent number 7,218,400
- Issue date May 15, 2007
- Taiwan Semiconductor Manufacturing Company Ltd.
- Grace H. Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CD SEM automatic focus methodology and apparatus for constant elect...
- Patent number 6,979,820
- Issue date Dec 27, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Ming Ke
- G01 - MEASURING TESTING
Information Patent Grant
Removal of line end shortening in microlithography and mask set for...
- Patent number 6,492,073
- Issue date Dec 10, 2002
- Taiwan Semiconductor Manufacturing Company
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE FABRICATION METHODS AND STRUCTURES THEREOF
- Publication number 20190204730
- Publication date Jul 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FABRICATION METHODS AND STRUCTURES THEREOF
- Publication number 20180173092
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD FOR OVERLAY MARKS
- Publication number 20170084506
- Publication date Mar 23, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Cheng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT LAYOUT AND METHOD WITH DOUBLE PATTERNING
- Publication number 20150056724
- Publication date Feb 26, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Feng Shieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEFINING AN INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Publication number 20140170537
- Publication date Jun 19, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STRUCTURE AND METHOD FOR OVERLAY MARKS
- Publication number 20120146159
- Publication date Jun 14, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Cheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Publication number 20120040278
- Publication date Feb 16, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Table-Based DFM for Accurate Post-Layout Analysis
- Publication number 20110289466
- Publication date Nov 24, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Chin HOU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL IMPORT FOR ELECTRONIC DESIGN AUTOMATION
- Publication number 20110230998
- Publication date Sep 22, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL IMPORT FOR ELECTRONIC DESIGN AUTOMATION
- Publication number 20110231804
- Publication date Sep 22, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Publication number 20110217630
- Publication date Sep 8, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DESIGN-DRIVEN METAL CRITICAL DIMENSION (CD) BIASING
- Publication number 20100293514
- Publication date Nov 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Louis Chao-Chiuan Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TABLE-BASED DFM FOR ACCURATE POST-LAYOUT ANALYSIS
- Publication number 20100095253
- Publication date Apr 15, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Chin HOU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
NOVEL TREATMENT FOR MASK SURFACE CHEMICAL REDUCTION
- Publication number 20090258159
- Publication date Oct 15, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Chen Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SHAPE AND TIMING EQUIVALENT DIMENSION EXTRACTION
- Publication number 20090222785
- Publication date Sep 3, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ying-Chou CHENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method To Improve Mask Critical Dimension Uniformity (CDU)
- Publication number 20090206057
- Publication date Aug 20, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsiung Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electrical Parameter Extraction for Integrated Circuit Design
- Publication number 20090187866
- Publication date Jul 23, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsong-Hua Ou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method for Providing Phase Shift Mask Passivation Layer
- Publication number 20080233486
- Publication date Sep 25, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Ting Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Model Import for Electronic Design Automation
- Publication number 20070265725
- Publication date Nov 15, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Detection and Scoring of Hot Spots in a Design Layout
- Publication number 20070266362
- Publication date Nov 15, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ming Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Regression system and methods for optical proximity correction mode...
- Publication number 20070038417
- Publication date Feb 15, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen Chun Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Top patterned hardmask and method for patterning
- Publication number 20060211254
- Publication date Sep 21, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
In-situ overlay alignment
- Publication number 20050195397
- Publication date Sep 8, 2005
- Grace H. Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for processing masks with oblique features
- Publication number 20050164098
- Publication date Jul 28, 2005
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CD sem automatic focus methodology and apparatus for constant elect...
- Publication number 20050023463
- Publication date Feb 3, 2005
- Taiwan Semicondutor Manufacturing Co.
- Chih-Ming Ke
- G01 - MEASURING TESTING

Yao-Ching KU

Person

Patents Grantslast 30 patents

Pellicle fabrication methods and structures thereof

Pellicle fabrication methods and structures thereof

Structure and method for overlay marks

Structure and method for overlay marks

Method of defining an intensity selective exposure photomask

Integrated circuit layout and method with double patterning

Intensity selective exposure photomask

Method to improve mask critical dimension uniformity (CDU)

Intensity selective exposure photomask

Driven metal critical dimension (CD) biasing

Model import for electronic design automation

Model import for electronic design automation

Table-based DFM for accurate post-layout analysis

Method for shape and timing equivalent dimension extraction

Table-based DFM for accurate post-layout analysis

Model import for electronic design automation

Electrical parameter extraction for integrated circuit design

Regression system and methods for optical proximity correction mode...

System and method for providing phase shift mask passivation layer

Method for detection and scoring of hot spots in a design layout

Top patterned hardmask and method for patterning

System and method for processing masks with oblique features

In-situ overlay alignment

CD SEM automatic focus methodology and apparatus for constant elect...

Removal of line end shortening in microlithography and mask set for...

Patents Applicationslast 30 patents

PELLICLE FABRICATION METHODS AND STRUCTURES THEREOF

PELLICLE FABRICATION METHODS AND STRUCTURES THEREOF

STRUCTURE AND METHOD FOR OVERLAY MARKS

INTEGRATED CIRCUIT LAYOUT AND METHOD WITH DOUBLE PATTERNING

METHOD OF DEFINING AN INTENSITY SELECTIVE EXPOSURE PHOTOMASK

STRUCTURE AND METHOD FOR OVERLAY MARKS

INTENSITY SELECTIVE EXPOSURE PHOTOMASK

Table-Based DFM for Accurate Post-Layout Analysis

MODEL IMPORT FOR ELECTRONIC DESIGN AUTOMATION

MODEL IMPORT FOR ELECTRONIC DESIGN AUTOMATION

INTENSITY SELECTIVE EXPOSURE PHOTOMASK

DESIGN-DRIVEN METAL CRITICAL DIMENSION (CD) BIASING

TABLE-BASED DFM FOR ACCURATE POST-LAYOUT ANALYSIS

NOVEL TREATMENT FOR MASK SURFACE CHEMICAL REDUCTION

METHOD FOR SHAPE AND TIMING EQUIVALENT DIMENSION EXTRACTION

Method To Improve Mask Critical Dimension Uniformity (CDU)

Electrical Parameter Extraction for Integrated Circuit Design

System and Method for Providing Phase Shift Mask Passivation Layer

Model Import for Electronic Design Automation

Method for Detection and Scoring of Hot Spots in a Design Layout

Regression system and methods for optical proximity correction mode...

Top patterned hardmask and method for patterning

In-situ overlay alignment

System and method for processing masks with oblique features

CD sem automatic focus methodology and apparatus for constant elect...