Yao Zhi Hu

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective reflectivity process chamber with customized wavelength r...
- Patent number 9,633,876
- Issue date Apr 25, 2017
- Mattson Technology, Inc.
- Paul J. Timans
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method and system for thermally processing a plurality of wafer-sha...
- Patent number 7,977,258
- Issue date Jul 12, 2011
- Mattson Technology, Inc.
- Zsolt Nenyei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective reflectivity process chamber with customized wavelength r...
- Patent number 7,737,385
- Issue date Jun 15, 2010
- Mattson Technology, Inc.
- Paul J. Timans
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Device and method for thermally treating semiconductor wafers
- Patent number 7,151,060
- Issue date Dec 19, 2006
- Mattson Thermal Products GmbH
- Georg Roters
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective reflectivity process chamber with customized wavelength r...
- Patent number 7,115,837
- Issue date Oct 3, 2006
- Mattson Technology, Inc.
- Paul J. Timans
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Rapid thermal processing system for integrated circuits
- Patent number 6,707,011
- Issue date Mar 16, 2004
- Mattson Technology, Inc.
- Sing-Pin Tay
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
UV-enhanced oxy-nitridation of semiconductor substrates
- Patent number 6,706,643
- Issue date Mar 16, 2004
- Mattson Technology, Inc.
- Sing-Pin Tay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing system for integrated circuits
- Patent number 6,600,138
- Issue date Jul 29, 2003
- Mattson Technology, Inc.
- Markus Hauf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
UV pretreatment process for ultra-thin oxynitride formation
- Patent number 6,451,713
- Issue date Sep 17, 2002
- Mattson Technology, Inc.
- Sing-Pin Tay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for controlling the temperature of a reflective substrate du...
- Patent number 6,403,923
- Issue date Jun 11, 2002
- Mattson Technology, Inc.
- Sing Pin Tay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for controlling the temperature of a reflective substrate du...
- Patent number 6,359,263
- Issue date Mar 19, 2002
- Steag RTP Systems, Inc.
- Sing Pin Tay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for measuring the temperature of a semiconductor wafer durin...
- Patent number 6,204,484
- Issue date Mar 20, 2001
- Steag RTP Systems, Inc.
- Sing Pin Tay
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for determining the temperature in a thermal processing chamber
- Patent number 6,200,023
- Issue date Mar 13, 2001
- Steag RTP Systems, Inc.
- Sing Pin Tay
- G01 - MEASURING TESTING
Information Patent Grant
Process for preventing gas leaks in an atmospheric thermal processi...
- Patent number 6,075,922
- Issue date Jun 13, 2000
- Steag RTP Systems, Inc.
- Sing Pin Tay
- F26 - DRYING

Patents Applicationslast 30 patents

Information Patent Application
Selective Reflectivity Process Chamber with Customized Wavelength R...
- Publication number 20100219174
- Publication date Sep 2, 2010
- Paul J. Timans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process and System For Varying the Exposure to a Chemical Ambient i...
- Publication number 20090325386
- Publication date Dec 31, 2009
- Mattson Technology, Inc.
- Daniel J. Devine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for thermally processing a plurality of wafer-sha...
- Publication number 20080248657
- Publication date Oct 9, 2008
- Zsolt Nenyei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective reflectivity process chamber with customized wavelength r...
- Publication number 20070131671
- Publication date Jun 14, 2007
- Paul J. Timans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective reflectivity process chamber with customized wavelength r...
- Publication number 20050023267
- Publication date Feb 3, 2005
- Paul J. Timans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV-enhanced oxy-nitridation of semiconductor substrates
- Publication number 20030148628
- Publication date Aug 7, 2003
- Mattson Technology, Inc., a Delaware Corporation
- Sing-Pin Tay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rapid thermal processing system for integrated circuits
- Publication number 20030094446
- Publication date May 22, 2003
- Mattson Technology, Inc.
- Sing-Pin Tay
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Rapid thermal processing system for integrated circuits
- Publication number 20020148824
- Publication date Oct 17, 2002
- Markus Hauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR CONTROLLING THE TEMPERATURE OF A REFLECTIVE SUBSTRATE DU...
- Publication number 20010040156
- Publication date Nov 15, 2001
- SING PIN TAY
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Selective reflectivity process chamber with customized wavelength r...

Method and system for thermally processing a plurality of wafer-sha...

Selective reflectivity process chamber with customized wavelength r...

Device and method for thermally treating semiconductor wafers

Selective reflectivity process chamber with customized wavelength r...

Rapid thermal processing system for integrated circuits

UV-enhanced oxy-nitridation of semiconductor substrates

Rapid thermal processing system for integrated circuits

UV pretreatment process for ultra-thin oxynitride formation

System for controlling the temperature of a reflective substrate du...

System for controlling the temperature of a reflective substrate du...

System for measuring the temperature of a semiconductor wafer durin...

Method for determining the temperature in a thermal processing chamber

Process for preventing gas leaks in an atmospheric thermal processi...

Patents Applicationslast 30 patents

Selective Reflectivity Process Chamber with Customized Wavelength R...

Process and System For Varying the Exposure to a Chemical Ambient i...

Method and system for thermally processing a plurality of wafer-sha...

Selective reflectivity process chamber with customized wavelength r...

Selective reflectivity process chamber with customized wavelength r...

UV-enhanced oxy-nitridation of semiconductor substrates

Rapid thermal processing system for integrated circuits

Rapid thermal processing system for integrated circuits

SYSTEM FOR CONTROLLING THE TEMPERATURE OF A REFLECTIVE SUBSTRATE DU...