Yassine Kabouzi

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated wafer bow measurements
- Patent number 11,885,750
- Issue date Jan 30, 2024
- Lam Research Corporation
- Rajan Arora
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 11,056,322
- Issue date Jul 6, 2021
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with optical cavity for determining process rate
- Patent number 10,930,478
- Issue date Feb 23, 2021
- Lam Research Corporation
- Jagadeeshwari Manne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint sensor based control including adjustment of an edge ring...
- Patent number 10,903,050
- Issue date Jan 26, 2021
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining etch process parameters
- Patent number 10,784,174
- Issue date Sep 22, 2020
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 10,504,704
- Issue date Dec 10, 2019
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas exhaust by-product measurement system
- Patent number 10,302,553
- Issue date May 28, 2019
- Lam Research Corporation
- Cristian Siladie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting a process point in multi-mode pulse...
- Patent number 10,242,849
- Issue date Mar 26, 2019
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for real-time monitoring of plasma chamber wal...
- Patent number 10,134,569
- Issue date Nov 20, 2018
- Lam Research Corporation
- Luc Albarede
- G02 - OPTICS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 9,735,069
- Issue date Aug 15, 2017
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting a process point in multi-mode pulse...
- Patent number 9,640,371
- Issue date May 2, 2017
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 9,548,189
- Issue date Jan 17, 2017
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED WAFER BOW MEASUREMENTS
- Publication number 20240094144
- Publication date Mar 21, 2024
- LAM RESEARCH CORPORATION
- Rajan Arora
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED WAFER BOW MEASUREMENTS
- Publication number 20220074869
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Rajan Arora
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE
- Publication number 20210142991
- Publication date May 13, 2021
- LAM RESEARCH CORPORATION
- Jagadeeshwari MANNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT SENSOR BASED CONTROL INCLUDING ADJUSTMENT OF AN EDGE RING...
- Publication number 20200185194
- Publication date Jun 11, 2020
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE
- Publication number 20190362950
- Publication date Nov 28, 2019
- LAM RESEARCH CORPORATION
- Jagadeeshwari MANNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS PARAMETERS
- Publication number 20190115267
- Publication date Apr 18, 2019
- LAM RESEARCH CORPORATION
- Yassine KABOUZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS EXHAUST BY-PRODUCT MEASUREMENT SYSTEM
- Publication number 20190064057
- Publication date Feb 28, 2019
- LAM RESEARCH CORPORATION
- Cristian SILADIE
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170338160
- Publication date Nov 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULT-MODE PULSE...
- Publication number 20170207070
- Publication date Jul 20, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170084426
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170084503
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20170084433
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- LUC ALBAREDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20160314943
- Publication date Oct 27, 2016
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Detecting a Process Point in Multi-Mode Pulse...
- Publication number 20160111261
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS

Yassine Kabouzi

Person

Patents Grantslast 30 patents

Integrated wafer bow measurements

Method and apparatus for determining process rate

Apparatus with optical cavity for determining process rate

Endpoint sensor based control including adjustment of an edge ring...

Method and apparatus for determining etch process parameters

Plasma etching systems and methods using empirical mode decomposition

Gas exhaust by-product measurement system

System and method for detecting a process point in multi-mode pulse...

Method and apparatus for real-time monitoring of plasma chamber wal...

Method and apparatus for determining process rate

System and method for detecting a process point in multi-mode pulse...

Plasma etching systems and methods using empirical mode decomposition

Patents Applicationslast 30 patents

INTEGRATED WAFER BOW MEASUREMENTS

INTEGRATED WAFER BOW MEASUREMENTS

APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE

ENDPOINT SENSOR BASED CONTROL INCLUDING ADJUSTMENT OF AN EDGE RING...

APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE

METHOD AND APPARATUS FOR DETERMINING PROCESS PARAMETERS

GAS EXHAUST BY-PRODUCT MEASUREMENT SYSTEM

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULT-MODE PULSE...

APPARATUS FOR DETERMINING PROCESS RATE

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

System and Method for Detecting a Process Point in Multi-Mode Pulse...