Yasufumi Nishii

Person

Kumagaya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,846,371
- Issue date Dec 19, 2017
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, and exposure method, with recovery device to re...
- Patent number 9,798,245
- Issue date Oct 24, 2017
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 9,766,555
- Issue date Sep 19, 2017
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 9,599,907
- Issue date Mar 21, 2017
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,268,237
- Issue date Feb 23, 2016
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,235,139
- Issue date Jan 12, 2016
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 9,182,684
- Issue date Nov 10, 2015
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,019,467
- Issue date Apr 28, 2015
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery system, immersion exposure apparatus, immersion exp...
- Patent number 9,013,675
- Issue date Apr 21, 2015
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maintenance method, maintenance device, exposure apparatus, and dev...
- Patent number 8,891,055
- Issue date Nov 18, 2014
- Nikon Corporation
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for producing device
- Patent number 8,736,809
- Issue date May 27, 2014
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 8,488,099
- Issue date Jul 16, 2013
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 8,477,283
- Issue date Jul 2, 2013
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maintenance method, maintenance device, exposure apparatus, and dev...
- Patent number 8,456,608
- Issue date Jun 4, 2013
- Nikon Corporation
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 8,384,880
- Issue date Feb 26, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, immersion system, exposing method, and device f...
- Patent number 8,300,207
- Issue date Oct 30, 2012
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion system, exposure apparatus, exposing method, and device f...
- Patent number 8,233,139
- Issue date Jul 31, 2012
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 8,208,117
- Issue date Jun 26, 2012
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery system, immersion exposure apparatus, immersion exp...
- Patent number 8,134,685
- Issue date Mar 13, 2012
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, maintenance method, exposure method, and method...
- Patent number 8,035,800
- Issue date Oct 11, 2011
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, exposure apparatus, and exposure method with recov...
- Patent number 7,982,857
- Issue date Jul 19, 2011
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maintenance method, maintenance device, exposure apparatus, and dev...
- Patent number 7,804,576
- Issue date Sep 28, 2010
- Nikon Corporation
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
STAGE APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20180004096
- Publication date Jan 4, 2018
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20170329234
- Publication date Nov 16, 2017
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- Publication number 20160246188
- Publication date Aug 25, 2016
- Nikon Corporation
- Hiroyuki NAGASAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20150301457
- Publication date Oct 22, 2015
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
- Publication number 20140240684
- Publication date Aug 28, 2014
- Nikon Corporation
- Hiroyuki NAGASAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130271739
- Publication date Oct 17, 2013
- Nikon Corporation
- Hiroyuki NAGASAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MAINTENANCE METHOD, MAINTENANCE DEVICE, EXPOSURE APPARATUS, AND DEV...
- Publication number 20130235359
- Publication date Sep 12, 2013
- Nikon Corporation
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, P...
- Publication number 20130169944
- Publication date Jul 4, 2013
- Nikon Corporation
- Yasufumi NISHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20130141703
- Publication date Jun 6, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20130141701
- Publication date Jun 6, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION SYSTEM, EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE F...
- Publication number 20120300181
- Publication date Nov 29, 2012
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXP...
- Publication number 20120133912
- Publication date May 31, 2012
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus, exposure apparatus, and exposure method
- Publication number 20110080574
- Publication date Apr 7, 2011
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and method for producing device
- Publication number 20110032498
- Publication date Feb 10, 2011
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposing method and device fabricating method
- Publication number 20100328637
- Publication date Dec 30, 2010
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maintenance method, maintenance device, exposure apparatus, and dev...
- Publication number 20100315609
- Publication date Dec 16, 2010
- Nikon Corporation
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion system, exposure apparatus, exposing method, and device f...
- Publication number 20090280436
- Publication date Nov 12, 2009
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, liquid immersion system, exposing method, and d...
- Publication number 20090122282
- Publication date May 14, 2009
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20090015816
- Publication date Jan 15, 2009
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20090015808
- Publication date Jan 15, 2009
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, immersion system, exposing method, and device f...
- Publication number 20080284991
- Publication date Nov 20, 2008
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid recovery system, immersion exposure apparatus, immersion exp...
- Publication number 20080233512
- Publication date Sep 25, 2008
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and methods for reducing the escape of immersion liquid f...
- Publication number 20080231823
- Publication date Sep 25, 2008
- Nikon Corporation
- Alex Ka Tim Poon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Apparatus and Device Producing Method
- Publication number 20080018866
- Publication date Jan 24, 2008
- NIKON CORPORATION
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maintenance Method, Maintenance Device, Exposure Apparatus, and Dev...
- Publication number 20080018867
- Publication date Jan 24, 2008
- Nikon Corporation
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, maintenance method, exposure method, and method...
- Publication number 20080013064
- Publication date Jan 17, 2008
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and device manufacturing method
- Publication number 20070296939
- Publication date Dec 27, 2007
- Nikon Corporation
- Yasufumi Nishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and method for producing device
- Publication number 20070263185
- Publication date Nov 15, 2007
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and method for producing device
- Publication number 20070263183
- Publication date Nov 15, 2007
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and method for producing device
- Publication number 20070263186
- Publication date Nov 15, 2007
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yasufumi Nishii

Person

Patents Grantslast 30 patents

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, and exposure method, with recovery device to re...

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus and device manufacturing method

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, exposure method, and method for producing device

Exposure method, substrate stage, exposure apparatus, and device ma...

Liquid recovery system, immersion exposure apparatus, immersion exp...

Maintenance method, maintenance device, exposure apparatus, and dev...

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method

Maintenance method, maintenance device, exposure apparatus, and dev...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, immersion system, exposing method, and device f...

Immersion system, exposure apparatus, exposing method, and device f...

Exposure method, substrate stage, exposure apparatus, and device ma...

Liquid recovery system, immersion exposure apparatus, immersion exp...

Exposure apparatus, maintenance method, exposure method, and method...

Stage apparatus, exposure apparatus, and exposure method with recov...

Maintenance method, maintenance device, exposure apparatus, and dev...

Patents Applicationslast 30 patents

STAGE APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

MAINTENANCE METHOD, MAINTENANCE DEVICE, EXPOSURE APPARATUS, AND DEV...

EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, P...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

IMMERSION SYSTEM, EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE F...

LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXP...

Stage apparatus, exposure apparatus, and exposure method

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus, exposing method and device fabricating method

Maintenance method, maintenance device, exposure apparatus, and dev...

Immersion system, exposure apparatus, exposing method, and device f...

Exposure apparatus, liquid immersion system, exposing method, and d...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus, immersion system, exposing method, and device f...

Liquid recovery system, immersion exposure apparatus, immersion exp...

Apparatus and methods for reducing the escape of immersion liquid f...

Exposure Apparatus and Device Producing Method

Maintenance Method, Maintenance Device, Exposure Apparatus, and Dev...

Exposure apparatus, maintenance method, exposure method, and method...

Exposure apparatus and device manufacturing method

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus, exposure method, and method for producing device