Yasuharu Sasaki

Person

Kurokawa-Gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,896
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Akira Nagayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, focus ring, support base, plasma processing ap...
- Patent number 12,046,457
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for manufacturing mounting s...
- Patent number 12,033,886
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,984,300
- Issue date May 14, 2024
- Tokyo Electron Limited
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 11,935,729
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,171
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, support platform, and plasma processing apparatus
- Patent number 11,894,218
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Masato Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck for semiconductor manufacturing device
- Patent number D1012051
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Masato Takayama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,830,751
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 11,798,791
- Issue date Oct 24, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 11,791,139
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 11,764,038
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring
- Patent number D992614
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- D16 - Photography and optical equipment
Information Patent Grant
Focus ring
- Patent number D992615
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate support assembly, plasma processing apparatus, and plasma...
- Patent number 11,688,587
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Masashi Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placing table, positioning method of edge ring and substrate proces...
- Patent number 11,664,200
- Issue date May 30, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support, plasma processing apparatus, and focus ring
- Patent number 11,600,471
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting stage, substrate processing device, and edge ring
- Patent number 11,538,668
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and substrate processing apparatus
- Patent number 11,538,715
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Ryo Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate support
- Patent number 11,521,886
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,437,223
- Issue date Sep 6, 2022
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,500
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 11,133,759
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Yasuharu Sasaki
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Dechuck control method and plasma processing apparatus
- Patent number 11,037,815
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,004,717
- Issue date May 11, 2021
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,910,252
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power feed structure and plasma processing apparatus
- Patent number 10,886,108
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 10,879,050
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic attraction method
- Patent number 10,832,930
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Katsunori Hirai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...
- Publication number 20240347322
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240194458
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240194457
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
ELECTROSTATIC CHUCK, SUBSTRATE SUPPORT, AND SUBSTRATE PROCESSING AP...
- Publication number 20240186917
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Masashi SHIMODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY, PLASMA PROCESSING APPARATUS, AND PLASMA...
- Publication number 20230298865
- Publication date Sep 21, 2023
- TOKYO ELECTRON LIMITED
- Masashi IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20220384155
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20220375777
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Naoyuki SATOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220336193
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20220285138
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...
- Publication number 20210366694
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210327741
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Akira NAGAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING BASE, SUBSTRATE PROCESSING DEVICE, EDGE RING, AND EDGE RIN...
- Publication number 20210327688
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210316416
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Taketoshi TOMIOKA
- B24 - GRINDING POLISHING
Information Patent Application
EDGE RING, STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210319987
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Ryo CHIBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20210305025
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCT...
- Publication number 20210280397
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Yoichi KUROSAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210233794
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210118647
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20210082733
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...
- Publication number 20210074522
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE SUPPORT
- Publication number 20210005495
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20200402777
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, SUPPORT PLATFORM, AND PLASMA PROCESSING APPARATUS
- Publication number 20200388472
- Publication date Dec 10, 2020
- TOKYO ELECTRON LIMITED
- Masato TAKAYAMA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200373130
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200335384
- Publication date Oct 22, 2020
- TOKYO ELECTRON LIMITED
- Ryo CHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mounting Stage, Substrate Processing Device, and Edge Ring
- Publication number 20200194239
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER FEED STRUCTURE AND PLASMA PROCESSING APPARATUS
- Publication number 20200194240
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20200185250
- Publication date Jun 11, 2020
- TOKYO ELECTRON LIMITED
- Naoyuki SATOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND FOCUS RING
- Publication number 20200152428
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS

Yasuharu Sasaki

Person

Patents Grantslast 30 patents

Substrate support and substrate processing apparatus

Electrostatic chuck, focus ring, support base, plasma processing ap...

Plasma processing apparatus and method for manufacturing mounting s...

Plasma processing apparatus

Substrate support and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Stage and plasma processing apparatus

Electrostatic chuck, support platform, and plasma processing apparatus

Electrostatic chuck for semiconductor manufacturing device

Plasma processing apparatus and plasma processing method

Substrate support and plasma processing apparatus

Substrate support

Plasma processing apparatus, electrostatic attraction method, and e...

Focus ring

Focus ring

Substrate support assembly, plasma processing apparatus, and plasma...

Placing table, positioning method of edge ring and substrate proces...

Substrate support, plasma processing apparatus, and focus ring

Mounting stage, substrate processing device, and edge ring

Stage and substrate processing apparatus

Substrate processing apparatus and substrate support

Stage and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Electrostatic chuck, substrate processing apparatus, and substrate...

Dechuck control method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Power feed structure and plasma processing apparatus

Plasma processing apparatus, electrostatic attraction method, and e...

Electrostatic attraction method

Patents Applicationslast 30 patents

ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

ELECTROSTATIC CHUCK, SUBSTRATE SUPPORT, AND SUBSTRATE PROCESSING AP...

STAGE AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT ASSEMBLY, PLASMA PROCESSING APPARATUS, AND PLASMA...

STAGE AND PLASMA PROCESSING APPARATUS

STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE SUPPORT

ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

MOUNTING BASE, SUBSTRATE PROCESSING DEVICE, EDGE RING, AND EDGE RIN...

FOCUS RING AND SUBSTRATE PROCESSING APPARATUS

EDGE RING, STAGE AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCT...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE SUPPORT

STAGE AND PLASMA PROCESSING APPARATUS

ELECTROSTATIC CHUCK, SUPPORT PLATFORM, AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

STAGE AND SUBSTRATE PROCESSING APPARATUS

Mounting Stage, Substrate Processing Device, and Edge Ring

POWER FEED STRUCTURE AND PLASMA PROCESSING APPARATUS

STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUS

SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND FOCUS RING