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Yasuhiko Endo
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Tokyo, JP
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last 30 patents
Information
Patent Grant
Plating apparatus and plating method for forming magnetic film
Patent number
8,877,030
Issue date
Nov 4, 2014
Ebara Corporation
Yasuhiko Endo
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Substrate holder, plating apparatus, and plating method
Patent number
8,133,376
Issue date
Mar 13, 2012
Ebara Corporation
Junichiro Yoshioka
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Apparatus and method for plating a substrate
Patent number
8,048,282
Issue date
Nov 1, 2011
Ebara Corporation
Masahiko Sekimoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Substrate holder, plating apparatus, and plating method
Patent number
7,807,027
Issue date
Oct 5, 2010
Ebara Corporation
Junichiro Yoshioka
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Substrate holder, plating apparatus, and plating method
Patent number
6,844,274
Issue date
Jan 18, 2005
Ebara Corporation
Junichiro Yoshioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Monolithic refractory powder mixture
Patent number
5,512,523
Issue date
Apr 30, 1996
Asahi Glass Company Ltd.
Yasushi Ono
C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information
Patent Grant
Ceramics binder mixture and binding method
Patent number
5,506,179
Issue date
Apr 9, 1996
Asahi Glass Company Ltd.
Tomohiro Morishita
C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Patents Applications
last 30 patents
Information
Patent Application
PLATING APPARATUS AND PLATING METHOD
Publication number
20130015075
Publication date
Jan 17, 2013
Masahiko SEKIMOTO
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
SUBSTRATE HOLDER, PLATING APPARATUS, AND PLATING METHOD
Publication number
20100320090
Publication date
Dec 23, 2010
Junichiro Yoshioka
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Plating apparatus and plating method for forming magnetic film
Publication number
20100006444
Publication date
Jan 14, 2010
EBARA CORPORATION
Yasuhiko Endo
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PLATING APPARATUS AND PLATING METHOD
Publication number
20090301395
Publication date
Dec 10, 2009
Masahiko SEKIMOTO
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Apparatus and method for plating a substrate
Publication number
20090045068
Publication date
Feb 19, 2009
Masahiko Sekimoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Plating apparatus and plating method
Publication number
20060141157
Publication date
Jun 29, 2006
Masahiko Sekimoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Substrate holder, plating apparatus, and plating method
Publication number
20050092600
Publication date
May 5, 2005
Junichiro Yoshioka
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Apparatus and method for plating a substrate
Publication number
20040245112
Publication date
Dec 9, 2004
Masahiko Sekimoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Substrate holder, plating apparatus, and plating method
Publication number
20040037682
Publication date
Feb 26, 2004
Junichiro Yoshioka
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR