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Yasuhiko Matsuda
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Tokyo, JP
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last 30 patents
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
10,048,586
Issue date
Aug 14, 2018
JSR Corporation
Yuusuke Asano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,513,548
Issue date
Dec 6, 2016
JSR Corporation
Yuusuke Asano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
9,104,102
Issue date
Aug 11, 2015
JSR Corporation
Yasuhiko Matsuda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, polymer, and resist pattern-...
Patent number
8,980,529
Issue date
Mar 17, 2015
JSR Corporation
Yasuhiko Matsuda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition, polymer, and method for form...
Patent number
8,815,490
Issue date
Aug 26, 2014
JSR Corporation
Yasuhiko Matsuda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
8,728,706
Issue date
May 20, 2014
JSR Corporation
Yuusuke Asano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20160179003
Publication date
Jun 23, 2016
JSR Corporation
Yuusuke ASANO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20140212813
Publication date
Jul 31, 2014
JSR Corporation
Yuusuke ASANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130244185
Publication date
Sep 19, 2013
JSR Corporation
Yasuhiko MATSUDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...
Publication number
20130203000
Publication date
Aug 8, 2013
JSR Corporation
Yasuhiko MATSUDA
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130065186
Publication date
Mar 14, 2013
JSR Corporation
Yasuhiko MATSUDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20120295198
Publication date
Nov 22, 2012
JSR Corporation
Yasuhiko MATSUDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20120237875
Publication date
Sep 20, 2012
JSR Corporation
Yuusuke ASANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORM...
Publication number
20120094234
Publication date
Apr 19, 2012
JSR Corporation
Yasuhiko MATSUDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
Publication number
20110262865
Publication date
Oct 27, 2011
JSR Corporation
Yukio NISHIMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
Publication number
20110223537
Publication date
Sep 15, 2011
JSR Corporation
Takuma Ebata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION...
Publication number
20110212401
Publication date
Sep 1, 2011
JSR Corporation
Yukio NISHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY