Yasuhiko Sugiyama

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, composite charged particle beam ap...
- Patent number 11,276,555
- Issue date Mar 15, 2022
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus, and control method for focused ion beam...
- Patent number 11,257,655
- Issue date Feb 22, 2022
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite charged particle beam apparatus and control method thereof
- Patent number 11,017,982
- Issue date May 25, 2021
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,017,988
- Issue date May 25, 2021
- HITACH HIGH-TECH SCIENCE CORPORATION
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,176,964
- Issue date Jan 8, 2019
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and plasma ignition method
- Patent number 10,056,232
- Issue date Aug 21, 2018
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 9,793,085
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source and charged particle beam apparatus
- Patent number 9,773,637
- Issue date Sep 26, 2017
- Hitachi High-Technologies Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source and charged particle beam apparatus
- Patent number 9,773,646
- Issue date Sep 26, 2017
- Hitachi High-Technologies Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,773,634
- Issue date Sep 26, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emitter structure, gas ion source and focused ion beam system
- Patent number 9,640,361
- Issue date May 2, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,583,299
- Issue date Feb 28, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus and control method thereof
- Patent number 9,418,817
- Issue date Aug 16, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair apparatus
- Patent number 9,378,858
- Issue date Jun 28, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focused ion beam apparatus with precious metal emitter surface
- Patent number 9,336,979
- Issue date May 10, 2016
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam system
- Patent number 9,245,712
- Issue date Jan 26, 2016
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emitter structure, gas ion source and focused ion beam system
- Patent number 9,129,771
- Issue date Sep 8, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus
- Patent number 9,111,717
- Issue date Aug 18, 2015
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating emitter
- Patent number 8,999,178
- Issue date Apr 7, 2015
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen ions from a gas field ion source held at a pressure of 1.0...
- Patent number 8,963,100
- Issue date Feb 24, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focused ion beam apparatus and method of adjusting ion beam optics
- Patent number 8,822,911
- Issue date Sep 2, 2014
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating emitter
- Patent number 8,764,994
- Issue date Jul 1, 2014
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite focused ion beam device, process observation method using...
- Patent number 8,274,063
- Issue date Sep 25, 2012
- SII NanoTechnology Inc.
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Grant
Composite focused ion beam device, and processing observation metho...
- Patent number 8,269,194
- Issue date Sep 18, 2012
- SII NanoTechnology Inc.
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam processing method
- Patent number 7,576,340
- Issue date Aug 18, 2009
- Sii Nano Technology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device and ion beam processing method, and holder member
- Patent number 7,297,944
- Issue date Nov 20, 2007
- SII NanoTechnology Inc.
- Toshio Kodama
- G01 - MEASURING TESTING
Information Patent Grant
Ion beam device and ion beam processing method
- Patent number 7,276,691
- Issue date Oct 2, 2007
- SII NanoTechnology Inc.
- Toshio Kodama
- G01 - MEASURING TESTING
Information Patent Grant
Photomask correction method using composite charged particle beam,...
- Patent number 7,172,839
- Issue date Feb 6, 2007
- SII NanoTechnology Inc.
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for processing and observing a sample
- Patent number 6,870,161
- Issue date Mar 22, 2005
- SII NanoTechnology Inc.
- Tatsuya Adachi
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
FOCUSED ION BEAM DEVICE
- Publication number 20240355574
- Publication date Oct 24, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM PROCESSING APPARATUS
- Publication number 20210296080
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS, AND CONTROL METHOD FOR FOCUSED ION BEAM...
- Publication number 20210118642
- Publication date Apr 22, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, COMPOSITE CHARGED PARTICLE BEAM AP...
- Publication number 20210118645
- Publication date Apr 22, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20200266029
- Publication date Aug 20, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200135437
- Publication date Apr 30, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND PLASMA IGNITION METHOD
- Publication number 20170278678
- Publication date Sep 28, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20170148603
- Publication date May 25, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20170069456
- Publication date Mar 9, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20160322123
- Publication date Nov 3, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20160240346
- Publication date Aug 18, 2016
- Hitachi High-Technologies Corporation
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20160240354
- Publication date Aug 18, 2016
- Hitachi High-Technologies Corporation
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20160225574
- Publication date Aug 4, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
- Publication number 20150357147
- Publication date Dec 10, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20150162160
- Publication date Jun 11, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20150053866
- Publication date Feb 26, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20150047079
- Publication date Feb 12, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20140292189
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
- Publication number 20140291542
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20140284474
- Publication date Sep 25, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20140246397
- Publication date Sep 4, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM APPARATUS
- Publication number 20130248732
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tatsuya ASAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20130248483
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS AND METHOD OF ADJUSTING ION BEAM OPTICS
- Publication number 20130240720
- Publication date Sep 19, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20130099133
- Publication date Apr 25, 2013
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused ion beam apparatus
- Publication number 20110215256
- Publication date Sep 8, 2011
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...
- Publication number 20100288924
- Publication date Nov 18, 2010
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHO...
- Publication number 20100176296
- Publication date Jul 15, 2010
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Application
Focused Ion Beam Apparatus
- Publication number 20080156998
- Publication date Jul 3, 2008
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask correction method using composite charged particle beam,...
- Publication number 20070267579
- Publication date Nov 22, 2007
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yasuhiko Sugiyama

Person

Patents Grantslast 30 patents

Focused ion beam processing apparatus

Charged particle beam apparatus, composite charged particle beam ap...

Focused ion beam apparatus, and control method for focused ion beam...

Composite charged particle beam apparatus and control method thereof

Charged particle beam apparatus

Focused ion beam apparatus

Charged particle beam apparatus and plasma ignition method

Focused ion beam apparatus

Plasma ion source and charged particle beam apparatus

Plasma ion source and charged particle beam apparatus

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Emitter structure, gas ion source and focused ion beam system

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Focused ion beam apparatus and control method thereof

Repair apparatus

Focused ion beam apparatus with precious metal emitter surface

Focused ion beam system

Emitter structure, gas ion source and focused ion beam system

Ion beam apparatus

Method for fabricating emitter

Nitrogen ions from a gas field ion source held at a pressure of 1.0...

Focused ion beam apparatus and method of adjusting ion beam optics

Method for fabricating emitter

Composite focused ion beam device, process observation method using...

Composite focused ion beam device, and processing observation metho...

Focused ion beam processing method

Ion beam device and ion beam processing method, and holder member

Ion beam device and ion beam processing method

Photomask correction method using composite charged particle beam,...

Apparatus for processing and observing a sample

Patents Applicationslast 30 patents

FOCUSED ION BEAM DEVICE

FOCUSED ION BEAM PROCESSING APPARATUS

FOCUSED ION BEAM APPARATUS, AND CONTROL METHOD FOR FOCUSED ION BEAM...

CHARGED PARTICLE BEAM APPARATUS, COMPOSITE CHARGED PARTICLE BEAM AP...

COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

CHARGED PARTICLE BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS AND PLASMA IGNITION METHOD

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

FOCUSED ION BEAM APPARATUS

Repair Apparatus

PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS

PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS

FOCUSED ION BEAM APPARATUS

EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM

FOCUSED ION BEAM APPARATUS

Repair Apparatus

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM

FOCUSED ION BEAM SYSTEM

METHOD FOR FABRICATING EMITTER

ION BEAM APPARATUS

METHOD FOR FABRICATING EMITTER

FOCUSED ION BEAM APPARATUS AND METHOD OF ADJUSTING ION BEAM OPTICS

FOCUSED ION BEAM APPARATUS

Focused ion beam apparatus

COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...

COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHO...

Focused Ion Beam Apparatus

Photomask correction method using composite charged particle beam,...