Yasuhiro Inokuchi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 12,142,476
- Issue date Nov 12, 2024
- Kokusai Electric Corporation
- Masayuki Asai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,915,927
- Issue date Feb 27, 2024
- Kokusai Electric Corporation
- Kazuyuki Okuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 11,705,325
- Issue date Jul 18, 2023
- Kokusai Electric Corporation
- Masayuki Asai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substate, method of manufacturing semiconducto...
- Patent number 11,527,401
- Issue date Dec 13, 2022
- Kokusai Electric Corporation
- Masayuki Asai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,361,961
- Issue date Jun 14, 2022
- Kokusai Electric Corporation
- Kazuyuki Okuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch-type remote plasma processing apparatus
- Patent number 9,373,499
- Issue date Jun 21, 2016
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch-type remote plasma processing apparatus
- Patent number 9,039,912
- Issue date May 26, 2015
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and semiconductor device producing m...
- Patent number 8,790,463
- Issue date Jul 29, 2014
- Hitachi Kokusai Electric Inc.
- Atsushi Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treatment device
- Patent number 8,652,258
- Issue date Feb 18, 2014
- Hitachi Kokusai Electric Inc.
- Takashi Yokogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch-type remote plasma processing apparatus
- Patent number 8,544,411
- Issue date Oct 1, 2013
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device producing method with selective epitaxial growth
- Patent number 8,466,049
- Issue date Jun 18, 2013
- Hitachi Kokusai Electric Inc.
- Yasuhiro Inokuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and substrate processi...
- Patent number 8,071,477
- Issue date Dec 6, 2011
- Hitachi Kokusai Electric Inc.
- Atsushi Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 8,070,880
- Issue date Dec 6, 2011
- Hitachi Kokusai Electric, Inc.
- Tetsuya Marubayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type remote plasma processing apparatus
- Patent number 8,028,652
- Issue date Oct 4, 2011
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,025,739
- Issue date Sep 27, 2011
- Hitachi Kokusai Electric, Inc.
- Kiyohisa Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch-type remote plasma processing apparatus
- Patent number 8,020,514
- Issue date Sep 20, 2011
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 8,012,885
- Issue date Sep 6, 2011
- Hitachi Kokusai Electric Inc.
- Yasuhiro Inokuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type remote plasma processing apparatus
- Patent number 7,861,668
- Issue date Jan 4, 2011
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 7,851,379
- Issue date Dec 14, 2010
- Hitachi Kokusai Electric, Inc.
- Atsushi Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 6,949,474
- Issue date Sep 27, 2005
- Hitachi Kokusai Electric Inc.
- Atsushi Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 6,872,636
- Issue date Mar 29, 2005
- Hitachi Kokusai Electric Inc.
- Atsushi Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method for semiconductor device
- Patent number 6,764,916
- Issue date Jul 20, 2004
- Hitachi Kokusai Electric Inc.
- Ryoichi Furukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method for manufacturing semicon...
- Patent number 6,503,079
- Issue date Jan 7, 2003
- Hitachi Kokusai Electric Inc.
- Minoru Kogano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor wafer processing apparatus for transferring a wafer m...
- Patent number 6,462,411
- Issue date Oct 8, 2002
- Kokusai Electric Co., Ltd.
- Tomoji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,332,927
- Issue date Dec 25, 2001
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet-oxidation apparatus and wet-oxidation method
- Patent number 6,270,581
- Issue date Aug 7, 2001
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,217,663
- Issue date Apr 17, 2001
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having a gas heating tube
- Patent number 6,139,641
- Issue date Oct 31, 2000
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 6,132,553
- Issue date Oct 17, 2000
- Kokasai Electric Co., Ltd.
- Fumihide Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment of semiconductor wafers where upper heater directly...
- Patent number 5,960,159
- Issue date Sep 28, 1999
- Kokusai Electric Co., Ltd.
- Fumihide Ikeda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240153760
- Publication date May 9, 2024
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230298883
- Publication date Sep 21, 2023
- Kokusai Electric Corporation
- Masayuki ASAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230070910
- Publication date Mar 9, 2023
- Kokusai Electric Corporation
- Masayuki ASAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus, Method of Manufacturing Semiconduct...
- Publication number 20220277952
- Publication date Sep 1, 2022
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20200365388
- Publication date Nov 19, 2020
- Kokusai Electric Corporation
- Masayuki ASAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus, Method of Manufacturing Semiconduct...
- Publication number 20200258736
- Publication date Aug 13, 2020
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BATCH-TYPE REMOTE PLASMA PROCESSING APPARATUS
- Publication number 20150228476
- Publication date Aug 13, 2015
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20130104804
- Publication date May 2, 2013
- Hitachi Kokusai Electric Inc.
- Kazuyuki TOYODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20130072002
- Publication date Mar 21, 2013
- Hitachi Kokusai Electric Inc.
- Kazuyuki TOYODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110226418
- Publication date Sep 22, 2011
- Kiyohisa ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate treatment device
- Publication number 20110212623
- Publication date Sep 1, 2011
- Hitachi Kokusai Electric Inc.
- Takashi Yokogawa
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100154711
- Publication date Jun 24, 2010
- Hitachi Kokusai Electric Inc.
- Kiyohisa ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...
- Publication number 20100151682
- Publication date Jun 17, 2010
- Hitachi Kokusai Electric Inc.
- Atsushi MORIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100087068
- Publication date Apr 8, 2010
- Hitachi Kokusai Electric Inc.
- Kiyohisa Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090325366
- Publication date Dec 31, 2009
- Hitachi Kokusai Electric Inc.
- Atsushi MORIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSIN...
- Publication number 20090253265
- Publication date Oct 8, 2009
- Hitachi Kokusai Electric, Inc.
- Yasuhiro Inokuchi
- C30 - CRYSTAL GROWTH
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20090159440
- Publication date Jun 25, 2009
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20090133630
- Publication date May 28, 2009
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20090116936
- Publication date May 7, 2009
- Hitachi Kokusai Electric Inc.
- Tetsuya MARUBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device producing method
- Publication number 20090104740
- Publication date Apr 23, 2009
- Hitachi Kokusai Electric Inc.
- Yasuhiro Inokuchi
- C30 - CRYSTAL GROWTH
Information Patent Application
Substrate Processing Apparatus and Semiconductor Device Producing M...
- Publication number 20080251008
- Publication date Oct 16, 2008
- Hitachi Kokusai Electric Inc.
- Atsushi Moriya
- C30 - CRYSTAL GROWTH
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20080242064
- Publication date Oct 2, 2008
- Hitachi Kokusai Electric Inc.
- Yasuhiro INOKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus, and substrate processing method
- Publication number 20080199610
- Publication date Aug 21, 2008
- Hitachi Kokusai Electric Inc.
- Yasuhiro Inokuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate treatment device
- Publication number 20080135516
- Publication date Jun 12, 2008
- Hitachi Kokusai Electric Inc.
- Takashi Yokogawa
- C30 - CRYSTAL GROWTH
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20080093215
- Publication date Apr 24, 2008
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20080066681
- Publication date Mar 20, 2008
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20080060580
- Publication date Mar 13, 2008
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Batch-Type Remote Plasma Processing Apparatus
- Publication number 20070246355
- Publication date Oct 25, 2007
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing a semiconductor device and a semiconductor...
- Publication number 20040007185
- Publication date Jan 15, 2004
- Hitachi Kokusai Electric Inc.
- Atsushi Moriya
- C30 - CRYSTAL GROWTH
Information Patent Application
Batch-type remote plasma processing apparatus
- Publication number 20030164143
- Publication date Sep 4, 2003
- Hitachi Kokusai Electric Inc.
- Kazuyuki Toyoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yasuhiro Inokuchi

Person

Patents Grantslast 30 patents

Method of processing substrate, method of manufacturing semiconduct...

Substrate processing apparatus, method of manufacturing semiconduct...

Method of processing substrate, method of manufacturing semiconduct...

Method of processing substate, method of manufacturing semiconducto...

Substrate processing apparatus, method of manufacturing semiconduct...

Batch-type remote plasma processing apparatus

Batch-type remote plasma processing apparatus

Substrate processing apparatus and semiconductor device producing m...

Substrate treatment device

Batch-type remote plasma processing apparatus

Semiconductor device producing method with selective epitaxial growth

Method of manufacturing semiconductor device and substrate processi...

Substrate processing apparatus

Batch-type remote plasma processing apparatus

Method of manufacturing semiconductor device

Batch-type remote plasma processing apparatus

Manufacturing method of semiconductor device

Batch-type remote plasma processing apparatus

Substrate processing method and substrate processing apparatus

Method of manufacturing a semiconductor device and a semiconductor...

Method for fabricating a semiconductor device

Manufacturing method for semiconductor device

Substrate processing apparatus and method for manufacturing semicon...

Semiconductor wafer processing apparatus for transferring a wafer m...

Substrate processing apparatus

Wet-oxidation apparatus and wet-oxidation method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus having a gas heating tube

Substrate processing apparatus

Heat treatment of semiconductor wafers where upper heater directly...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

Substrate Processing Apparatus, Method of Manufacturing Semiconduct...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

Substrate Processing Apparatus, Method of Manufacturing Semiconduct...

BATCH-TYPE REMOTE PLASMA PROCESSING APPARATUS

Batch-Type Remote Plasma Processing Apparatus

Batch-Type Remote Plasma Processing Apparatus

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Substrate treatment device

SUBSTRATE PROCESSING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSIN...

Batch-Type Remote Plasma Processing Apparatus

Batch-Type Remote Plasma Processing Apparatus

SUBSTRATE PROCESSING APPARATUS

Semiconductor device producing method

Substrate Processing Apparatus and Semiconductor Device Producing M...

Manufacturing method of semiconductor device

Substrate processing apparatus, and substrate processing method

Substrate treatment device

Batch-Type Remote Plasma Processing Apparatus

Batch-Type Remote Plasma Processing Apparatus

Batch-Type Remote Plasma Processing Apparatus

Batch-Type Remote Plasma Processing Apparatus

Method of manufacturing a semiconductor device and a semiconductor...

Batch-type remote plasma processing apparatus